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公开(公告)号：EP0868648A4
公开(公告)日：2000-03-01
申请号：EP96943712
申请日：1996-12-10
Applicant: XROS INC
Inventor： NEUKERMANS ARMAND P , SLATER THIMOTHY G
CPC classification number: G01Q60/38 , G01B7/34 , G01Q20/04 , H01L41/0926 , H01L41/094 , H02N2/028
Abstract: A topographic head (100) for profilometry and AFM supports a central paddle (108) by coaxial torsion bars (104) projecting inward from an outer frame (102). A tip (118) projects from the paddle distal from the bars. The torsion bars include an integrated paddle rotation sensor (142). An XYZ stage (200) may carry the topographic head for X, Y and Z axis translation. The XYZ stage's fixed outer base (202) is coupled to an X-axis stage (204) via a plurality of flexures (206). The X-axis stage is coupled to a Y-axis stage (212) also via a plurality of flexures (214). One of each set of flexures includes a shear stress sensor (222). A Z-axis stage (238) may also be included to provide an integrated XYZ scanning stage. The topographic head's frame, bars and paddle, and the XYZ stage's stage-base, X-axis, Y-axis and Z-axis stages, and flexures are respectively monolithically fabricated by micromachining from a semiconductor wafer (252a, 252b, 262).
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82.发明公开
公开(公告)号：EP0921374A2
公开(公告)日：1999-06-09
申请号：EP98122889.3
申请日：1998-12-02
Applicant: Michaelis, Bernd Prof. Dr.-Ing.
Inventor： Michaelis, Bernd Prof.Dr.-Ing. , Lilienblum, Tilo Dipl.-Ing. , Günther, Georg Dr. , Bauer, Gerhard Dipl.-Ing. , Küchel, Michael Prof.-Dr.
IPC: G01B21/30
CPC classification number: G01B21/30
Abstract: Mit Hilfe optischer oder mechanischer Meßverfahren können Werkstücke auf ihre Qualität hin überprüft werden. Im einfachsten Fall wird dabei zunächst ein Masterteil vermessen. Die Aussage über die Qualität des zu vermessenden Teils kann durch Vergleich (Differenzbildung) mit dem Masterteil erfolgen.
Das zu vermessende Objekt wird vermessen. Die Meßwerte werden in einen modifizierten Assoziativspeicher (künstliches neuronales Netz) eingegeben und am Ausgang abgerufen (Recall). In den Gewichten des modifizierten Assoziativspeichers sind ein oder mehrere Masterteile in unterschiedlichen Positionen und Lagen gespeichert. Dadurch wird die gesamte Bandbreite der möglichen Variationen der Masterteile erfaßt.
Am Ausgang des modifizierten Assoziativspeichers bleiben nur diejenigen Anteile der Meßdaten übrig, die den gespeicherten Masterteilen entsprechen. Fehler, also Abweichungen von diesen Masterteilen werden nicht weitergeleitet. Nach Differenzbildung zwischen dem gemessenen Teil und dem Recallergebnis bleiben nur die gesuchten Fehler übrig. Diese können dann mit Standardmethoden der Bildverarbeitung ausgewertet werden.Abstract translation: 一旦存储在修改的关联存储器，用于主项评估值可以被回忆起，记录它们的所有可能的变化。 在从联想记忆输出只有评估数据对应存储的主项仍然存在。 在主项异常不会传递。 一旦评估的项目和召回结果之间的差异是确定的，只是错误追捧然后保持，可与标准的图像处理进行评估。
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83.发明授权
公开(公告)号：EP0687162B1
公开(公告)日：1998-01-14
申请号：EP94909104.5
申请日：1994-03-02
Applicant: COURAGE + KHAZAKA ELECTRONIC GmbH
Inventor： KHAZAKA, Gabriel , COURAGE, Wilfried
CPC classification number: A61B5/441 , A61B5/1078 , G01B1/00 , G01B21/30
Abstract: The invention concerns a device for measuring the dimensions of a three-dimensional surface structure, in particular folds in the human skin (9). The device has a transparent support plate (2) designed to hold initially liquid silicone material (3) to produce a silicone impression of the surface being examined. The device also has an analysis unit for analysing the surface structure of the impression. The invention calls for the support plate (2) to have a measurement zone (4) held at a given distance from the surface under examination (9), for the silicone material (3) which is introduced into the measurement zone to be uniformly coloured and for the support plate (2) to have at least one drainage channel (10) leading away from the measurement zone (4) for excess silicone material (3). Analysis of the silicone impression is carried out by determining the light absorbtion of the impression from light-intensity measurements.
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84.发明公开
公开(公告)号：EP0623805A4
公开(公告)日：1997-01-29
申请号：EP93902515
申请日：1993-01-21
Applicant: KRYNICKI WITOLD
Inventor： KRYNICKI WITOLD
Abstract: An object of the present invention is to provide a reference sample for easily and accurately calibrating a region of recesses and projections of several ten angstroms to several angstroms for the observation of which an inter-atom force microscope displays its performance. The method of manufacturing reference samples according to the present invention, wherein an object to be measured and a probe are placed in an opposed state with a minute clearance left between the surface of the former and a free end of the latter, to manufacture a reference sample used to calibrate an amount of displacement measured with an inter-atom force microscope formed so as to convert an inter-atom force which works between the atoms constituting the object to be measured and probe into mechanical displacement, is characterized in that etching is carried out with an etching agent of an extremely low etching speed as a rate of etching a stepped portion of a pattern is accurately controlled.
Abstract translation: 本发明的一个目的是提供一种用于容易并准确地设定校准凹部和几十埃突起的一个区域到几埃为哪个的原子间力显微镜的观测显示其性能提供一个参比样品。 制造参考样本的雅鼎在本发明的方法中，worin到测量对象物和样品是在对置状态下与前者的表面，而后者的自由端之间留有一个微小的间隙放置在，为了制造一个参考 用于样品来校准与在形成为转换为原子间力构成对象的原子之间哪个工作原子间力显微镜测定位移量进行测量和探入机械位移，是具有以下特征DASS进行蚀刻 出与在蚀刻极低的腐蚀速度对剂作为蚀刻图案的台阶部分的速率精确地设定控制。
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公开(公告)号：EP0478666A4
公开(公告)日：1993-07-28
申请号：EP90909991
申请日：1990-06-14
Inventor： ZDEBLICK, MARK, J. , ALBRECHT, THOMAS, R.
IPC: G01B7/34 , B81B3/00 , G01B7/00 , G01B21/30 , G01N23/00 , G01N37/00 , G01Q10/00 , G01Q60/38 , G11B5/00 , G11B9/00 , G11B9/14 , G01N23/225
CPC classification number: G01Q70/06 , G01Q60/38 , G11B5/00 , G11B9/14 , G11B9/1418 , Y10S977/872
Abstract: A microfabricated microscope assembly (100) including a piezoelectric bimorph cantilever arm (102) mounted at one end to a first substrate (106). The free end of the cantilever arm has a tip (104) mounted thereto for scanning a scanned surface (110) mounted on a second substrate (114). The cantilever arm (102) and the substrate (112) are configured to carry out a predetermined write or read mode of operation, such as scanning tunneling microscopy or atomic force microscopy. The two substrates (106, 114) are spaced apart a fixed distance by spacer feet (120) which project from one of the substrates (106, 114) and which have their ends fixed to the surface of the other substrate by eutectic, anodic, or adhesive bonding. An array (100) of microfabricated microscope assemblies is formed using a plurality of individual assemblies (101). A number of different write/read modes of operation are accommodated, such as charge storage, molecular attachment, or magnetic domains.
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Patent Agency Ranking86.发明公开
公开(公告)号：EP0497610A3
公开(公告)日：1993-03-03
申请号：EP92300822.1
申请日：1992-01-30
Applicant: GENERAL ELECTRIC COMPANY
Inventor： Thompson, Robert Alan , Markell, Trent James
IPC: G01B21/30
CPC classification number: G01B21/30
Abstract: A quality assurance of surface treatments, typically with shot peening, by analysis of substrate surface line traces is disclosed. In particular, line traces are created over the surface treated substrate. These line traces are filtered with a low pass filter to create relative maximums. The coordinates of the relative maximums are determined and the spatial distance between these coordinates are measured and recorded. The actual plastic upset depth of the surface treatment substrate is determined. The surface treatment is then adjusted, if necessary, based upon the values of these spatial distances and actual plastic upset depths..
Abstract translation: 公开了通过分析衬底表面线迹线进行表面处理的质量保证，通常用喷丸硬化处理。 特别地，在表面处理的基底上产生线迹。 用低通滤波器对这些线迹进行滤波，以创建相对最大值。 确定相对最大值的坐标，并测量和记录这些坐标之间的空间距离。 确定表面处理基板的实际塑性镦粗深度。 然后根据这些空间距离的值和实际的塑性深度深度来调整表面处理，如果需要的话。
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87.发明公开Quality assurance of surface treatments by analysis of substrate surface line traces 失效通过线的分析来确定的表面处理的质量在基板表面上的轨道。
公开(公告)号：EP0497610A2
公开(公告)日：1992-08-05
申请号：EP92300822.1
申请日：1992-01-30
Applicant: GENERAL ELECTRIC COMPANY
Inventor： Thompson, Robert Alan , Markell, Trent James
IPC: G01B21/30
CPC classification number: G01B21/30
Abstract: A quality assurance of surface treatments, typically with shot peening, by analysis of substrate surface line traces is disclosed. In particular, line traces are created over the surface treated substrate. These line traces are filtered with a low pass filter to create relative maximums. The coordinates of the relative maximums are determined and the spatial distance between these coordinates are measured and recorded. The actual plastic upset depth of the surface treatment substrate is determined. The surface treatment is then adjusted, if necessary, based upon the values of these spatial distances and actual plastic upset depths..
Abstract translation: 的表面处理，典型地用喷丸质量保证，通过基板表面的线分析痕迹游离缺失盘。 特别地，线迹线在该表面处理过的基材创建。 这些线迹线被过滤，用一个低通滤波器，以产生相对于最大值。 相对最大值的坐标是确定性的开采和论文坐标之间的空间距离被测量和记录。 表面处理的基材的实际塑料心烦深度是确定性的开采。 然后将表面处理被调整时，如果有必要，基于合成的空间距离和实际塑性心烦深度的值..
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公开(公告)号：EP0133879B1
公开(公告)日：1988-01-13
申请号：EP84106377.9
申请日：1984-06-05
Applicant: International Business Machines Corporation
CPC classification number: G01B5/28
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公开(公告)号：EP0133879A1
公开(公告)日：1985-03-13
申请号：EP84106377.9
申请日：1984-06-05
Applicant: International Business Machines Corporation
CPC classification number: G01B5/28
Abstract: Zur Prüfung plattenförmiger Werkstücke auf aus der Oberfläche herausragende Partikel (40) werden die Werkstücke (36) mittels eines beweglichen Haltekopfes (13, 42) auf eine Grundplatte (10) gelegt, und mittels im Haltekopf befindlicher Abtastelemente (26, 28, 30) wird die Lage der unteren Anlagefläche des Haltekopfes relativ zur oberen Fläche des auf der Oberfläche der Grundplatte aufliegenden Werkstücks ermittelt. Die hierbei von den Abtastelementen abgegebenen Signale kennzeichnen Vorhandensein und Lage von Partikeln auf der Werkstückfläche.
Abstract translation: 对于在基板上的测试面板形从表面的颗粒突出（40）的工件，所述工件（36）由一个可移动的安装头的装置（13，42）（10）下保持头感测元件放置，并且通过特性的装置（26，28，30） 相对于搁置在底板工件的表面上的所确定的上表面上的支撑头的下表面接触的位置。 由感测信号传送的情况下，表明颗粒的工件表面上的存在和位置。
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90.发明公开
公开(公告)号：EP4014075A1
公开(公告)日：2022-06-22
申请号：EP20851804.3
申请日：2020-08-12
Applicant: CNH Industrial Canada, Ltd.
Inventor： HENRY, James W.
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