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公开(公告)号：EP1751210A1
公开(公告)日：2007-02-14
申请号：EP05718352.7
申请日：2005-03-31
发明人： WU, Hengpeng , SHAN, Jianhui , DING-LEE, Shuji, Sue , XIANG, Zhong , GONZALEZ, Eleazor, B. , NEISSER, Mark, O.
CPC分类号： C08J7/047 , C08G63/46 , C08G63/916 , C08J2383/00 , C08J2467/00 , Y10T428/31504 , Y10T428/31786
摘要： The present invention relates to a process for making a polyester where a dianhydride is reacted with a diol. The resulting polyester can be further reacted with a compound selected from aromatic oxides, aliphatic oxides, alkylene carbonates, alcohols, and mixtures thereof.
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公开(公告)号：EP2052293B1
公开(公告)日：2013-03-13
申请号：EP07789633.0
申请日：2007-08-07
发明人： WU, Hengpeng , XIANG, Zhong , ZHUANG, Hong , SHAN, Jianhui , YIN, Jian , YAO, Huirong , LU, Ping-Hung
IPC分类号： G03F7/09
CPC分类号： G03F7/091 , Y10S438/952
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公开(公告)号：EP2537068A1
公开(公告)日：2012-12-26
申请号：EP11712322.4
申请日：2011-02-17
IPC分类号： G03F7/09
CPC分类号： G03F7/091
摘要： A novel antireflective coating composition is provided, said antireflective coating composition comprising a) a compound of formula 1, b) a thermal acid generator, (c) at least one polymer, (Formula 1) (I) wherein U
1 and U
2 are independently a C
1 -C
10 alkylene group; V is selected from a C
1 -C
10 alkylene, arylene and aromatic alkylene; W is selected from H, C
1 -C
10 alkyl, aryl, alkylaryl and V-OH; Y is selected from H, W, and U
3 C(O)OW, wherein U
3 is independently a C
1 -C
10 alkylene group, and m is 1 to 10. Also provided are methods using said compositions as antireflective coatings for substrates in lithographic processes.-
公开(公告)号：EP2300518A1
公开(公告)日：2011-03-30
申请号：EP09785890.6
申请日：2009-04-29
发明人： YAO, Huirong , XIANG, Zhong , SHAN, Jianhui , MULLEN, Salem , WU, Hengpeng
IPC分类号： C08J5/18 , C08J7/00 , C08L67/00 , C09D5/00 , C09D167/00
CPC分类号： C09D167/00 , C08G59/3236 , C08G63/6854 , C09D163/00 , G02B1/111 , G03F7/091
摘要： Anti reflective coating compositions and related polymers are disclosed.
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公开(公告)号：EP1805561A2
公开(公告)日：2007-07-11
申请号：EP05812626.9
申请日：2005-09-15
发明人： WU, Hengpeng , DING-LEE, Shuji , XIANG, Zhong , HISHIDA, Aritaka , SHAN, Jianhui , ZHUANG, Hong
IPC分类号： G03F7/09
CPC分类号： G03F7/091
摘要： The present invention relates to a coating solution comprising a polymer obtained by reacting a glycoluril compound with at least one reactive compound containing at least one hydroxy group and/or at least one acid group, and further where the polymer is soluble in an organic solvent. The invention also relates to a process for imaging a photoresist coated over such a coating composition and to a polymer for the coating composition.
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公开(公告)号：EP2691439A1
公开(公告)日：2014-02-05
申请号：EP12715147.0
申请日：2012-03-27
发明人： RAHMAN, M. Dalil , MCKENZIE, Douglas , SHAN, Jianhui , CHO, JoonYeon , MULLEN, Salem, K. , ANYADIEGWU, Clement
IPC分类号： C08G61/02 , C09D165/00 , G03F7/09 , H01L21/027 , G03F1/46
CPC分类号： H01L21/3081 , C08G61/02 , C08G2261/3424 , C09D165/00 , G03F7/091 , H01L21/0276
摘要： The invention relates to an antireflective coating composition comprising a crosslinker and a crosslinkable polymer capable of being crosslinked by the crosslinker, where the crosslinkable polymer comprises a unit represented by structure (1 ), where A is a fused aromatic ring, B has a structure (2), and C is a hydroxybiphenyl of structure (3), (2) and (3) where R
1 is C
1 -C
4 alkyl and R
2 is C
1 -C
4 alkyl. The invention further relates to a process for forming an image using the composition.-
公开(公告)号：EP1751210B1
公开(公告)日：2010-09-08
申请号：EP05718352.7
申请日：2005-03-31
发明人： WU, Hengpeng , SHAN, Jianhui , DING-LEE, Shuji, Sue , XIANG, Zhong , GONZALEZ, Eleazor, B. , NEISSER, Mark, O.
CPC分类号： C08J7/047 , C08G63/46 , C08G63/916 , C08J2383/00 , C08J2467/00 , Y10T428/31504 , Y10T428/31786
摘要： The present invention relates to a process for making a polyester where a dianhydride is reacted with a diol. The resulting polyester can be further reacted with a compound selected from aromatic oxides, aliphatic oxides, alkylene carbonates, alcohols, and mixtures thereof.
摘要翻译： 本发明涉及一种制造二酐与二醇反应的聚酯的方法。 所得聚酯可以进一步与选自芳族氧化物，脂族氧化物，碳酸亚烷基酯，醇和它们的混合物的化合物反应。
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公开(公告)号：EP1210651B1
公开(公告)日：2009-03-04
申请号：EP00948003.9
申请日：2000-07-27
发明人： DING, Shuji , KHANNA, Dinesh, N. , SPAK, Mark, A. , DURHAM, Dana, L. , SHAN, Jianhui , GONZALEZ, Eleazar
CPC分类号： G03F7/091
摘要： The present invention relates to a novel antireflective coating solution and a process for its use in photolithography. The antireflective coating solution comprises a novel polymer and an organic solvent or mixture of solvents, where the novel polymer comprises a unit containing a dye that absorbs from about 180 nm to about 450 nm and does not contain a crosslinking group.
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公开(公告)号：EP1222233B1
公开(公告)日：2005-11-23
申请号：EP00969286.4
申请日：2000-09-22
CPC分类号： G03F7/091 , C09B69/106 , G03F7/021
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