公开(公告)号：EP2673675A1

公开(公告)日：2013-12-18

申请号：EP12708387.1

申请日：2012-02-07

申请人： AZ Electronic Materials USA Corp.

发明人： YAO, Huirong ,  BOGUSZ, Zachary ,  LIN, Guanyang ,  NEISSER, Mark, O.

IPC分类号： G03F7/09

摘要： The invention relates to an underlayer coating composition comprising a polymer, where the polymer comprises at least one hydroxyaromatic unit in the backbone of the polymer phenol which has a pendant group comprising a fluoro or iodo moiety, and at least one unit comprising an aminoplast. The invention further relates to a process for forming an image using the composition, especially for EUV.

摘要翻译： 本发明涉及包含聚合物的下层涂料组合物，其中聚合物在聚合物酚的骨架中包含至少一个羟基芳族单元，该羟基芳族单元具有包含氟或碘部分的侧基和包含氨基塑料的至少一个单元。 本发明进一步涉及使用该组合物形成图像的方法，特别是用于EUV。

公开(公告)号：EP1563343B1

公开(公告)日：2012-01-11

申请号：EP03775309.2

申请日：2003-11-06

申请人： AZ Electronic Materials USA Corp.

发明人： WU, Hengpeng ,  DING-LEE, Shuji ,  XIANG, Zhong ,  OBERLANDER, Joseph, E. ,  NEISSER, Mark, O. ,  GONZALEZ, Eleazar ,  SHAN, jianhui

IPC分类号： G03F7/09 ,  G03F7/038

CPC分类号： G03F7/091 ,  G03F7/038 ,  G03F7/0382 ,  Y10S430/109 ,  Y10S430/115 ,  Y10S430/12 ,  Y10S430/122

摘要： The present invention relates to a novel antireflective coating composition comprising a polymer, a crosslinking agent and an acid generator. The present invention further relates to a process for using the novel composition, particularly at 193nm. The polymer of the present invention contains at least one unit selected from structures (1), (2), and (3).

公开(公告)号：EP1751210B1

公开(公告)日：2010-09-08

申请号：EP05718352.7

申请日：2005-03-31

申请人： AZ Electronic Materials USA Corp.

发明人： WU, Hengpeng ,  SHAN, Jianhui ,  DING-LEE, Shuji, Sue ,  XIANG, Zhong ,  GONZALEZ, Eleazor, B. ,  NEISSER, Mark, O.

IPC分类号： C08G63/81 ,  C08G63/46 ,  C08G63/50 ,  C08G63/91 ,  C08G63/12

CPC分类号： C08J7/047 ,  C08G63/46 ,  C08G63/916 ,  C08J2383/00 ,  C08J2467/00 ,  Y10T428/31504 ,  Y10T428/31786

摘要： The present invention relates to a process for making a polyester where a dianhydride is reacted with a diol. The resulting polyester can be further reacted with a compound selected from aromatic oxides, aliphatic oxides, alkylene carbonates, alcohols, and mixtures thereof.

摘要翻译： 本发明涉及一种制造二酐与二醇反应的聚酯的方法。 所得聚酯可以进一步与选自芳族氧化物，脂族氧化物，碳酸亚烷基酯，醇和它们的混合物的化合物反应。

公开(公告)号：EP1966255A1

公开(公告)日：2008-09-10

申请号：EP06809163.6

申请日：2006-10-26

申请人： AZ Electronic Materials USA Corp.

发明人： ABDALLAH, David, J. ,  YIN, Jian ,  NEISSER, Mark, O.

IPC分类号： C08F8/30 ,  G03F7/09 ,  H01L21/027

CPC分类号： C08F8/30 ,  C08F212/08 ,  C08F220/18 ,  C09D133/06 ,  G03F7/091 ,  Y10S438/952 ,  C08L2666/04 ,  C08F216/08 ,  C08F2220/281

摘要： Novel self-crosslinking polymers are provided which are useful in antireflective coatings to reduce outgassing.

公开(公告)号：EP1466216B1

公开(公告)日：2006-07-26

申请号：EP03704352.8

申请日：2003-01-03

申请人： AZ Electronic Materials USA Corp.

发明人： NEISSER, Mark, O. ,  OBERLANDER, Joseph, E. ,  TOUKHY, Medhat, A. ,  SAKAMURI, Raj ,  Ding-Lee, Shuji

IPC分类号： G03F7/09 ,  G03F7/095

CPC分类号： G03F7/091 ,  G03F7/095 ,  Y10S430/151

摘要： Disclosed is a process for forming an image on a substrate, comprising the steps of: a coating on the substrate a first layer of a radiation sensitive, antireflective composition b coating a second layer of a photoresist composition onto the first layer of the antireflective composition c selectively exposing the coated substrate from step b to actinic radiation and d developing the exposed coated substrate from step c to form an image wherein both the photoresist composition and the antireflective composition are exposed in step c both are developed in step d using a single developer wherein the antireflective composition of step a is a first minimum bottom antireflective coating B.A.R.C. composition, having a solids content of up to about 8% solids, and a maximum coating thickness of the coated substrate of [] wherein lambd, is the wavelength of the actinic radiation of step c and n is the refractive index of the B.A.R.C. composition.