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11.
公开(公告)号:EP2567400A4
公开(公告)日:2017-12-27
申请号:EP11777742
申请日:2011-03-21
Applicant: IBM
Inventor: HORAK DAVID V , NOGAMI TAKESHI , PONOTH SHOM , YANG CHIH-CHAO
IPC: H01L23/48 , H01L21/768
CPC classification number: H01L23/53238 , H01L21/76805 , H01L21/7682 , H01L21/76832 , H01L21/76834 , H01L23/53295 , H01L2924/0002 , H01L2924/00
Abstract: Interconnect structures having self-aligned dielectric caps are provided. At least one metallization level is formed on a substrate. A dielectric cap is selectively deposited on the metallization level.
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公开(公告)号:EP2084738A4
公开(公告)日:2011-10-12
申请号:EP07844133
申请日:2007-10-11
Applicant: IBM
Inventor: YANG CHIH-CHAO , YANG HAINING S , WONG KEITH KWONG HON , FAROOQ MUKTA G
IPC: H01L21/768 , H01L23/532
CPC classification number: H01L23/53238 , H01L21/76834 , H01L21/76843 , H01L21/76883 , H01L21/76885 , H01L23/53223 , H01L23/53266 , H01L2924/0002 , H01L2924/00
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公开(公告)号:EP2047505A4
公开(公告)日:2011-10-05
申请号:EP07840384
申请日:2007-07-10
Applicant: IBM
Inventor: YANG CHIH-CHAO
IPC: H01L21/768 , H01L23/52
CPC classification number: H01L21/7682 , H01L21/76835
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14.
公开(公告)号:EP1920493A4
公开(公告)日:2011-05-04
申请号:EP06802645
申请日:2006-08-30
Applicant: IBM
Inventor: HSU LOUIS C , CLEVENGER LAWRENCE A , DALTON TIMOTHY J , RADENS CARL J , WONG KEITH KWONG HON , YANG CHIH-CHAO
CPC classification number: H01H50/005 , H01H2050/007 , Y10T29/4902 , Y10T29/49105 , Y10T29/49147
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15.PLATING SEED LAYER INCLUDING AN OXYGEN/NITROGEN TRANSITION REGION FOR BARRIER ENHANCEMENT 审中-公开
Title translation: KEIM电镀层用氧/氮过渡区FOR改进壁垒公开(公告)号:EP1941545A4
公开(公告)日:2011-03-30
申请号:EP06825349
申请日:2006-10-03
Applicant: IBM
Inventor: YANG CHIH-CHAO , GAUDET SIMON , LAVOIE CHRISTIAN , PONOTH SHOM , SPOONER TERRY A
IPC: H01L23/58 , H01L23/532
CPC classification number: H01L21/76843 , H01L21/76844 , H01L21/76846 , H01L21/76856 , H01L21/76873 , H01L23/53238 , H01L2221/1089 , H01L2924/0002 , H01L2924/00
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公开(公告)号:EP1869700A4
公开(公告)日:2010-12-15
申请号:EP06740771
申请日:2006-04-07
Applicant: IBM
Inventor: YANG CHIH-CHAO , CLEVENGER LAWRENCE A , COWLEY ANDREW P , DALTON TIMOTHY J , YOON MEEYOUNG H
IPC: H01L21/4763 , H01L21/768
CPC classification number: H01L21/76849 , H01L21/76807 , H01L21/76814 , H01L21/76831 , H01L21/76843 , H01L2924/0002 , H01L2924/00
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17.INTERCONNECT STRUCTURES WITH ENCASING CAP AND METHODS OF MAKING THEREOF 审中-公开
Title translation: 与EINSCHLIESSUNGSSKAPPE及其生产相关结构过程公开(公告)号:EP1836726A4
公开(公告)日:2010-07-28
申请号:EP05852629
申请日:2005-12-02
Applicant: IBM
Inventor: CLEVENGER LAWRENCE A , DALTON TIMOTHY J , HSU LOUIS C , RADENS CARL J , STANDAERT THEODORUS E , WONG KEITH KWONG HON , YANG CHIH-CHAO
IPC: H01L21/4763
CPC classification number: H01L21/76852 , H01L21/288 , H01L21/2885 , H01L21/76885 , H01L23/5226 , H01L23/53238 , H01L2924/0002 , H01L2924/00
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公开(公告)号:EP2084711A4
公开(公告)日:2009-11-25
申请号:EP07843111
申请日:2007-09-25
Applicant: IBM
Inventor: YANG CHIH-CHAO , YANG HAINING
IPC: G11C17/14 , H01L23/525
CPC classification number: H01L23/5256 , H01L2924/0002 , H01L2924/00
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