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公开(公告)号：EP3009271A1
公开(公告)日：2016-04-20
申请号：EP13886726.2
申请日：2013-06-12
申请人： KINYOSHA CO. LTD.
发明人： NAKANO, Shigeru , TANAKA, Ryuta , ARIYOSHI, Yu
IPC分类号： B41N1/12
CPC分类号： B41N1/006 , B41C1/05 , B41N1/12 , B41N1/22 , B41N2210/04
摘要： According to one embodiment, a flexographic printing plate material includes a printing layer for engraving containing rubber, a compressive layer, a base fabric layer provided between the printing layer for engraving and the compressive layer and a reinforcement layer. The plate material has a thickness of more than 2.75 mm and less than or equal to 7 mm. A ratio of a thickness of the printing layer for engraving to the thickness of the plate material is greater than or equal to 10% and less than or equal to 78%, and a ratio of a thickness of the compressive layer to the thickness of the plate material is greater than or equal to 6% and less than or equal to 78%.
摘要翻译： 根据一个实施方式，柔性版印刷版材料包括用于雕刻的包含橡胶的印刷层，压缩层，设置在用于雕刻的印刷层和压缩层之间的基底织物层以及加强层。 板材具有大于2.75mm且小于或等于7mm的厚度。 用于雕刻的印刷层的厚度与板材的厚度的比率大于或等于10％并且小于或等于78％，并且压缩层的厚度与 板材大于或等于6％且小于或等于78％。
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公开(公告)号：EP2340169B1
公开(公告)日：2014-11-05
申请号：EP09785591.0
申请日：2009-09-07
申请人： J P Imaging Limited
发明人： ADAMSON, John David , BENNETT, Peter Andrew Reath , HUTCHINSON, Richard Arthur , POTTS, Rodney Martin
CPC分类号： B41C1/1041 , B41M1/06 , B41N1/006 , B41N1/083 , G03F7/0043 , H05K3/1275 , H05K3/385 , H05K2203/0315
摘要： A method of preparing a printing form precursor for printing, or a printed circuit board precursor or a semiconductor precursor, the method comprising the step of applying electromagnetic radiation having a pulse duration of not greater than 1×10−6 seconds, in an imagewise manner, to an imagable surface of the precursor. The imaging process may cause ablation of the coating of the precursor or permit its development in a developer. In each case the imaging radiation needs not be tuned to imaging chemistry (if any) present in the coating. Alternatively the imaging process may induce a change of hydrophilicity or hydrophobicity, or other change of state, of an uncoated substrate.
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84.发明授权Structure for pattern formation, method for pattern formation, and application thereof 有权结构为构图模式的形成过程，以及它们的使用
公开(公告)号：EP1376226B1
公开(公告)日：2010-10-13
申请号：EP03021174.2
申请日：1998-08-10
发明人： Kobayashi, Hironori, , Yamamoto, Manabu, , Aoki, Daigo, , Kamiyama, Hironori, , Hikosaka, Shinichi, , Kashiwabara, Mitsuhiro,
CPC分类号： B41N1/006 , B29D11/00365 , B41C1/1041 , G02B3/0012 , G02B3/0056 , G02B5/201 , G03F7/0005 , G03F7/0007 , G03F7/001 , G03F7/0043 , G03F7/0757 , G03F7/095 , G03F7/11
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85.发明授权Structure for pattern formation, method for pattern formation, and application thereof 有权图案形成的结构，图案形成方法及其应用
公开(公告)号：EP1376225B1
公开(公告)日：2010-10-13
申请号：EP03021173.4
申请日：1998-08-10
发明人： Kobayashi, Hironori, , Yamamoto, Manabu, , Aoki, Daigo, , Kamiyama, Hironori, , Hikosaka, Shinichi, , Kashiwabara, Mitsuhiro,
CPC分类号： B41N1/006 , B29D11/00365 , B41C1/1041 , G02B3/0012 , G02B3/0056 , G02B5/201 , G03F7/0005 , G03F7/0007 , G03F7/001 , G03F7/0043 , G03F7/0757 , G03F7/095 , G03F7/11
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公开(公告)号：EP1082224B1
公开(公告)日：2004-02-11
申请号：EP99948856.2
申请日：1999-09-24
发明人： HESS, Peter
CPC分类号： B41C1/1058 , B41N1/006 , G03F7/0042
摘要： The invention relates to a printing mould and to a method for altering the wetting characteristics of a printing mould with a semiconductor surface. To this end, the surface of the printing mould is first put in an essentially uniform chemical state with a first wetting behaviour. Parts of all of the areas of the semiconductor surface are then put into a second chemical state which has a second wetting property that is different from the first.
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87.发明公开Structure for pattern formation, method for pattern formation, and application thereof 有权Lithographieplatte和Verfahren zu derer Herstellung
公开(公告)号：EP1376229A1
公开(公告)日：2004-01-02
申请号：EP03021177.5
申请日：1998-08-10
发明人： Kobayashi, Hironori , Yamamoto, Manabu , Aoki, Daigo , Kamiyama, Hironori , Hikosaka, Shinichi , Kashiwabara, Mitsuhiro
CPC分类号： B41N1/006 , B29D11/00365 , B41C1/1041 , G02B3/0012 , G02B3/0056 , G02B5/201 , G03F7/0005 , G03F7/0007 , G03F7/001 , G03F7/0043 , G03F7/0757 , G03F7/095 , G03F7/11
摘要： A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.
摘要翻译： 一种用于图案形成的结构，用于光学地形成图案，其特征在于包括：设置在基底上的含光催化剂的层，所述含光催化剂的层含有通过在图案曝光下的光催化作用可润湿性的材料。
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公开(公告)号：EP0922590B1
公开(公告)日：2002-07-24
申请号：EP98123560.9
申请日：1998-12-10
发明人： Frick, Werner , Rossi, Marco
IPC分类号： B41N1/00
CPC分类号： B41N1/006
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公开(公告)号：EP0932081A4
公开(公告)日：2001-09-05
申请号：EP98936714
申请日：1998-08-10
发明人： KOBAYASHI HIRONORI , YAMAMOTO MANABU , AOKI DAIGO , KAMIYAMA HIRONORI , HIKOSAKA SHINICHI , KASHIWABARA MITSUHIRO
CPC分类号： B41N1/006 , B29D11/00365 , B41C1/1041 , G02B3/0012 , G02B3/0056 , G02B5/201 , G03F7/0005 , G03F7/0007 , G03F7/001 , G03F7/0043 , G03F7/0757 , G03F7/095 , G03F7/11
摘要： A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.
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90.发明公开Aufzeichnungsmaterial aus einem Träger und einer auf einer Oberfläche aufgebrachten Keramikschicht 审中-公开记录包含载体材料，并且施加的表面陶瓷层上
公开(公告)号：EP0992342A3
公开(公告)日：2000-08-30
申请号：EP99116515.0
申请日：1999-08-24
申请人： Agfa-Gevaert AG
摘要： Auf einem Träger einer Druckplatte ist eine Keramikschicht aufgebracht, die Aluminiumoxid und eine Silikatverbindung enthält, wobei die Silikatverbindung als Bindemittel für die Haftung der Keramikschicht auf dem Träger sorgt.
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