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    WAFER LEVEL SPECTROMETER
    61.
    发明公开
    WAFER LEVEL SPECTROMETER 审中-公开
    光谱仪在晶片级

    公开(公告)号：EP2721381A2

    公开(公告)日：2014-04-23

    申请号：EP12800456.1

    申请日：2012-06-12

    Applicant: KLA-Tencor Corporation

    Inventor： JENSEN, Earl ,  SUN, Mei ,  O'BRIEN, Kevin

    IPC: G01J3/02

    CPC classification number: G01J3/0259 ,  G01J1/58 ,  G01J3/0205 ,  G01J3/021 ,  G01J3/0256 ,  G01J3/0262 ,  G01J3/36 ,  G01J2003/1213

    Abstract: A sensor apparatus for measuring characteristics of optical radiation has a substrate and a low profile spectrally selective detection system located within the substrate at one or more spatially separated locations. The spectrally selective detection system includes a generally laminar array of wavelength selectors optically coupled to a corresponding array of optical detectors. It is emphasized that this abstract is provided to comply with the rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.

    SPECTROSCOPIC MODULE
    64.
    发明公开
    SPECTROSCOPIC MODULE 审中-公开
    SPEKTROSKOPISCHES MODUL

    公开(公告)号：EP2157414A4

    公开(公告)日：2013-12-18

    申请号：EP08765197

    申请日：2008-06-05

    Applicant: HAMAMATSU PHOTONICS KK

    Inventor： SHIBAYAMA KATSUMI ,  TEICHMANN HELMUT ,  SUZUKI TOMOFUMI ,  HILLER DIETMAR ,  STARKER ULRICH

    IPC: G01J3/02 ,  G01J3/04 ,  G01J3/28

    CPC classification number: G01J3/02 ,  G01J3/0202 ,  G01J3/0243 ,  G01J3/0259 ,  G01J3/0262 ,  G01J3/0291 ,  G01J3/04 ,  G01J3/2803

    Abstract: In the spectroscopy module 1, a light detecting element 4 is provided with a light passing opening 4b through which light made incident into a body portion 2 passes. Therefore, it is possible to prevent deviation of the relative positional relationship between the light passing opening 4b and a light detection portion 4a of the light detecting element 4. Further, an optical element 7, which guides light made incident into the body portion 2, is arranged at the light passing opening 4b. Therefore, light, which is to be made incident into the body portion 2, is not partially blocked at a light incident edge portion of the light passing opening 4b, but light, which is to be made incident into the body portion 2, can be guided securely. Therefore, according to the spectroscopy module 1, it is possible to improve the reliability.

    Abstract translation: 在光谱学模块1中，光检测元件4设置有光入射口4b，入射到主体部分2中的光穿过光入射口4b。 因此，可以防止光通过开口4b与光检测元件4的光检测部分4a之间的相对位置关系的偏差。此外，引导入射到本体部分2中的光的光学元件7， 布置在光通过口4b处。 因此，要入射到主体部分2中的光在光通过开口4b的光入射边缘部分处没有被部分地阻挡，但是将要入射到主体部分2中的光可以是 安全引导。 因此，根据分光模块1，可以提高可靠性。

    A spectrometer
    65.
    发明公开
    A spectrometer 审中-公开
    光谱仪

    公开(公告)号：EP2581772A1

    公开(公告)日：2013-04-17

    申请号：EP11275127.6

    申请日：2011-10-14

    Applicant: Astrium Limited

    Inventor： The designation of the inventor has not yet been filed

    IPC: G02B6/122 ,  G02B6/293

    CPC classification number: G01J3/0256 ,  G01J3/0205 ,  G01J3/0259 ,  G02B6/1228 ,  G02B6/29343

    Abstract: A spectrometer comprises a substrate and a waveguide on the substrate, the waveguide including an elongate part and a tapered input for guiding electromagnetic radiation to the elongate part. The tapered input includes an input end for receiving the electromagnetic radiation and an output end coupled to the elongate part, the input end being wider than the output end. The spectrometer may further comprise a plurality of resonators coupled to the elongate part of the waveguide.

    Abstract translation: 光谱仪包括衬底和衬底上的波导，波导包括细长部分和用于将电磁辐射引导到细长部分的锥形输入。 锥形输入包括用于接收电磁辐射的输入端和耦合到细长部分的输出端，输入端比输出端宽。 光谱仪还可以包括耦合到波导的细长部分的多个谐振器。

    MICRO-MACHINED IMAGING INTERFEROMETER
    66.
    发明公开
    MICRO-MACHINED IMAGING INTERFEROMETER 有权
    微机成像干涉仪

    公开(公告)号：EP2534455A1

    公开(公告)日：2012-12-19

    申请号：EP11704045.1

    申请日：2011-02-07

    Applicant: Commissariat à l'Énergie Atomique et aux Énergies Alternatives ,  Office National d'Etudes et de Recherches Aérospatiales

    Inventor： FENDLER, Manuel ,  LAFARGUES, Gilles ,  GUERINEAU, Nicolas ,  ROMMELUERE, Sylvain ,  DE LA BARRIERE, Florence

    IPC: G01J3/02 ,  G01J3/26 ,  G01J3/28 ,  G01J3/453

    CPC classification number: G01J3/26 ,  G01J3/02 ,  G01J3/021 ,  G01J3/0256 ,  G01J3/0259 ,  G01J3/2823 ,  G01J3/4531 ,  H01L2224/16225

    Abstract: A micro-machined optical measuring device including: a set of photosensitive detector elements situated on a given face of a first support; a second support, assembled to the first support, forming a prism and including a first face through which a visible radiation is intended to penetrate and a second face, forming a non-zero angle &thetas; with the first face and a non-zero angle α with the given face of the first support, the second face being semi-reflective, the first support and the second support being positioned such that an interferometric cavity is made between the second face and the given face, the distance between the given face of the first support and the second face of the second support varying regularly.

    Abstract translation: 微机械光学测量装置技术领域本发明涉及一种微机械光学测量装置，其包括：位于第一支撑件（100）的给定面（112）上的一组光敏检测器元件（110），组装到第一支撑件 （100），所述第二支撑件形成棱镜并且设置有可见光辐射穿过的第一面（212）和与所述第一面形成非零角度θ的第二面（214） 与所述第一支撑件（100）的所述给定面成非零角度α，所述第二面（214）是半反射的，所述第一支撑件（100）和所述第二支撑件（200）被定位成使得所述第一支撑件 C）在所述第二面（214）和所述给定面（112）之间形成时，所述第一支撑件的所述给定面与所述第二支撑件的所述第二面之间的距离（Dy）有规律地变化。

    Monolithic Offner Spectrometer
    68.
    发明公开
    Monolithic Offner Spectrometer 审中-公开
    单片欧浮纳分光计

    公开(公告)号：EP2407761A3

    公开(公告)日：2012-12-05

    申请号：EP11175172.3

    申请日：2007-04-23

    Applicant: Corning Incorporated

    Inventor： Comstock, Lovell

    IPC: G01J3/28 ,  G01J3/02 ,  G01J3/18 ,  G02B5/18

    CPC classification number: G01J3/18 ,  G01J3/02 ,  G01J3/0208 ,  G01J3/0259 ,  G01J3/04 ,  G01J3/2823 ,  G02B5/1852

    Abstract: A monolithic Offner spectrometer is described herein as are various components like a diffraction grating and a slit all of which are manufactured by using a state-of-the-art diamond machining process. In one embodiment, a monolithic Offner spectrometer is directly manufactured by using a diamond machining process. In another embodiment, a monolithic Offner spectrometer is manufactured by using molds which are made by a diamond machining process. In yet another embodiment, a diffraction grating is directly manufactured by using a diamond machining process. In still yet another embodiment, a diffraction grating is manufactured by using a mold which is made by a diamond machining process. In yet another embodiment, a slit is directly manufactured by using a diamond machining process.

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