Coating composition
    71.
    发明公开
    Coating composition 有权
    涂料组合物

    公开(公告)号:EP1918339A1

    公开(公告)日:2008-05-07

    申请号:EP07021478.8

    申请日:2007-11-05

    Abstract: A coating composition comprises a fluoroelastomer composition and a diluent solvent consisting of a perfluoroalkyl-substituted aromatic compound and a perfluoro organic compound, the fluoroelastomer composition comprising (A) a linear perfluoropolyether compound, (B) a fluorinated organohydrogensiloxane, (C) a platinum catalyst, and (D) an organopolysiloxane containing an SiH group and an epoxy or trialkoxysilyl group. The composition cures into a fluoroelastomer having excellent characteristics and achieves a firm adhesion to a broad range of substrates by brief heating at relatively low temperatures.

    Abstract translation: 一种涂料组合物,其包含含氟弹性体组合物和由全氟烷基取代的芳族化合物和全氟有机化合物组成的稀释剂溶剂,所述含氟弹性体组合物包含(A)线性全氟聚醚化合物,(B)氟化有机氢硅氧烷,(C)铂催化剂 (D)含有SiH基团和环氧基或三烷氧基甲硅烷基的有机聚硅氧烷。 该组合物固化成具有优良特性的含氟弹性体,并通过在相对较低的温度下短暂加热而实现与广泛基材的牢固粘合。

    COMPOSITION FOR FORMING ANTI-REFLECTION COATING
    73.
    发明公开
    COMPOSITION FOR FORMING ANTI-REFLECTION COATING 审中-公开
    ZUSAMMENSETZUNG ZUR BILDUNG EINER ANTIREFLEXIONSBESCHICHTUNG

    公开(公告)号:EP1484645A1

    公开(公告)日:2004-12-08

    申请号:EP03705153.9

    申请日:2003-02-14

    CPC classification number: G03F7/091 Y10S430/108

    Abstract: There is provided a composition for forming anti-reflective coating for use in a lithography process with irradiation light from F2 excimer laser (wavelength 157 nm) which has a high effect of inhibiting reflected light and causes no intermixing with resist layers, and an anti-reflective coating prepared from the composition, and a method of controlling attenuation coefficient of the anti-reflective coating.
    Concretely, the composition is one containing a polymer compound containing halogen atom for forming anti-reflective coating for use in a lithographic process in manufacture of a semiconductor device. The polymer compound is one which halogen atom is introduced to a main chain thereof and/or a side chain bonded to the main chain. The attenuation coefficient can be controlled by changing the content of halogen atom in the solid content of the composition.

    Abstract translation: 本发明提供了一种用于形成用于光刻工艺的抗反射涂层的组合物,其具有抑制反射光的高效果并且不与抗蚀剂层混合的F2准分子激光器(波长157nm)的照射光, 由组合物制备的反射涂层,以及控制抗反射涂层的衰减系数的方法。 具体而言,该组合物是含有卤素原子的高分子化合物的组合物,用于形成用于制造半导体器件的光刻工艺中的抗反射涂层。 高分子化合物是将卤素原子引入其主链和/或与主链结合的侧链的化合物。 可以通过改变组合物中固体含量中卤素原子的含量来控制衰减系数。

    SELF-DISINFECTING COATING FOR SURFACES
    77.
    发明公开

    公开(公告)号:EP4169536A1

    公开(公告)日:2023-04-26

    申请号:EP21825091.8

    申请日:2021-06-15

    Applicant: Drylyte, S.L.

    Abstract: A self-disinfecting coating (1) for surfaces, comprising: a base matrix (2) and a loading solution (3); the matrix (2) in turn comprises a gel base (10) and a gel fluid (7), and the loading solution (3) comprises an active disinfectant ingredient (4), in such a way that the base matrix (2) is able to absorb and retain the active ingredient (4) while maintaining, on the free surface of the coating (1), a sufficient concentration of the active ingredient (4), thus maintaining the surface disinfected. Preferably, the gel base (10) comprises a protein chosen from between collagen, albumin or elastin and glycerine as a plasticising agent (6). Preferably, the loading solution (3) comprises elemental iodine as an active ingredient (4) and ethanol as a load solvent (8). Preferably, the selfdisinfecting coating (1) comprises a base substrate (11) comprising therein the base matrix (2) and loading solution (3).

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