摘要:
A process for coating a part comprises the steps of providing a chamber (12) which is electrically connected as an anode, placing the part (16) to be coated in the chamber, providing a cathode (22) formed from a coating material to be deposited and platinum, and applying a current to the anode and the cathode to deposit the coating material and the platinum on the part.
摘要:
An arc evaporation source (101) according to one embodiment of the present invention comprises: a ring-shaped circumferential magnet (103) which is so arranged as to surround the outer circumference of a target (102) along a direction in which the direction of magnetization becomes parallel with the front surface of the target; and a rear surface magnet (104) which is arranged on the rear surface side of the target (102) along a direction in which the direction of magnetization becomes perpendicular to the front surface of the target. The magnetic pole of the circumferential magnet (103) on the inner side in the radial direction and the magnetic pole of the rear surface magnet (104) on the target (102) side have the same polarity as each other.
摘要:
The present invention relates to a cutting tool insert machining by chip removal comprising a body of a hard alloy of cemented carbide, cermet, ceramics, cubic boron nitride based material or high speed steel, onto which a hard and wear resistant coating is deposited by physical vapor deposition (PVD) Said coating comprises at least one polycrystalline nanolaminated structure comprising sequences of alternating A and B layers, where said layer A is (Al x1 Me 1-x1 )N y1 with 0.3 1-x2-z2 Si x2 Me2 z2 )N y2 with 0
摘要:
The present invention relates to a cutting tool insert comprising a body of a hard alloy of cemented carbide, cermet, ceramics, cubic boron nitride based material or high speed steel a hard and wear resistant coating, comprising one or several layers, at least one of which an (Al,Cr) 2 O 3 layer is applied. This invention is particularly useful for machining of steel and stainless steel. The coating, with a total thickness of 1 - 20 µm comprises one or several layers, at least one of which is an (Al,Cr) 2 O 3 layer with a thickness of 0.5 - 10 µm having a corundum phase crystalline structure and a composition (Al 1-y Cr y ) 2 O 3 with 0.5≤y≤0.7. The (Al,Cr) 2 O 3 layer is further characterized having a fiber texture with rotational symmetry in the direction of the coated surface normal with an inclination angle, ϕ, of the basal planes relative to the coated surface normal or the inclination angle, ϕ, for the highest peak in the pole plot with 0°
摘要:
Die vorliegende Erfindung betrifft eine Vakuumbeschichtungsanlage umfassend zumindest eine Arcquelle mit einer Kathode und einer Anode sowie ein mit der Kathode elektrisch verbundenes Target (1) mit einer Targetoberfläche (2). In einer Ausführungsvariante umfasst die Vakuumbeschichtungsanlage ferner ein aus zumindest einer im Wesentlichen axial gepolten Spule bestehendes Magnetsystem (8) zur Erzeugung eines kleinen, im Wesentlichen zur Targetoberfläche (2) senkrechten, äusseren Magnetfelds. In einer weiteren Ausführungsvariante umfasst die Vakuumbeschichtungsanlage ferner ein zwischen der Kathode und der Anode angeordneter, von beiden elektrisch isolierter Begrenzungsring (3) zur Begrenzung des Funkens auf der Targetoberfläche.
摘要:
The invention relates to a process and an evaporator (12, 14, 62, 64, 66, 68) for coating a substrate by means of an arc in a vacuum chamber (10) in the case of low-pressure arc evaporation, wherein the vacuum chamber (10) has at least one evaporator (12, 14, 62, 64, 66, 68), which comprises a target material (20), reactive gas supply lines (53, 54) for supplying reactive gas, and a vacuum pump, wherein the evaporator (12, 14, 62, 64, 66, 68) comprising the target material (20) serves as the cathode and the inner wall (36) of the vacuum chamber (10) serves as the anode between which the arc is generated. According to the invention, high-melting metal is used as the target material (20) for catalysis, and the pressure in the vacuum chamber (20) during coating is at least 0.5 Pa, in particular at least 3 Pa, preferably 5 Pa. A layer of catalytically active metal having a high oxygen content is formed on the substrate.
摘要:
The present invention relates to a method for depositing mixed crystal layers having at least two different metals (M1, M2) on a substrate by means of a PVD method. In order to provide a method for depositing mixed crystal layers having at least two different metals on a substrate by means of a PVD method, by means of which mixed crystal layers that are as free as possible from macroparticles (droplets) and that have as great a proportion as possible of a desired crystalline phase and that are highly crystalline are obtained, the deposition of the mixed crystal layer is performed while simultaneously applying I) the cathode sputtering method of dual magnetron sputtering or high power impulse magnetron sputtering (HIPIMS) and ii) arc vaporization (arc PVD).