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31.发明公开Polykondensationsprodukte, Verfahren zu ihrer Herstellung und Verwendung 有权Verwendung von Polykondensationsprodukten
公开(公告)号：EP1380606A1
公开(公告)日：2004-01-14
申请号：EP03015076.7
申请日：2003-07-03
申请人： Bakelite AG
发明人： Suren, Josef
IPC分类号： C08G8/08
CPC分类号： C08G8/08
摘要： Die Erfindung betrifft Polykondensationsprodukte, hergestellt durch Umsetzung von Bisphenol-Rückständen mit einem Aldehyd in saurem Medium. Die Produkte eignen sich insbesondere zur Herstellung von feuerfesten Formkörpern, von ungeformten Massen, die im Feuerfestbereich eingesetzt werden sowie zusammen mit Pulverlackrückständen als Bindemittel oder Bindemittelkomponenten zur Herstellung von Faservlies-Formteilen.
摘要翻译： 在酸性介质中通过双酚残基与醛的反应获得的缩聚产物（I）。 还包括用于通过酸反应由双酚生产的残基与醛形成（I）的方法的独立权利要求。
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32.发明授权Novolak resin precursor, novolak resin and positive photoresist composition containing the novolak resin 失效酚醛清漆树脂的前体，酚醛清漆树脂和含有该混合物正性光刻胶。
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33.发明公开PREPARATION OF FRACTIONATED NOVOLAK RESINS BY A NOVEL EXTRACTION TECHNIQUE 审中-公开MANUFACTURING分馏的线型酚醛树脂，新的提取工艺
公开(公告)号：EP1133715A2
公开(公告)日：2001-09-19
申请号：EP99970846.4
申请日：1999-11-03
CPC分类号： G03F7/0236
摘要： The present invention provides a method for producing a film forming, fractionated novolak resin having consistent molecular weight and reduced polydispersity, by isolating such novolak resin fractions in a continuous fractionation and separation method using a liquid/liquid centrifuge, thereby reducing processing time and isolation steps which can cause undesirable changes in the novolak resin. A method is also provided for producing photoresist composition from such a fractionated novolak resin and for producing semiconductor devices using such a photoresist composition.
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34.发明授权FRACTIONATION OF PHENOL FORMALDEHYDE CONDENSATE AND PHOTORESIST COMPOSITIONS PRODUCED THEREFROM 失效苯酚 - 甲醛缩合物的分级和生产的光致抗蚀剂组合物
公开(公告)号：EP0851879B1
公开(公告)日：1999-07-21
申请号：EP96933043.0
申请日：1996-09-18
CPC分类号： C08G8/08 , G03F7/0236
摘要： A process for producing a water insoluble, aqueous alkali soluble, film forming novolak resin having low metal ions, made by the fractionation of a phenol formaldehyde condensation product, a process for producing a resin, a photoresist composition of superior quality containing such novolak resin, and a method for producing a semiconductor device using such photoresist composition.
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公开(公告)号：EP0621313B1
公开(公告)日：1998-07-15
申请号：EP94302908.2
申请日：1994-04-22
发明人： Nakamura, Hideo, c/o Mitsui Petrochem. Ind., Ltd. , Suzuki, Terufumi, c/o Mitsui Petrochem Ind., Ltd. , Yasuda, Kiyomi, c/o Mitsui Petrochemical Ind., Ltd
CPC分类号： H05K1/0326 , C08G8/08 , C08G59/08 , C08L63/04 , C08L61/04
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公开(公告)号：EP0628599A4
公开(公告)日：1995-07-12
申请号：EP94903051
申请日：1993-12-24
申请人： SUMITOMO CHEMICAL CO
CPC分类号： G03F7/0236 , C08G8/08 , C08L61/06
摘要： A photosensitive resin composition for color filters, which comprises a novolak resin containing repeating units represented by general formula (I) and having a molecular weight of about 1,000 to 50,000, a solvent, and a dye or pigment, and which is excellent in various performances including resolution, heat resistance and transparency. In formula (I) R1 through R5 represent each hydrogen, alkyl, etc.; and R6 and R7 represent each hydrogen, alkyl, etc., provided that the alpha group is located at the o- or p-position with respect to the OH group.
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公开(公告)号：EP0615985A2
公开(公告)日：1994-09-21
申请号：EP94101591.9
申请日：1994-02-03
申请人： Bakelite AG
IPC分类号： C08G8/08
CPC分类号： C08J5/24 , C08G8/08 , C08J2361/06
摘要： Das erfindungsgemäße Bindemittelsystem besteht aus einem Resol mit einem freien Aldehydgehalt von maximal 0,3 % und einem Salz einer Verbindung, die mit Aldehyd reagieren kann. Das System ist lagerstabil und härtet bei Erwärmung innerhalb kurzer Zeit.
摘要翻译： 根据本发明的粘合剂体系包括游离醛含量最高为0.3％的甲阶酚醛树脂和可与醛反应的化合物的盐。 该系统具有较长的保存期限，并在短时间内变暖。
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公开(公告)号：EP0533722B1
公开(公告)日：1994-08-10
申请号：EP91910555.1
申请日：1991-06-11
CPC分类号： C08G8/08
摘要： A phenol resin is produced by reacting phenolic compounds, preferably compounds based on bisphenol, in particular bis(hydroxyphenyl)alkane, with formaldehyde and/or a formaldehyde-splitting compound in the presence of a catalyst. The ratio of the total number of reactive sites (A) in the phenol resin to the total number of sites (B) in the phenol resin to which formaldehyde is added, to the total number of sites (C) in the phenol resin in which two molecules of the phenolic compounds are condensed with each other through a methylene group, is as follows: (A):(B):(C)=1:(0.85 to 1.0):(less than or equal to 0.05, in particular less than or equal to 0.02). The phenol resin is produced in a relatively short reaction time of not more than 15 minutes.
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公开(公告)号：EP0416864A3
公开(公告)日：1992-04-29
申请号：EP90309653.5
申请日：1990-09-04
IPC分类号： C08G8/08
CPC分类号： C12P7/22 , C08G8/08 , Y10T428/31536
摘要： A suspension of a phenolic resin containing residual phenols is treated by adding a peroxidase enzyme and a peroxide material or an oxidase enzyme and an oxygen material to the suspension to polymerize residual phenolic monomer.
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公开(公告)号：EP0399691A3
公开(公告)日：1991-04-03
申请号：EP90304969.0
申请日：1990-05-09
CPC分类号： C08G8/08
摘要： A method for preparing branched novolak polymers possessing excellent lithographic performance is provided. The method involves the acid catalyzed reaction of a tris- or tetrakis(dialkylaminoalkyl) phenol or bisphenol with one or more phenol having at least one unsubstituted ortho- or para- ring position. The branched novolaks are soluble in aqueous base and organic solvent solutions and are particularly useful as the polyeric component of either positive-acting or negative-acting photoresist compositions.
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