公开(公告)号：EP3172758B1

公开(公告)日：2024-08-21

申请号：EP15747240.8

申请日：2015-07-20

IPC: H01J37/22 ,  G01N21/64 ,  G01N23/2251

CPC classification number: G01N21/6458 ,  H01J2237/200320130101 ,  H01J2237/282620130101 ,  G01N23/2251 ,  H01J37/228

公开(公告)号：EP3332417A1

公开(公告)日：2018-06-13

申请号：EP17807686.5

申请日：2017-05-10

Applicant: Focus-eBeam Technology (Beijing) Co., Ltd.

Inventor： HE, Wei ,  LI, Shuai ,  WANG, Peng

IPC: H01J37/26

CPC classification number: G01N21/84 ,  G01N21/6458 ,  G01N21/65 ,  G01N23/2251 ,  H01J37/18 ,  H01J37/20 ,  H01J37/228 ,  H01J37/26 ,  H01J2237/2006

Abstract: A charged particle beam system includes: a particle source (101), a column (103) and a specimen chamber (105) with a first movable vacuum window (106). The particle source (101) is configured to generate a charged particle beam (102) which impinges the specimen (114) to be detected placed in a specimen chamber (105). The column (103) includes a deflection device (104) for deflecting the charged particle beam (102) and a focusing device (113) for focusing the charged particle beam (102). The charged particle beam system is compatible with multiple external optical systems to achieve simultaneous detection or fast-switching detection of the specimen.

公开(公告)号：EP2946398B1

公开(公告)日：2018-03-07

申请号：EP14701440.1

申请日：2014-01-20

Applicant: Delmic B.V.

Inventor： HOOGENBOOM, Jacob Pieter ,  HARING, Martijn Theo

IPC: H01J37/22 ,  H01J37/30 ,  H01J37/304 ,  G02B21/36

CPC classification number: H01J37/22 ,  G02B21/367 ,  H01J37/228 ,  H01J37/3005 ,  H01J37/3045 ,  H01J2237/225 ,  H01J2237/2482

Abstract: The invention relates to an apparatus and method for inspecting a sample, provided with an optical microscope to observe a region of interest on a sample and a charged particle system generating a focused charged particle beam to observe or modify the same or parts of the same region of interest, the apparatus provided with a control unit for electronically controlling said systems, adapted for recording two or more spectrally separated images of the region of interest on the sample, the control unit adapted for acquiring processing and representing the images as detected with said optical and said charged particle microscope systems, the unit further adapted for performing a registration procedure mutually correlating a region of interest in the optical images, wherein the apparatus is adapted for using a detection of a change in the optical images as caused therein by the charged particle beam for correlating said images.

公开(公告)号：EP3270404A1

公开(公告)日：2018-01-17

申请号：EP16179172.8

申请日：2016-07-13

Applicant: FEI Company

Inventor： Bosch, Eric

IPC: H01J37/22 ,  H01J37/28

CPC classification number: H01J37/222 ,  H01J37/20 ,  H01J37/228 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/226 ,  H01J2237/2614

Abstract: A method of imaging a specimen using ptychography, whereby a charged-particle beam is directed from a source through an illuminator so as to traverse the specimen and land upon a detector, an output of the detector being used in combination with a mathematical reconstruction technique so as to calculate at least one property of a chargedparticle wavefront exiting the specimen, wherein:
- Said property is a phase of the wavefront;
- Said mathematical reconstruction technique directly reconstructs said phase, rather than deriving it indirectly from a reconstructed function of amplitude and phase.

Abstract translation: 一种使用ptychography对样本成像的方法，其中带电粒子束从源通过照射器引导以穿过样本并落在检测器上，检测器的输出与数学重建技术结合使用，如此 以计算离开样本的带电粒子波前的至少一个特性，其中： - 所述特性是波前的相位; - 所述数学重建技术直接重建所述相位，而不是从振幅和相位的重构函数间接推导出。

公开(公告)号：EP3146374A1

公开(公告)日：2017-03-29

申请号：EP15730863.6

申请日：2015-05-22

Applicant: Delmic B.V.

Inventor： NARVAEZ, Angela Carolina ,  LIV HAMARAT, Nalan ,  KRUIT, Pieter ,  HOOGENBOOM, Jacob Pieter

IPC: G02B21/00 ,  G02B21/24 ,  G02B21/26 ,  H01J37/02 ,  H01J37/22

CPC classification number: G02B21/0004 ,  G02B21/002 ,  G02B21/241 ,  G02B21/26 ,  H01J37/023 ,  H01J37/228 ,  H01J2237/216

Abstract: The invention relates to a method for positioning a focal plane of a light imaging device at a surface of a substrate, wherein the substrate emits light when irradiated with charged particles. The method comprises the steps of: i. irradiating the substrate with a beam of charged particles having a set charged particle beam energy; ii. moving the focal plane of the light imaging device at least in a direction towards or away from the substrate and measuring an intensity of the emitted light as a function of the position of said focal plane with respect to the substrate; and iii. setting the focal plane at a focal position with respect to the substrate, said focal position being determined using the measured dependence of the intensity of the light signal as a function of the position. Preferably the method steps are subsequently repeated using a reduced charged particle beam energy.

Abstract translation: 本发明涉及一种用于在基板的表面定位的光成像装置的焦平面，worin发光当与带电粒子照射的基片的方法。 该方法包括以下步骤：i。 与具有粒子束能量带电组带电粒子的束照射所述衬底; II。 在朝向或远离基板和所发射的光作为所述焦平面相对于基板上的位置的函数的强度的测量离开的方向至少移动光成像装置的焦平面; 和iii。 在相对于基板的焦点位置设定焦平面，所述焦点位置被确定使用所测量的光信号作为位置的函数的强度的依赖性开采。 优选使用的是降低带电粒子束的能量随后重复所述方法步骤。

公开(公告)号：EP3113207A1

公开(公告)日：2017-01-04

申请号：EP15174195.6

申请日：2015-06-29

Applicant: FEI Company

Inventor： Parker, N. William ,  Straw, Marcus ,  Filevich, Jorge ,  Botman, Aurélien ,  Utlaut, Mark ,  Randolph, Steven ,  Chandler, Clive

IPC: H01J37/22

CPC classification number: H01J37/228 ,  H01J2237/31744

Abstract: A method and apparatus for directing light or gas or both to a specimen positioned within about 2 mm from the lower end of a charged particle beam column. The charged particle beam column assembly includes a platform defining a specimen holding position and has a set of electrostatic lenses each including a set of electrodes. The assembly includes a final electrostatic lens that includes a final electrode that is closest to the specimen holding position. This final electrode defines at least one internal passageway having a terminus that is proximal to and directed toward the specimen holding position.

Abstract translation: 一种用于将光或气体或两者引导到位于距带电粒子束柱的下端约2mm内的样本的方法和装置。 带电粒子束列组件包括限定样品保持位置的平台，并具有一组静电透镜，每组包括一组电极。 组件包括最终静电透镜，其包括最靠近样品保持位置的最终电极。 该最终电极限定至少一个内部通道，其具有靠近并指向试样保持位置的终端。

公开(公告)号：EP2991097B1

公开(公告)日：2016-11-23

申请号：EP14002946.3

申请日：2014-08-25

Applicant: Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V.

Inventor： Sarvari, Nahid Talebi

IPC: H01J37/22 ,  H01J37/244 ,  H01J37/26 ,  G01N21/00 ,  G01N23/00

CPC classification number: H01J37/228 ,  G01N23/2251 ,  H01J37/226 ,  H01J37/244 ,  H01J37/26 ,  H01J2237/2445 ,  H01J2237/24475 ,  H01J2237/24585 ,  H01J2237/2626

Abstract: A method of time-resolved pump-probe electron microscopy, comprises the steps of irradiating a sample (1) with a photonic pump pulse (2) being directed on a pump pulse path (3) from a photonic source to the sample (1), irradiating the sample (1) with an electron probe pulse (4) being directed on an electron pulse path (5) from an electron pulse source (10) to the sample (1), wherein the photonic pump pulse (2) and the electron probe pulse (4) arrive at the sample (1) with a predetermined temporal relationship relative to each other, and detecting a sample response to the electron probe pulse (4) irradiation with a detector device (20), wherein the photonic source comprises a photonic lattice structure (30) being arranged adjacent to the electron pulse path (5), and the photonic pump pulse (2) is created by an interaction of the electron probe pulse (4) with the photonic lattice structure (30). Furthermore, an electron microscopy apparatus, configured for time-resolved pump-probe electron microscopy, and a sample supply device (200) for an electron microscopy apparatus (100) are described.

公开(公告)号：EP2946398A1

公开(公告)日：2015-11-25

申请号：EP14701440.1

申请日：2014-01-20

Applicant: Delmic B.V.

Inventor： HOOGENBOOM, Jacob Pieter ,  HARING, Martijn Theo

IPC: H01J37/22 ,  H01J37/30 ,  H01J37/304 ,  G02B21/36

CPC classification number: H01J37/22 ,  G02B21/367 ,  H01J37/228 ,  H01J37/3005 ,  H01J37/3045 ,  H01J2237/225 ,  H01J2237/2482

Abstract: The invention relates to an apparatus and method for inspecting a sample, provided with an optical microscope to observe a region of interest on a sample and a charged particle system generating a focused charged particle beam to observe or modify the same or parts of the same region of interest, the apparatus provided with a control unit for electronically controlling said systems, adapted for recording two or more spectrally separated images of the region of interest on the sample, the control unit adapted for acquiring processing and representing the images as detected with said optical and said charged particle microscope systems, the unit further adapted for performing a registration procedure mutually correlating a region of interest in the optical images, wherein the apparatus is adapted for using a detection of a change in the optical images as caused therein by the charged particle beam for correlating said images.

Abstract translation: 本发明涉及一种用于检查样品的装置和方法，其具有光学显微镜以观察样品上的感兴趣区域和产生聚焦带电粒子束的带电粒子系统以观察或修改相同或相同区域的相同或部分 所述设备设置有用于电子控制所述系统的控制单元，适用于在所述样本上记录所述感兴趣区域的两个或多个频谱分离的图像，所述控制单元适于获取处理并表示所述图像， 和所述带电粒子显微镜系统，所述单元还适于执行将所述光学图像中的感兴趣区域相互关联的登记过程，其中所述装置适于使用由所述带电粒子在其中引起的光学图像的变化的检测 用于使所述图像相关联。

公开(公告)号：EP2870497A1

公开(公告)日：2015-05-13

申请号：EP13739852.5

申请日：2013-07-04

Applicant: Delmic B.V.

Inventor： HOOGENBOOM, Jacob Pieter ,  ZONNEVYLLE, Aernout Christiaan

IPC: G02B21/00 ,  G02B21/33 ,  H01J37/22

CPC classification number: G02B21/0004 ,  G02B21/0088 ,  G02B21/33 ,  H01J37/228 ,  H01J37/28 ,  H01J2237/18 ,  H01J2237/2002 ,  H01J2237/2003 ,  H01J2237/2608

Abstract: The invention relates to an apparatus for inspecting a sample, said apparatus equipped with a charged particle column for producing a focused beam of charged particles to observe or modify the sample, an optical microscope to observe the sample through a microscope slide, a vacuum chamber that contains the microscope slide and at least the objective lens of the optical microscope, wherein a liquid is included between the objective lens of the microscope and the microscope slide, directly in between objective lens and slide.

公开(公告)号：EP2741310A1

公开(公告)日：2014-06-11

申请号：EP14156672.9

申请日：2011-04-29

Applicant: Centre National de la Recherche Scientifique ,  Université Paris-Sud 11 (Paris XI)

Inventor： Kociak, Mathieu ,  Zagonel, Luiz Fernando ,  Tence, Marcel ,  Mazzucco, Stefano

IPC: H01J37/02 ,  H01J37/244 ,  H01J37/256

CPC classification number: G01N23/2254 ,  G01N2201/08 ,  H01J37/228 ,  H01J37/244 ,  H01J37/261 ,  H01J37/28 ,  H01J2237/024 ,  H01J2237/063 ,  H01J2237/24475 ,  H01J2237/2448 ,  H01J2237/24485 ,  H01J2237/2602 ,  H01J2237/2802 ,  H01J2237/2808

Abstract: L'invention concerne un système de détection de cathodoluminescence comprenant une source de particules chargées éclairant un échantillon avec un faisceau de particules chargées, et un chemin optique comprenant au moins deux éléments optiques pour collecter et transporter un rayonnement lumineux provenant dudit échantillon éclairé vers des moyens d'analyse, caractérisé en ce que chaque élément optique est choisi de sorte que :
- l'angle maximal de sortie dudit élément optique est inférieur ou égal à 120% de l'angle maximal d'acceptance de l'élément optique suivant ; et
- le diamètre du rayonnement provenant dudit élément optique dans le plan d'entrée de l'élément optique suivant est inférieur ou égal à 120% du diamètre utile d'entrée de l'élément optique suivant.

Abstract translation: 所述可调节系统包括用于收集从通过带电粒子的束照射的样品所获得的光辐射并反射的光辐射引导到分析单元，用于定位所述收集光学器件沿维度外部圆筒形管的单元的收集光学器件（112） 也被置于相对于在由收集光学器件的反射光辐射的传播轴和刚性地固定到所述收集光学器件，而在接收的光辐射适配单元外缸（306）放置内部圆筒形管。 所述可调节系统包括用于收集从通过带电粒子的束照射的样品所获得的光辐射并反射的光辐射引导到分析单元，用于定位所述收集光学器件沿维度外部圆筒形管的单元的收集光学器件（112） 也被置于相对于在由收集光学器件，用于接收所述光辐射适配单元注入的光反射，并刚性地固定到收集光学器件到外缸（306）放置内部圆筒形管的光辐射的传播轴 在辐射在光纤（116），用于在光辐射，用于分析由收集光学器件收集的光辐射的单元，和一个密封单元的传播方向相反发射光束传播的光的来源。 所述定位单元包括用于沿的空间，对于在旋转轴周围旋转的收集光学器件的单元，并且可动转盘方向的收集光学器件的水平方向的移动的元素。 收集光学器件包括抛物面反射镜，并用一个聚光透镜相关联的平面镜或椭圆形的并放置在平面镜的下游，并且被集成到可动转盘。 内筒是自由地相对于外筒旋转。 适配单元被配置为适应角度和大小的光辐射收集gemäß的尺寸，并在检测器或光纤的开口的，并且在收集光学器件的下游。 光束被引导朝向由收集光学器件的样品。 所述分析单元包括分光计，电荷耦合器件照相机或光电倍增管。 收集光学器件在压力这是小于在大气压下的室（302）放置。 所述适配单元在将压力比在腔室中的压力大一个环境放置。 密封单元在所述室和所述适配单元，以保持在所述腔室中的压力之间放置。 一个独立的claimsoft包括用于显微镜。