摘要:
A method for the production of semiconductor devices, using liquid phase epitaxy of semiconductors of Groups III to V of the periodic table, in which on a Te-doped first layer, a second layer having a polarity different from that of the first layer is grown, wherein a non-Te-doped third layer having the same polarity as the first layer is grown between the first layer and the second layer.
摘要:
A surface electrode (316) on a surface (330) of a LED has a pad (318), and further, at least first-order branches (319a, ..., 319d) linearly extending from the pad (318), second-order branches (320a, 320b, and 320c) diverged and linearly extending from the first-order branches (319a, ..., 319d), and third-order branches (322a, 322b, and 322c) diverged and linearly extending from the second-order branches (320a, 320b, and 320c). The pad (318) out of the surface electrode (316) is not in electrical contact with a underlying semiconductor layer (331), whereas the surface electrode (316) and the semiconductor layer (331) are in electrical contact with each other at ends of the highest-order branches (322a, 322b, and 322c). Also, the semiconductor layer is provided along a pattern of the surface electrode in a mesa shape. Thus, ineffective light emission underneath the surface electrode (316) is relatively reduced so that external quantum efficiency can be improved, and moreover even shorter-wavelength light can be allowed to go out at high efficiency by omitting a current diffusion layer.
摘要:
A semiconductor laser device is disclosed which emits laser light from a facet. The semiconductor laser device comprises a multi-layered structure (12) formed on a semiconductor substrate (11), the multi-layered structure (12) having an AlGaAs active layer (16) for laser oscillation, and a protective film (17) formed on the facet, wherein a film containing sulfur (18) is provided between the facet and the protective film (17).
摘要:
A semiconductor laser device is disclosed which comprises a semiconductor substrate (1) having a ridge portion (9), the width of the ridge portion being smaller in the vicinity of the facets than in the inside of the device; a current blocking layer (2) formed on the substrate (1) including the ridge portion (9); at least one striped groove (11) formed on the center of the ridge portion (9) through the current blocking layer (2); and a multi-layered structure disposed on the current blocking layer (2), the multi-layered structure successively having a first cladding layer (3), an active layer (4) for laser oscillation, and a second cladding layer (5); wherein at least two side grooves (10) are symmetrically formed on both sides of the center region of the ridge portion (9) with the same width as that of the regions thereof near the facets. Also, disclosed is a method for producing the semiconductor laser device.
摘要:
A semiconductor laser device comprising a first layer that is of a first conductivity type; a second layer that is disposed on the first layer, the second layer having a forbidden bandgap smaller than that of the first layer and having a refraction index larger than that of the first layer; a third layer that is of a second conductivity type, the third layer being disposed over the second layer, having a forbidden bandgap larger than that of the second layer, and having a refraction index smaller than that of the second layer; a fourth layer that functions as a quantum well, the fourth layer being disposed between the second and third layers and the thickness of the fourth layer being the de Broglie's wavelength or less; and at least one striped mesa, the lower portion of which is constituted by the third layer, wherein the fourth layer has a forbidden bandgap that is larger than that of the energy of photons generated by the second layer, and moreover the fourth layer has the etching characteristics that are different from those of the third layer positioned just above the fourth layer.
摘要:
A semiconductor laser array device has a substrate (1) with first grooves (9) with a given pitch, a current blocking layer (6) with second grooves (91) disposed on the substrate (1) and a heterostructure multi-layered crystal (7,8,10,11,12,13) with an active layer (11) disposed on the current blocking layer (6). The position of each of the first grooves (9) is shifted half a pitch from that of each of the second grooves (91) in the area (A) corresponding to the laser oscillation operating area that is created within the active layer (11), but each of the first grooves (9) is positioned over each of the second grooves (91) in the area (B,C) corresponding to the non-laser oscillation operating area within the active layer (11). The second grooves (91) reach the substrate (1) through the current blocking layer (6) in the area (A) corresponding to the laser oscillation operating area, which results in current paths.