公开(公告)号：EP2896061A1

公开(公告)日：2015-07-22

申请号：EP13767152.5

申请日：2013-09-16

申请人： Delmic B.V.

发明人： HOOGENBOOM, Jacob Pieter ,  ZONNEVYLLE, Aernout Christiaan ,  KRUIT, Pieter ,  NARVÁEZ-GONZÁLEZ, Angela Carolina

IPC分类号： H01J37/22

CPC分类号： H01J37/023 ,  H01J37/222 ,  H01J37/228 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/2482 ,  H01J2237/2801 ,  H01J2237/2808

摘要： The present invention relates to a method for mutually aligning a scanning electron microscope SEM and a light microscope LM by creating a change (61) in the detected light signal of the light microscope LM by illuminating a substrate with an electron beam, correlating the position of the electron beam in the coordinate system of the scanning electron microscope SEM to the position of the observed change in the detected light signal in the coordinate system of the light microscope LM, and relatively shifting the scanning electron microscope SEM and the light microscope LM with respect to one another to a desired relative position of the coordinate systems (60, 62).

公开(公告)号：EP2558839A4

公开(公告)日：2014-06-18

申请号：EP11769335

申请日：2011-04-08

申请人： GATAN INC

发明人： HUNT JOHN ANDREW ,  COYLE STEVEN THOMAS

IPC分类号： G01N1/32 ,  H01J37/31

CPC分类号： G01N1/44 ,  G01N1/32 ,  H01J37/023 ,  H01J37/31 ,  H01J2237/0245 ,  H01J2237/2007 ,  H01J2237/3118

公开(公告)号：EP2558839A2

公开(公告)日：2013-02-20

申请号：EP11769335.8

申请日：2011-04-08

申请人： Gatan, Inc.

发明人： HUNT, John Andrew ,  COYLE, Steven Thomas

IPC分类号： G01N1/28 ,  H01J37/20

CPC分类号： G01N1/44 ,  G01N1/32 ,  H01J37/023 ,  H01J37/31 ,  H01J2237/0245 ,  H01J2237/2007 ,  H01J2237/3118

摘要： Disclosed are embodiments of an ion beam sample preparation apparatus and methods for using the embodiments. The apparatus comprises a tilting ion beam irradiating means in a vacuum chamber that may direct ions toward a sample, a shield blocking a portion of the ions directed toward the sample, and a shield retention stage with shield retention means that replaceably and removably holds the shield in a position. Complementary datum features on both shield and shield retention stage enable accurate and repeatable positioning of the sample in the apparatus for sample processing and reprocessing. The tilting ion beam irradiating means may direct ions at the sample from more than one tilt angle. A rotating shield retention stage is also disclosed which works in concert with the tilting ion beam irradiating means to improve the flexibility and efficiency of the apparatus in preparing samples for microscopic observation.

摘要翻译： 公开了离子束样品制备装置的实施例和使用这些实施例的方法。 该装置包括：可在真空室中引导离子朝向样品的倾斜离子束照射装置;阻挡朝向样品的一部分离子的屏蔽;以及屏蔽保持装置，其具有屏蔽保持装置，屏蔽保持装置可替换地且可移除地保持屏蔽 在一个位置。 屏蔽和屏蔽保持台上的互补基准特征使得样品在样品处理和再处理过程中能够准确且可重复地定位在装置中。 倾斜离子束照射装置可以从多于一个倾角引导样品中的离子。 还公开了一种旋转护罩保持台，其与倾斜离子束照射装置协同工作，以提高设备在制备用于显微镜观察的样品中的灵活性和效率。

公开(公告)号：EP2105943A3

公开(公告)日：2011-05-11

申请号：EP09156379.1

申请日：2009-03-27

申请人： FEI COMPANY

发明人： Buijsse, Bart

IPC分类号： H01J37/02 ,  H01J37/16 ,  H01J37/28 ,  H01J37/305

CPC分类号： H01J37/023 ,  H01J37/16 ,  H01J37/28 ,  H01J37/3056 ,  H01J2237/188 ,  H01J2237/2003 ,  H01J2237/2608 ,  H01J2237/31749

摘要： The invention relates to an environmental cell for use in e.g. an electron microscope. The environmental cell shows an aperture (15) for passing the beam produced by the electron microscope to a sample (6) placed inside the environmental cell. The environmental cell according to the invention is characterized in that a part of the environmental cell (14) is transparent to secondary radiation such as back-scattered electrons or X-rays. This enables the detection of this radiation by a detector placed outside the environmental cell and thus a much simpler construction of the cell.

公开(公告)号：EP2145717B1

公开(公告)日：2011-03-23

申请号：EP09008404.7

申请日：2009-06-26

申请人： Global Beam Technologies AG.

发明人： Vokurka, Franz

IPC分类号： B23K15/00 ,  B23K15/06 ,  H01J37/16 ,  H01J37/18

CPC分类号： B23K15/06 ,  B23K15/002 ,  H01J37/023 ,  H01J37/147 ,  H01J37/16 ,  H01J37/315 ,  H01J2237/0245 ,  H01J2237/1503 ,  H01J2237/166

公开(公告)号：EP2226831A1

公开(公告)日：2010-09-08

申请号：EP10250366.1

申请日：2010-03-02

申请人： JEOL Ltd.

发明人： Hosokawa, Fumio

IPC分类号： H01J37/28 ,  H01J37/153 ,  H01J37/09 ,  H01J37/02

CPC分类号： H01J37/28 ,  H01J37/023 ,  H01J37/09 ,  H01J37/153 ,  H01J2237/0453 ,  H01J2237/0458 ,  H01J2237/1534 ,  H01J2237/2802 ,  H01J2237/2823

摘要： An electron microscope (1) is offered which facilitates aberration correction even during high-magnification imaging. The microscope (1) has a spherical aberration corrector (14), a transfer lens (15) system mounted between the corrector (14) and an objective lens (17), an aperture stop (13) mounted in a stage preceding the corrector (14) so as to be movable relative to the optical axis (2), and an angular aperture stop (16) mounted at or near the principal plane of the transfer lens system (15) movably relative to the optical axis (2) to adjust the angular aperture of the electron beam (3).

摘要翻译： 提供了一种电子显微镜（1），即使在高倍率成像过程中也能够进行像差校正。 显微镜（1）具有球面像差校正器（14），安装在校正器（14）和物镜（17）之间的传送透镜（15）系统，安装在校正器之前的级中的孔径光阑（13） （15）相对于光轴（2）可移动地安装在角度孔径光阑（16）上，以便相对于光轴（2）移动地调节角度孔径光阑（16） 电子束（3）的角度孔径。

公开(公告)号：EP2056331A3

公开(公告)日：2010-04-14

申请号：EP08253537.8

申请日：2008-10-29

申请人： SII Nano Technology Inc.

发明人： Takahashi, Haruo ,  Nakatani, Ikuko ,  Tashiro, Junichi

IPC分类号： H01J37/02 ,  H01J37/20 ,  H01J37/305 ,  B25J7/00 ,  G01N1/28

CPC分类号： H01J37/20 ,  H01J37/023 ,  H01J37/3056 ,  H01J2237/202 ,  H01J2237/204 ,  H01J2237/2062 ,  H01J2237/208 ,  H01J2237/31745 ,  H01J2237/31749

摘要： After a certain direction of a sample piece is allowed to coincide with an intersection line made by two planes of a surface of the sample (7) and a conical side plane (10) obtained by rotating, around a manipulator rotation axis (2), a line segment which is vertical to the surface of the sample and of which one end is an intersection of the surface of a sample and the manipulator rotation axis, the sample piece is supported by a manipulator (1) and the manipulator rotation axis is operated.

公开(公告)号：EP1662543A3

公开(公告)日：2009-11-04

申请号：EP05255331.0

申请日：2005-08-31

申请人： SEN Corporation, an SHI and Axcelis Company

发明人： Kabasawa, Mitsuaki ,  Tsukihara, Mitsukuni ,  Sogabe, Hiroshi

IPC分类号： H01J37/317

CPC分类号： H01J37/3171 ,  H01J27/024 ,  H01J37/023 ,  H01J37/05 ,  H01J37/09 ,  H01J37/1474 ,  H01J37/1478 ,  H01J37/15 ,  H01J37/3007 ,  H01J2237/0213 ,  H01J2237/022 ,  H01J2237/0458 ,  H01J2237/047 ,  H01J2237/0492 ,  H01J2237/061 ,  H01J2237/0835 ,  H01J2237/1536 ,  H01J2237/24405 ,  H01J2237/24507 ,  H01J2237/30477 ,  H01J2237/31705

摘要： Irradiation system that comprises a beam generation source (1), a mass analysis device (3), a beam transformer, a deflector (7) for scanning which swings the beam reciprocally, a beam parallelizing device (10,29), an acceleration/deceleration device (11,12), and an energy filtering device (18), and a hybrid angular energy filter (18) generating both electric and magnetic fields to ajust trajectories is provided as the energy filtering device, along with a pair of multi-surface energy slit units (19,19') each having a plurality of energy slits that are switchable therebetween depending on an ion species for irradiation are further provided on a downstream side of the hybrid angular energy filter. It is possible to selectively irradiate a target wafer with high-current beams from low energy to high energy in the conditions where contamination such as neutral particles, different kinds of dopants, ions with different energies, metal, and dust particles is extremely small in amount.

公开(公告)号：EP2026373A1

公开(公告)日：2009-02-18

申请号：EP07015469.5

申请日：2007-08-07

申请人： Micronas GmbH

发明人： Kienlen, Gabriel

IPC分类号： H01J37/02

CPC分类号： H01J37/023 ,  H01J2237/31701

摘要： Eine Positioniereinrichtung (5) zum Positionieren einer Blende (4) in einem Ionenstrohl (3) einer Ionen-Implantationsanlage (1) hat zwei mittels mindestens eines Positionierantriebs (10a, 10b, 10c) relativ zueinander verstellbare Vorrichtungsteile (7, 8), von denen das eine mit einer ortsfest zu einer Ionenstrahlquelle angeordneten Widerlagerstelle (9) und das andere mit der Blende (4) verbindbar oder verbunden ist. Eine Justiereinrichtung weist eine Verstelleinrichtung und einer Anzeigeeinrichtung auf. Mittels der Verstelleinrichtung ist die Position mindestens eines der Vorrichtungsteile (7, 8) relativ zu dem Positionierantrieb (10a, 10b, 10c) veränderbar. Mittels der Anzeigeeinrichtung ist überprüfbar, ob sich die Vorrichtungsteile (7, 8) in einer vorbestimmten Lage relativ zueinander befinden. Die Anzeigeeinrichtung weist an dem ersten Vorrichtungsteil (7) oder einem fest damit verbundenen Teil mindestens eine Referenzmarke (18a, 18b) und an dem zweiten Vorrichtungsteil (8) mindestens eine optische Projektionseinrichtung (17) auf, mittels der auf das erste Vorrichtungsteil (7) wenigstens eine optische Markierung projizierbar ist, die der mindestens einen Referenzmarke (18a, 18b) zugeordnet ist.

摘要翻译： 调节装置具有固定装置，其改变可移动夹具（7,8）相对于定位驱动器的位置。 显示装置检查可移动固定装置是否相对于彼此位于预设位置。 使用显示装置的光学投影装置将光学标记分配给可动夹具（7）上的参考标记。 离子注入系统包含独立权利要求。

公开(公告)号：EP1577929A3

公开(公告)日：2006-10-11

申请号：EP05005017.8

申请日：2005-03-08

申请人： CANON KABUSHIKI KAISHA

发明人： Uchida, Shinji

IPC分类号： H01J37/317 ,  H01J37/02

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/023 ,  H01J2237/0216 ,  H01J2237/0245

摘要： An electron beam exposure apparatus comprising: column 1 for irradiating an electron beam to wafer 10 serving as a sample; sample chamber 3 having vacuum pump 40 as a vacuum exhaustion unit for controlling the internal unit to a vacuum atmosphere; stage 4A arranged in the sample chamber 3 for holding and moving the wafer 10; and first mounting 5A for elastically supporting the column 1 with respect to the sample chamber 3.