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394 条记录 (耗时 0.019 秒)

    Apparatus and method for providing fluid for immersion lithography
    72.
    发明授权
    Apparatus and method for providing fluid for immersion lithography 有权
    装置和方法用于提供流体用于浸没式光刻

    公开(公告)号：EP2960702B1

    公开(公告)日：2017-02-22

    申请号：EP15158998.3

    申请日：2004-07-16

    申请人： Nikon Corporation

    发明人： Poon, Alex Ka Tim ,  Kho, Leonard Wai Fung

    IPC分类号： G03F7/20 ,  G02B21/00 ,  G03B27/52

    CPC分类号： G03F7/70341 ,  G03F7/70358 ,  G03F7/708 ,  G03F7/70858

    摘要： Embodiments of the present invention are directed to a system and a method of controlling the flow and pressure of immersion fluid to provide stable conditions for immersion lithography. An immersion fluid is provided in a space (34) between a last optical element of an optical projection system and a workpiece during the immersion lithography process. For this purpose,a nozzle (20) is provided configured to supply immersion fluid in the gap between the last optical element and the workpiece, wherein the nozzle includes an inner cavity (34) to retain the immersion fluid in the gap and an outer cavity (53) to recover immersion fluid that exits the inner cavity.

    FLUID PRESSURE COMPENSATION FOR IMMERSION LITHOGRAPHY LENS
    73.
    发明授权
    FLUID PRESSURE COMPENSATION FOR IMMERSION LITHOGRAPHY LENS 有权
    流体压力补偿用于浸没光刻镜头

    公开(公告)号：EP1756663B1

    公开(公告)日：2015-12-16

    申请号：EP04814940.5

    申请日：2004-12-20

    申请人： Nikon Corporation

    发明人： WATSON, Douglas, C. ,  NOVAK, W., Thomas

    IPC分类号： G03B27/42 ,  G03B27/52 ,  G03B27/58 ,  G03F7/20

    CPC分类号： G03F7/70258 ,  G03F7/70341 ,  G03F7/70833 ,  G03F7/709

    摘要： An immersion lithography system that compensating for any displacement of the optical caused by the immersion fluid. The system includes an optical assembly (14) to project an image defined by the reticle (12) onto the wafer (20). The optical assembly includes a final optical element (16) spaced from the wafer by a gap (24). An immersion element (22) is provided to supply an immersion fluid into the gap and to recover any immersion fluid that escapes the gap. A fluid compensation system is provided for the force on the final optical element of the optical assembly caused by pressure variations of the immersion fluid. The resulting force created by the varying pressure may cause final optical element to become displaced. The fluid compensation system is configured to provide a substantially equal, but opposite force on the optical assembly, to prevent the displacement of the final optical element.

    Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
    74.
    发明授权
    Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine 有权
    用于在浸没式光刻机中在晶片交换期间将浸没流体保持在投影透镜下方的间隙中的设备和方法

    公开(公告)号：EP2613194B1

    公开(公告)日：2015-09-16

    申请号：EP13154186.4

    申请日：2004-03-17

    申请人： Nikon Corporation

    发明人： Binnard, Michael

    IPC分类号： G03B27/32 ,  G03B27/42 ,  G03B27/58 ,  G03F7/20 ,  G03B27/52

    CPC分类号： G03F7/70341 ,  G03B27/52 ,  G03F7/70716 ,  G03F7/70725 ,  G03F7/70733

    摘要： An apparatus and method for maintaining immersion fluid (212) in the gap adjacent the projection lens (16) during the exchange of a work piece (208) in a lithography machine (10) is disclosed. The apparatus and method includes an optical assembly (16) configured to project an image onto a work piece (208) and a stage assembly (202) including a work piece table (204) configured to support the work piece (208) adjacent the optical assembly (16). An environmental system (26) is provided to supply and remove an immersion fluid (212) from a gap between the optical assembly (16) and the work piece (208) on the stage assembly (202). After exposure of the work piece (208) is complete, an exchange system (216) removes the work piece (208) and replaces it with a second work piece. An immersion fluid containment system (214) is provided to maintain the immersion liquid (212) in the gap during removal of the first work piece (208) and replacement with the second work piece.

    Liquid recovery system, immersion exposure apparatus, immersion exposure method, and device fabricating method
    78.
    发明公开
    Liquid recovery system, immersion exposure apparatus, immersion exposure method, and device fabricating method 有权
    一种用于液体回收系统，该液浸曝光装置中，液浸曝光方法，以及处理用于物品的制造

    公开(公告)号：EP2653924A2

    公开(公告)日：2013-10-23

    申请号：EP13175873.2

    申请日：2008-01-23

    申请人： Nikon Corporation

    发明人： Nagasaka, Hiroyuki

    IPC分类号： G03F7/20 ,  G03B27/52

    CPC分类号： G03F7/70341 ,  G03B27/52

    摘要： A liquid recovery system is used by an immersion exposure apparatus. The liquid recovery system is provided with: a first opening (33); a gap portion (15)that is provided so that a liquid on an object that opposes the first opening can flow into the gap portion through the first opening; a liquid recovery part (40) that suctions, through a porous member, at least part of the liquid that flows into the gap portion; and a second opening (34) that is different from the first opening. The gap portion is open to the atmosphere through the second opening.

    摘要翻译： 液体回收系统在液浸曝光装置中使用通过。 液体回收系统设置有：第一开口（33）; 的间隙部（15）设置并所以没有液体到对象并对着第一开口可通过第一开口流入所述间隙部分; 液体回收部（40）做了吸力，通过多孔构件，所述液体的至少一部分到该间隙中部分做流动; 及（34）那样的第二开口与所述第一开口不同。 间隙部是开放的，以通过第二开口大气。