摘要:
To be able to form a copper-zinc-tin alloy which optionally comprises at least one chalcogenide and thus forms a semiconductor without the use of toxic substances a metal plating composition for the deposition of a copper-zinc-tin alloy is disclosed, wherein said metal plating composition comprises at least one copper plating species, at least one zinc plating species, at least one tin plating species and at least one complexing agent and further, if the alloy contains at least one chalcogen, at least one chalcogen plating species. The metal plating composition additionally comprises at least one additive, selected from the group comprising disubstituted benzene compounds having general chemical formula I, wherein R 1 and R 2 are the same or different, are selected independently from the group comprising OH, SH, NR 3 R 4 , CO-R 5 , COOR 5 , CONR 3 R 4 , COSR 5 , SO 2 OR 5 SO 2 R 5 , SO 2 NR 3 R 4 and the salts thereof or have the aforementioned meanings and form a common condensation chain; with R 3 and R 4 being the same or different, being selected independently from the group comprising H and alkyl; and with R 5 being selected from the group comprising H, alkyl and hydroxyalkyl. Such alloys comprising at least one of sulfur and selenium may be used as an absorber in a thin film solar cell, which comprises a substrate (a) being coated with a back contact (b), the absorber layer (c), a buffer layer (d), a TCO / window layer (e) and a front grid (f).
摘要:
A process for providing a protective coating to a metal surface comprises applying a nickel or tantalum plate layer to the surface and dispersing particles of a hard material such as diamond, alumina, vanadium nitride, tantalum carbide and/or tungsten carbide within the nickel or tantalum plate layer as the plating is occurring.
摘要:
Disclosed are a surface-treated titanium material that is excellent in oxidation resistance and allows the excellent oxidation resistance to last for a long period of time and the surface treatment itself to be applied safely at a low cost; the production method thereof; and an exhaust system thereof. A surface-treated titanium material produced by forming an oxidation-resistant baked film, 5 µm or more in thickness, on a substrate comprising commercially pure titanium or titanium-base alloy, and said baked film is formed by filling gaps among Al-alloy particles, the baked film comprising Al alloy containing Si by 10 at% or less or commercially pure aluminum with chemical compounds comprising a metallic element M (M represents one or more of Ti, Zr, Cr, Si and Al) and C and/or O.
摘要:
A method of forming a copper interconnect, comprising forming an opening in a dielectric layer disposed on a substrate, forming a barrier layer over the opening, forming a seed layer over the metal layer, and forming a copper-noble metal alloy layer by electroplating and/or electroless deposition on the seed layer. The copper-noble metal alloy improves the electrical characteristics and reliability of the copper interconnect.
摘要:
A plumbing fixture (10) for carrying drinking water comprised of metal, particularly of copper and its alloys with portions of zinc and lead, which is provided with a lining or coating of tin (18) disposed on at least the interior surface of the fixture.
摘要:
A solder-precoated wiring board on which devices and component can be mounted at fine pitches and which can be manufactured with a high productivity. A solder layer on a conductor for connection of electronic components on the wiring board comprises an Sn thin film layer formed by, for example, Cu-Sn substitution reaction on the basis of forming a Cu-complex of thiourea, and a Pb-coated Sn layer made by forming an Sn film, forming Sn crystalline particles film by Sn disproportionating reaction based on selective deposition on the Sn film, and substituting Pb for at least part of the Sn crystalline particles by Sn-Pb substituting reaction on the basis of the ionization tendency. It is desirable to melt this solder layer, and then, cool it to form an alloyed layer.
摘要:
A tin or tin-lead alloy electroless plating bath comprising (A) a stannous salt or a mixture of a stannous salt and a lead salt, (B) an acid, (C) thiourea or a thiourea derivative, and (D) a reducing agent is improved by adding (E) a nonionic surfactant and optionally, (F) a cationic surfactant, a nitrogenous heterocyclic compound or a derivative thereof, or alternatively by adding (G) an ammonium or quaternary ammonium ion. From the bath, uniform films of fine grains will chemically deposit on fine pitch printed wiring boards intended for SMT.