DEVICE DESIGN FOR SHORT CIRCUIT PROTECTION OF TRANSISTORS

    公开(公告)号:EP4380056A3

    公开(公告)日:2024-08-07

    申请号:EP24170557.3

    申请日:2020-06-05

    申请人: Wolfspeed, Inc.

    IPC分类号: H03K17/082 H03K17/74

    摘要: A transistor semiconductor die includes a first current terminal, a second current terminal, and a control terminal. A semiconductor structure is between the first current terminal, the second current terminal, and the control terminal and configured such that a resistance between the first current terminal and the second current terminal is based on a control signal provided at the control terminal. Short circuit protection circuitry is coupled between the control terminal and the second current terminal. In a normal mode of operation, the short circuit protection circuitry is configured to provide a voltage drop that is greater than a voltage of the control signal. In a short circuit protection mode of operation, the short circuit protection circuitry is configured to provide a voltage drop that is less than a voltage of the control signal.

    MIX DOPING OF A SEMI-INSULATING GROUP III NITRIDE

    公开(公告)号:EP4254506A2

    公开(公告)日:2023-10-04

    申请号:EP23170936.1

    申请日:2014-02-21

    申请人: Wolfspeed, Inc.

    IPC分类号: H01L29/36

    摘要: A semi-insulating Group III nitride buffer layer for a semiconductor device (30) having a top surface and a bottom surface comprises: a first doped portion (34) adjacent the bottom surface that is doped with iron; and a second doped portion (36) adjacent the top surface and on the first doped portion, the second doped portion doped with carbon. An iron doping concentration in the first doped portion exceeds a carbon doping concentration of the first doped portion. A carbon doping concentration exceeds an iron doping concentration in only a top part of the second doped portion. The second doped portion has a graded doping concentration in which the iron doping concentration decreases with increasing distance from the first doped portion and the carbon doping concentration increases with increasing distance from the first doped portion.