摘要:
Die Erfindung betrifft ein Verfahren zum Entfernen einer Schicht (4), insbesondere einer Lack- bzw. Farbschicht, von einer mit der Schicht (4) bedeckten Oberfläche (2), wobei Staub erzeugende Bearbeitungsschritte beim Entfernen der Schicht (4) vermieden werden. In einem Aspekt der Erfindung umfasst das Verfahren die folgenden Schritte: (i) Aufbringen eines flüssigen Mittels (6) zum Abbeizen, Aufweichen, Anlösen bzw. Ablösen, insbesondere eines Abbeizmittels, auf zumindest Teilbereiche der zu entfernenden Schicht (4), (ii) Entfernen von durch das Einwirken des flüssigen Mittels (6) aufgeweichten, angelösten bzw. abgelösten Teilen (10) der Schicht zumindest in Teilbereichen der Bereiche, wo das flüssige Mittel (6) aufgebracht worden ist, so dass zumindest in diesen Teilbereichen bloßliegende Teile (22) der Oberfläche entstehen, und (iii) Aufbringen von mindestens einer Grundierungsschicht (26) in zumindest Teilbereiche der in Schritt (ii) erzeugten bloßliegenden Teilen (22) der Oberfläche.
摘要:
Methods and apparatus are provided for igniting, modulating, and sustaining a plasma for various plasma processes and treatments. In one embodiment, a plasma is ignited by subjecting a gas in a multi-mode processing cavity to electromagnetic radiation having a frequency between about 1 MHz and about 333 GHz in the presence of a plasma catalyst, which may be passive or active. A passive plasma catalyst may include, for example, any object capable of inducing a plasma by deforming a local electric field. An active plasma catalyst can include any particle or high energy wave packet capable of transferring a sufficient amount of energy to a gaseous atom or molecule to remove at least one electron from the gaseous atom or molecule, in the presence of electromagnetic radiation.
摘要:
Methods and apparatus are provided for igniting, modulating, and sustaining a plasma for various plasma processes and treatments. In one embodiment, a plasma is ignited by subjecting a gas in a multi-mode processing cavity to electromagnetic radiation having a frequency between about 1 MHz and about 333 GHz in the presence of a plasma catalyst, which may be passive or active. A passive plasma catalyst may include, for example, any object capable of inducing a plasma by deforming a local electric field. An active plasma catalyst can include any particle or high energy wave packet capable of transferring a sufficient amount of energy to a gaseous atom or molecule to remove at least one electron from the gaseous atom or molecule, in the presence of electromagnetic radiation.
摘要:
It is an object of the present invention to provide a beneficial composition in order to detoxify the harmful compound containing arsenic etc. effectively and systematically and a method for detoxifying a harmful compound by using the composition. The composition for the alkylation according to the present invention is characterized in that the composition contains a cobalt complex. The method of detoxifying the harmful compound according to the present invention is characterized in that a harmful compound containing at least one element selected from the groups comprising arsenic, antimony and selenium is detoxified by the alkylation of the harmful compound, in the presence of the composition according to the present invention.
摘要:
A method includes producing an isolation atmosphere in a phase changing area above a reactant liquid and then injecting a feed material into the reactant liquid. The feed material includes a carbon-bearing material. The method further includes maintaining the molecules of the injected carbon-bearing material and any reaction products in contact with the reactant liquid for a period of time sufficient to liberate carbon atoms from the carbon-bearing material or reaction products from that material, and place the liberated carbon atoms in an excited state. Liberated carbon atoms in the excited state are then allowed to traverse a surface of the reactant liquid and flow along a particle formation path through the phase changing area so that the liberated carbon atoms may phase change to the ground state while suspended in the phase changing area.