公开(公告)号：EP2704177B1

公开(公告)日：2014-11-26

申请号：EP12182874.3

申请日：2012-09-04

申请人： FEI COMPANY

发明人： Lazic, Ivan ,  Tiemeijer, Peter ,  Van Duinen, Gijs

IPC分类号： H01J37/153

CPC分类号： H01J37/153 ,  H01J2237/1534

公开(公告)号：EP2704177A1

公开(公告)日：2014-03-05

申请号：EP12182874.3

申请日：2012-09-04

申请人： FEI COMPANY

发明人： Lazic, Ivan ,  Tiemeijer, Peter ,  Van Duinen, Gijs

IPC分类号： H01J37/153

CPC分类号： H01J37/153 ,  H01J2237/1534

摘要： A method of investigating aberrations in a charged-particle lens system, which lens system has an object space comprising an object plane and an image space comprising an image plane, whereby an object placed on said object plane can be imaged by the lens system onto said image plane, the lens further having an entrance pupil, which method comprises the following steps:
- Selecting a fixed pivot point on said object plane;
- Directing a charged-particle beam through said pivot point, entrance pupil and lens system and onto said image plane, said beam having a relatively small cross-sectional area relative to the area of the entrance pupil;
- Changing the orientation of said beam through said pivot point, so as to trace out an entrance figure on said entrance pupil and a corresponding image figure on said image plane;
- Registering said image figure;
- Repeating this procedure at a series of different focus settings of the lens system, thus acquiring a set of registered image figures at different focus settings;
- Analyzing said set so as to derive lens aberrations therefrom.
This analyzing step will generally comprise performing a mathematical fit of said set to a collection of theoretical image figures predicted using a mathematical model. Such a model may describe wavefront deformation by the lens system in terms of localized alterations in phase and phase gradient per point on a wavefront, using a two-dimensional function. This two-dimensional function may be expanded as a Taylor Series, whose coefficients yield information on the magnitude of the various lens aberrations being investigated. Said series of different focus settings preferably includes points at or near best focus, and may extend through best focus to include under-focus and over-focus points.

摘要翻译： 调查在带电粒子光学系统的像差的方法，其中透镜系统具有到对象空间，包括计划对象和平面到图像空间，其包括图像，由此将对象上所述目标平面放置可通过透镜系统到所述待成像 图像平面上，该透镜还具有入射光瞳，所述方法包括以下步骤： - 选择在所述物体面的一个固定枢转点; - 通过所述pivotPoint，入射光瞳与镜头系统和到所述图像平面引导带电粒子束，具有截面积相对于所述入射光瞳的面积相对小的所述光束; - 通过所述枢转点改变所述光束的方向，以便描绘出在计划在所述入射光瞳和在所述图像对应的图像图形入口图。 - 记录所述图像图。 - 重复该过程在一系列的透镜系统的不同的焦点设置，从而获取一组在不同的焦点设置为注册图像数字; - 分析所述设置成从那里派生透镜像差。 这个分析步骤将产生反弹包括执行所述的数学拟合设定为理论值的图像数据的集合使用数学模型预测。 这样的模型可以由透镜系统在每点的相位和相位梯度上的波前的局部改变的术语描述的波前变形，使用二维函数。 此二维函数可以被展开为泰勒级数，其系数得到的各种透镜像差的幅度的信息被调查。 所述系列的不同聚焦设置优选地包括在点或接近最佳焦点，并且可以通过最佳聚焦延伸到包括欠聚焦和过聚焦点。

公开(公告)号：EP2511936B1

公开(公告)日：2013-10-02

申请号：EP11162275.9

申请日：2011-04-13

申请人： FEI COMPANY

发明人： Bischoff, Maarten ,  Henstra, Sander ,  Luecken, Uwe ,  Tiemeijer, Peter

IPC分类号： H01J37/153 ,  H01J37/26

CPC分类号： H01J37/26 ,  H01J37/153 ,  H01J2237/1532

公开(公告)号：EP2128887B1

公开(公告)日：2011-09-21

申请号：EP09152629.3

申请日：2009-02-12

申请人： FEI COMPANY

发明人： Tiemeijer, Peter ,  De Jong, Alan

IPC分类号： H01J37/153 ,  H01J37/26

CPC分类号： H01J37/153 ,  H01J37/263 ,  H01J2237/2614

公开(公告)号：EP2166556A1

公开(公告)日：2010-03-24

申请号：EP09170781.0

申请日：2009-09-21

申请人： FEI COMPANY

发明人： De Jong, Alan ,  Luecken, Uwe ,  Slingerland, Hendrik ,  Tiemeijer, Peter

IPC分类号： H01J37/153 ,  H01J37/26

CPC分类号： H01J37/153 ,  H01J37/263 ,  H01J2237/1534 ,  H01J2237/2823

摘要： The invention relates to a method for correcting distortions introduced by the projection system (106) of a TEM. As known to the person skilled in the art distortions may limit the resolution of a TEM, especially when making a 3D reconstruction of a feature using tomography. Also when using strain analysis in a TEM the distortions may limit the detection of strain.
To this end the invention discloses a detector equipped with multipoles (152), the multipoles warping the image of the TEM in such a way that distortions introduced by the projection system are counteracted. The detector may further include a CCD or a fluorescent screen (151) for detecting the electrons.

摘要翻译： 本发明涉及一种用于校正由TEM的投影系统（106）引入的失真的方法。 如本领域技术人员所知，失真可能限制TEM的分辨率，特别是当使用层析成像进行特征的3D重建时。 此外，当在TEM中使用应变分析时，失真可能会限制应变的检测。 为此，本发明公开了一种装备有多极（152）的检测器，该多极体使得TEM的图像翘曲，使得由投影系统引入的失真被抵消。 检测器还可以包括用于检测电子的CCD或荧光屏（151）。

公开(公告)号：EP2128887A1

公开(公告)日：2009-12-02

申请号：EP09152629.3

申请日：2009-02-12

申请人： FEI COMPANY

发明人： Tiemeijer, Peter ,  De Jong, Alan

IPC分类号： H01J37/153 ,  H01J37/26

CPC分类号： H01J37/153 ,  H01J37/263 ,  H01J2237/2614

摘要： The invention relates to a TEM with a corrector (330) to improve the image quality and a phase plate (340) to improve contrast. The improved TEM comprises a correction system completely placed between the objective lens and the phase plate, and uses the lenses of the corrector to form a magnified image of the diffraction plane on the phase plate.

摘要翻译： 本发明涉及具有改善图像质量的校正器（330）和改善对比度的相位板（340）的TEM。 改进的TEM包括完全放置在物镜和相位板之间的校正系统，并使用校正器的透镜在相位板上形成衍射面的放大图像。

公开(公告)号：EP4020519A1

公开(公告)日：2022-06-29

申请号：EP21214236.8

申请日：2021-12-14

申请人： FEI Company

发明人： Henstra, Alexander ,  Mohammadi-Gheidari, Ali ,  Tiemeijer, Peter

IPC分类号： H01J37/141

摘要： An adjustable magnetic field free objective lens for a charged particle microscope is disclosed herein. An example charged particle microscope at least includes first (220) and second (222) optical elements arranged on opposing sides of a sample plane (208), a third optical element (244, 246, 250) arranged around the sample plane, and a controller coupled to control the first, second and third optical elements. The controller coupled to excite the first and second optical elements to generate first and second magnetic lenses, the first and second magnetic lenses formed on opposing sides of the sample plane and oriented in the same direction, and excite the third optical element to generate a third magnetic lens at the sample plane that is oriented in an opposite direction, where a ratio of the excitation of the third optical element to the excitation of the first and second optical elements adjusts a magnetic field at the sample plane.

公开(公告)号：EP2511936A1

公开(公告)日：2012-10-17

申请号：EP11162275.9

申请日：2011-04-13

申请人： FEI COMPANY

发明人： Bischoff, Maarten ,  Henstra, Sander ,  Luecken, Uwe ,  Tiemeijer, Peter

IPC分类号： H01J37/153 ,  H01J37/26

CPC分类号： H01J37/26 ,  H01J37/153 ,  H01J2237/1532

摘要： The invention relates to a charged particle apparatus equipped with a charged particle source (202) for emitting a beam of charged particles, downstream of said beam followed by condenser optics (208), followed by a sample position, followed by an objective lens (214), followed by imaging optics (216), and followed by a detector system (218, 224), in which, between the objective lens and the detector system, a first stigmator (250) is positioned for reducing astigmatism when imaging a sample (210) on the detector system and a second stigmator (252) is positioned for reducing astigmatism when the diffraction plane is imaged on the detector system, characterized in that a third stigmator (254) is positioned between the objective lens and the detector system, as a result of which a third degree of freedom is created for reducing the linear distortion.
The invention further relates to a method of using said three stigmators, the method comprising exciting the first stigmator to reduce astigmatism when imaging the sample and exciting the second stigmator to reduce astigmatism when imaging the diffraction plane, characterized in that the method comprises exciting the third stigmator to reduce the linear distortion.

摘要翻译： 本发明涉及装有带电粒子源（202）的带电粒子装置，用于发射带电粒子束，在所述光束的下游，随后是聚光镜（208），随后是采样位置，随后是物镜（214） ），随后是成像光学器件（216），随后是检测器系统（218,224），其中在物镜和检测器系统之间设置第一施放器（250），用于当成像成像时减少散光 210），并且第二标示器（252）被定位成当衍射平面成像在检测器系统上时减少散光，其特征在于，第三施放器（254）位于物镜和检测器系统之间，如 其结果是产生用于减少线性失真的第三自由度。 本发明还涉及一种使用所述三个标准器的方法，所述方法包括：当成像所述样品时激发所述第一标示器以减少散光并激励所述第二标示器以在对所述衍射平面进行成像时减少散光，其特征在于，所述方法包括： stigmator减少线性失真。

公开(公告)号：EP2387062B1

公开(公告)日：2012-10-17

申请号：EP11165383.8

申请日：2011-05-10

申请人： FEI Company

发明人： Tiemeijer, Peter ,  Freitag, Bert ,  Lazar, Sorin

IPC分类号： H01J37/28 ,  H01J37/05

CPC分类号： H01J37/05 ,  H01J37/28 ,  H01J2237/057 ,  H01J2237/2802 ,  H01J2237/2804

公开(公告)号：EP2485239A1

公开(公告)日：2012-08-08

申请号：EP11153513.4

申请日：2011-02-07

申请人： FEI Company

发明人： Buijsse, Bart ,  Tiemeijer, Peter ,  Bierhoff, Mart

IPC分类号： H01J37/26

CPC分类号： H01J37/26 ,  H01J37/265 ,  H01J2237/1501 ,  H01J2237/2614

摘要： The invention relates to a method for adjusting or aligning one or more optical elements in a Transmission Electron Microscope (TEM), the TEM (500) equipped with an objective lens (512) for guiding a beam of electrons to a sample (508) and the TEM showing a diffraction plane (514) in which at least a beam of unscattered electrons is focused, the TEM equipped with a structure (518,410) to enhance the Contrast Transfer Function (CTF), said structure situated in the diffraction plane or an image thereof, the method comprising adjusting or aligning the optical elements, characterized in that irradiation with unscattered electrons of the structure during said adjusting or aligning is prevented (602) by deflecting the beam of unscattered electrons away from the structure.
The structure to enhance the CTF can, for example, be a phase plate, a single side band device, or a 'tulip' (410).
In a preferred embodiment of the method the optical element to be aligned is the phase enhancing structure itself.

摘要翻译： 本发明涉及一种用于调整或对准透射电子显微镜（TEM）中的一个或多个光学元件的方法，所述TEM（500）配备有用于将电子束引导至样品（508）的物镜（512），以及 所述TEM显示其中至少一束未散射电子聚焦的衍射面（514），所述TEM配备有增强对比传递函数（CTF）的结构（518,410），所述结构位于衍射面中或图像 所述方法包括调整或对准所述光学元件，其特征在于，通过将所述未散射电子束偏转离开所述结构而防止（602）在所述调整或对准期间用所述结构的未散射电子辐照所述结构。 例如，增强CTF的结构可以是相位板，单边带装置或“郁金香”（410）。 在该方法的优选实施例中，待对准的光学元件本身是相位增强结构。