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285 条记录 (耗时 0.018 秒)

    SYSTEM AND METHOD FOR REDUCING PARTICLES IN EPITAXIAL REACTORS
    92.
    发明公开
    SYSTEM AND METHOD FOR REDUCING PARTICLES IN EPITAXIAL REACTORS 有权
    系统和方法在外延降低电抗器的粒子

    公开(公告)号：EP1097251A1

    公开(公告)日：2001-05-09

    申请号：EP99932209.2

    申请日：1999-06-30

    申请人： ASM America, Inc.

    发明人： DOLEY, Allan, D. ,  GOODWIN, Dennis, L. ,  O'NEILL, Kenneth ,  VRIJBURG, Gerben ,  RODRIGUEZ, David ,  AGGARWAL, Ravinder

    IPC分类号： C23C16/00 ,  C30B23/06

    CPC分类号： C30B29/14 ,  C23C16/4401 ,  C23C16/4408 ,  C30B25/08 ,  Y10S414/139

    摘要： An apparatus and method for reducing particles in reactors. The apparatus (10) includes an enclosure for processing the semiconductor wafers. The enclosure has a wafer handling chamber (16) connected by an isolation gate valve (18) to a processing chamber (20). Additionally, the apparatus includes: pipes (24, 26) for delivering a purge gas into the wafer handling chamber (16); a pilot operated back pressure regulator (40) for regulating the delivery and removal of the purge gas from the enclosure for reducing disturbances from the purge gas entering into the enclosure; a flow regulated Bernoulli wand (36) for lifting and holding a single wafer; ionizers (21a-21d) in the purge gas lines entering the wafer handling chamber and load locks for ionizing the purged gas molecules, the ionized gas discharges all the static inside the semiconductor equipment and prevents the wafer from attracting charged particles; and means for reducing gas flow turbulence when switching valves within the reactor.

    A PHOSPHORUS EFFUSION CELL FOR PRODUCING MOLECULAR BEAMS TO BE DEPOSITED ON A SUBSTRATE
    94.
    发明公开
    A PHOSPHORUS EFFUSION CELL FOR PRODUCING MOLECULAR BEAMS TO BE DEPOSITED ON A SUBSTRATE 失效
    PRODUCING分子束PHOSPHOREFFUSIONSZELLE在基底上加入

    公开(公告)号：EP1002140A1

    公开(公告)日：2000-05-24

    申请号：EP98905069.5

    申请日：1998-02-17

    申请人： Chorus Corporation

    发明人： COLOMBO, Paul, E. ,  PRIDDY, Scott

    IPC分类号： C23C14/24 ,  C30B23/06

    CPC分类号： C23C14/243 ,  C30B23/066

    摘要： This invention is a sublimating and cracking apparatus for producing a beam of molecules to be deposited on a substrate, and an apparatus which is particularly useful with phosphorus as the source material. In the phosphorus effusion cell of this invention, a vacuum jacket (10) encloses and supports a red phosphorus crucible (12), a condensing crucible for white phosphorus (14) and a connecting tube (16) within a vacuum space (19). In use, red phosphorus is first transformed and deposited as white phosphorus in the condensing chamber. The white phosphorus is then directed to a cracker section (20) where it is cracked and subsequently directed to the substrate.

    MOLECULAR BEAM EPITAXY EFFUSION CELL
    95.
    发明公开
    MOLECULAR BEAM EPITAXY EFFUSION CELL 失效
    积液用于分子束外延

    公开(公告)号：EP1007770A4

    公开(公告)日：1999-04-22

    申请号：EP98925296

    申请日：1998-06-05

    申请人： UNIV TEXAS

    发明人： MATTORD TERRY J

    IPC分类号： C30B23/06 ,  C30B19/00

    CPC分类号： C30B23/066

    摘要： A molecular beam epitaxy effusion cell for growing epitaxial layers upon a semiconductor substrate by control of a collimated beam of molecules generated from a source material in a high vacuum environment in order to control the hyper abrupt stoichiometry of the effusion flux. A heated control assembly is used to control the size of the exit openings of the effusion cell. The control assembly comprises a boroelectric heating member such as a grating having a plurality of holes and a perforated cover which are adjustable relative to one another. The grating includes an internal heating element.

    Crucible of pyrolytic boron nitride for molecular beam epitaxy
    96.
    发明公开
    Crucible of pyrolytic boron nitride for molecular beam epitaxy 失效
    Tiegel aus pyrolytischem Bornitrid zur Verwendung in der Molekularstrahlepitaxie

    公开(公告)号：EP0851042A3

    公开(公告)日：1999-03-24

    申请号：EP97403168.4

    申请日：1997-12-26

    申请人： SHIN-ETSU CHEMICAL CO., LTD.

    发明人： Kimura, Noboru ,  Hagiwara, Koji

    IPC分类号： C30B23/02 ,  C30B23/06 ,  C23C14/24

    CPC分类号： C23C16/342 ,  C23C14/243 ,  C23C16/01 ,  C30B23/066 ,  Y10T428/13 ,  Y10T428/131

    摘要： Disclosed is a crucible of pyrolytic boron nitride (PBN) for molecular beam epitaxy for melting of the source material, with which the troubles due to adhering of the molten source material in the form of drops caused on the quality of the epitaxial layer can be greatly decreased. Namely, the inner surface of the crucible is free from pits or other irregularities responsible to the adhering of the melt when the growth plane, which can be exposed by stripping of the surface layer of 0.50 mm thickness by cleavage, has a surface roughness Ra not exceeding 2.0 µm and Rmax not exceeding 18 µm. Such a PBN crucible can be prepared by the CVD method to deposit PBN on the surface of a graphite core of which the surface roughness Ra does not exceed 2 µm.

    摘要翻译： 公开了用于分子束外延的热解氮化硼（PBN）的坩埚，用于熔化源材料，由于熔融源材料以外延层的质量形式的液滴形式的粘附所引起的故障可以大大地 降低。 也就是说，当可以通过剥离0.50mm厚度的表面层剥离的生长面可以使坩埚的内表面没有凹陷或其他不规则的情况时，表面粗糙度Ra不能 超过2.0亩，Rmax不超过18亩。 这种PBN坩埚可以通过CVD法制备，以便将PBN沉积在表面粗糙度Ra不超过2μm的石墨芯的表面上。

    Thermal decomposition cell
    99.
    发明公开
    Thermal decomposition cell 失效
    热分解细胞

    公开(公告)号：EP0460938A3

    公开(公告)日：1993-08-04

    申请号：EP91305082.9

    申请日：1991-06-05

    申请人： MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.

    发明人： Uchiyama, Kiyoshi ,  Suzuki(nee Abe),Tomoko ,  Yokotsuka, Tatsuo ,  Nakajima, Masato ,  Takamori, Akira

    IPC分类号： C30B23/02 ,  C23C14/24 ,  C23C16/44 ,  C30B25/02 ,  C30B23/06

    CPC分类号： C30B23/066 ,  C23C14/24 ,  C23C16/452

    摘要： A thermal decomposition cell for producing a molecular beam from a material gas, comprises: a crucible maintained at a given temperature necessary for thermal decomposition of the material gas which is effused in the crucible in a given direction; and a thermal decomposition baffle provided in the crucible and heated to a given temperature necessary for thermal decomposition of the material gas for producing the molecular beam by thermal-decomposing the material gas such that the material gas is baffled in substantially all directions, the thermal decomposition baffle being made of a given metal to cause the thermal decomposition of the material gas. The thermal decomposition baffle may comprise a fiber or a cloth made of the metal loaded in the crucible. The thermal decomposition baffle may comprise plural different sizes of rooms made of the given metal, each of said rooms having fine holes to allow the material gas to pass therethrough, and successively arranged in such a manner that said material gas moves from one room toward the other adjacent thereto.

    Multichannel plate assembly for gas source molecular beam epitaxy
    100.
    发明公开
    Multichannel plate assembly for gas source molecular beam epitaxy 失效
    用于气体源分子束外延的多通道板组件

    公开(公告)号：EP0472316A3

    公开(公告)日：1992-11-19

    申请号：EP91307129.6

    申请日：1991-08-02

    申请人： Hughes Aircraft Company

    发明人： Zinck, Jennifer J. ,  Baukus, James P.

    IPC分类号： H01J37/00 ,  C30B23/00 ,  C30B23/06

    CPC分类号： C30B23/06

    摘要： A microchannel plate array assembly (10), comprising an array of microchannels in a microchannel plate (24), is provided in place of a conventional effusion cell to attain high and uniform fluxes localized in the substrate area for the growth of films thereon by gas source molecular beam epitaxy. Using this approach, an effective pressure at the substrate can be sustained which is as much as 100 times greater than the background pressure in the growth chamber.