公开(公告)号：EP0688070A1

公开(公告)日：1995-12-20

申请号：EP95105899.9

申请日：1995-04-20

申请人： Toyoda Gosei Co., Ltd. ,  RESEARCH DEVELOPMENT CORPORATION OF JAPAN ,  Akasaki, Isamu ,  Amano, Hiroshi

发明人： Kato, Hisaki ,  Koide, Norikatsu ,  Koike, Masayoshi ,  Akasaki, Isamu ,  Amano, Hiroshi

IPC分类号： H01S3/19

CPC分类号： H01S5/32341 ,  H01S5/0202 ,  H01S5/0213

摘要： The improved laser diode is made of a gallium nitride base compound semiconductor ((Al x Ga 1-x ) y In 1-y N; 0≦x≦1; 0≦y≦1) with a double heterojunction structure having the active layer held between layers having a greater band gap, the laser diode comprises mirror surfaces formed by cleaving said multi-layered coating and said sapphire substrate in directions parallel to 〈0001〉 (c axis) of said sapphire substrate. Further, in the improved process, only the intermediate zinc oxide (ZnO) layer is removed by wet etching with a ZnO-selective liquid etchant so as to form gaps between the sapphire substrate and the bottommost sub-layer of said semiconductor laser element layer; and said semiconductor laser element layer is cleaved with the aid of said gaps 20, with the resulting planes of cleavage being used as the mirror surfaces of the laser cavity.

摘要翻译： 改进的激光二极管由具有双异质结结构的氮化镓基化合物半导体（（Al x Ga 1-x）y In 1-y N;0≤x≤1;0≤y≤1） 活性层保持在具有更大带隙的层之间，激光二极管包括通过在平行于所述蓝宝石衬底的＆Lang＆0001＆Rang＆（c轴）的方向上切割所述多层涂层和所述蓝宝石衬底而形成的镜面。 此外，在改进的方法中，通过用ZnO选择性液体蚀刻剂的湿蚀刻仅去除中间氧化锌（ZnO）层，以便在蓝宝石衬底和所述半导体激光元件层的最底层之间形成间隙; 并且所述半导体激光元件层借助于所述间隙20被切割，所得到的切割平面用作激光腔的镜面。

公开(公告)号：EP0551721B1

公开(公告)日：1997-03-05

申请号：EP92310314.7

申请日：1992-11-12

申请人： Amano, Hiroshi ,  Akasaki, Isamu ,  PIONEER ELECTRONIC CORPORATION ,  TOYODA GOSEI CO., LTD.

发明人： Takeuchi,Tetsuya, ,  Akasaki,Isamu, ,  Watanabe,Atsushi,c/o Corp.R.& D.Lab., ,  Manabe,Katsuhide Toyoda Gosei Technical Centre, ,  Amano,Hiroshi Nijigaokahigashidanchi

IPC分类号： H01L29/201 ,  H01L21/20

CPC分类号： H01L33/32 ,  H01L21/02381 ,  H01L21/02458 ,  H01L21/0254 ,  H01L21/0262 ,  H01L21/02639 ,  H01L21/02647 ,  H01L29/2003 ,  H01L29/201 ,  H01L33/007 ,  Y10S148/065 ,  Y10S148/113 ,  Y10S438/933

公开(公告)号：EP0551721A3

公开(公告)日：1994-04-20

申请号：EP92310314.7

申请日：1992-11-12

申请人： Amano, Hiroshi ,  Akasaki, Isamu ,  PIONEER ELECTRONIC CORPORATION ,  TOYODA GOSEI CO., LTD.

发明人： Takeuchi,Tetsuya, ,  Akasaki,Isamu, ,  Watanabe,Atsushi,c/o Corp.R.& D.Lab., ,  Manabe,Katsuhide Toyoda Gosei Technical Centre, ,  Amano,Hiroshi Nijigaokahigashidanchi

IPC分类号： H01L29/201 ,  H01L21/20

CPC分类号： H01L33/32 ,  H01L21/02381 ,  H01L21/02458 ,  H01L21/0254 ,  H01L21/0262 ,  H01L21/02639 ,  H01L21/02647 ,  H01L29/2003 ,  H01L29/201 ,  H01L33/007 ,  Y10S148/065 ,  Y10S148/113 ,  Y10S438/933

摘要： A gallium nitride type semiconductor device comprises a silicon substrate, an intermediate layer consisting of a compound containing at least aluminum and nitrogen and formed on the silicon substrate, and a crystal layer of (Ga 1-x Al x ) 1-y In y N (0≦x≦1, 0≦y≦1, excluding the case of x = 1 and y = 0). The aluminum/nitrogen intermediate layer suppresses the occurrence of crystal defects and thus the (Ga 1-x Al x ) 1-y In y N layer has very high crystallization and flatness. In a method of fabrication a silicon single crystal substrate is kept at a temperature of 400 to 1300°C and is held in an atmosphere of a metaloganic compound containing at least aluminum and a nitrogen containing compound to form a thin intermediate layer containing at least aluminum and nitrogen on a part or on the entirety of the surface of the single crystal substrate. At least one layer or multiple layers of a single crystal of (Ga 1-x Al x ) 1-y In y N are then formed on the intermediate layer.

摘要翻译： 一种氮化镓系半导体装置，其特征在于，具有：硅基板;由在硅基板上形成的至少包含铝和氮的化合物构成的中间层;以及（Ga 1-x Al x）1-y In y N（0≤x≤1 0≤y≤1，不包括x = 1和y = 0的情况）。 铝/氮中间层抑制晶体缺陷的发生，因此（Ga 1-x Al x）1-y In y N层具有非常高的结晶度和平坦度。 在制造硅单晶衬底的方法中，将温度保持在400-1300℃，并保持在至少含有铝和含氮化合物的金属化合物的气氛中以形成至少包含铝的薄中间层 和氮在单晶衬底表面的一部分或整个表面上。 然后在中间层上形成至少一层或多层（Ga1-xAlx）1-yInyN的单晶。

公开(公告)号：EP0559326B1

公开(公告)日：1997-05-07

申请号：EP93300724.7

申请日：1993-02-01

申请人： PIONEER ELECTRONIC CORPORATION ,  Amano, Hiroshi ,  Akasaki, Isamu

发明人： Watanabe, Atsushi, c/o Pioneer Electronic Corp. ,  Amano, Hiroshi, Nijigaoka-higashidanchi ,  Hiramatsu, Kazumasa ,  Akasaki, Isamu

IPC分类号： C30B25/14 ,  C23C16/44

CPC分类号： C30B25/14 ,  C23C16/455

公开(公告)号：EP0678945A1

公开(公告)日：1995-10-25

申请号：EP95105817.1

申请日：1995-04-19

申请人： TOYODA GOSEI CO., LTD. ,  RESEARCH DEVELOPMENT CORPORATION OF JAPAN ,  Akasaki, Isamu ,  Amano, Hiroshi

发明人： Yamazaki, Shiro ,  Koide, Norikatsu ,  Manabe, Katsuhide ,  Akasaki, Isamu ,  Amano, Hiroshi

IPC分类号： H01S3/19

CPC分类号： H01S5/32341 ,  H01S5/3086

摘要： A gallium nitride group compound semiconductor laser diode (10) satisfying the formula (Al x Ga 1-x ) y In 1-y N, inclusive of 0 ≦ x ≦ 1 and 0 ≦ y ≦ 1 is constituted by a double hetero-junction structure sandwiching an active layer (5) by layers (4, 6) having wider band gaps than the active layer (5). The active layer (5) is magnesium (Mg) doped p-type conductive gallium nitride group compound semiconductor satisfying the formula (Al x Ga 1-x ) y In 1-y N, inclusive of 0 ≦ x ≦ 1 and 0 ≦ y ≦ 1. In another embodiment, the active layer (5) is doped with silicon (Si). As a result, luminous efficiency is improved and threshold current for oscillation is lowered.

摘要翻译： 满足式（Al x Ga 1-x）y In 1-y N（包括0≤x≤1且0≤y≤1）的氮化镓族化合物半导体激光二极管（10）由夹着有源层的双异质结构成 5）通过具有比有源层（5）更宽的带隙的层（4,6）。 有源层（5）是满足式（Al x Ga 1-x）y In 1-y N，包括0≤x≤1和0≤y≤1的镁（Mg）掺杂的p型导电氮化镓族化合物半导体。在另一个实施例 ，有源层（5）掺杂有硅（Si）。 结果，发光效率提高并且用于振荡的阈值电流降低。

公开(公告)号：EP0551721A2

公开(公告)日：1993-07-21

申请号：EP92310314.7

申请日：1992-11-12

申请人： Amano, Hiroshi ,  Akasaki, Isamu ,  PIONEER ELECTRONIC CORPORATION ,  TOYODA GOSEI CO., LTD.

发明人： Takeuchi,Tetsuya, ,  Akasaki,Isamu, ,  Watanabe,Atsushi,c/o Corp.R.& D.Lab., ,  Manabe,Katsuhide Toyoda Gosei Technical Centre, ,  Amano,Hiroshi Nijigaokahigashidanchi

IPC分类号： H01L29/201 ,  H01L21/20

CPC分类号： H01L33/32 ,  H01L21/02381 ,  H01L21/02458 ,  H01L21/0254 ,  H01L21/0262 ,  H01L21/02639 ,  H01L21/02647 ,  H01L29/2003 ,  H01L29/201 ,  H01L33/007 ,  Y10S148/065 ,  Y10S148/113 ,  Y10S438/933

摘要： A gallium nitride type semiconductor device comprises a silicon substrate, an intermediate layer consisting of a compound containing at least aluminum and nitrogen and formed on the silicon substrate, and a crystal layer of (Ga 1-x Al x ) 1-y In y N (0≦x≦1, 0≦y≦1, excluding the case of x = 1 and y = 0). The aluminum/nitrogen intermediate layer suppresses the occurrence of crystal defects and thus the (Ga 1-x Al x ) 1-y In y N layer has very high crystallization and flatness. In a method of fabrication a silicon single crystal substrate is kept at a temperature of 400 to 1300°C and is held in an atmosphere of a metaloganic compound containing at least aluminum and a nitrogen containing compound to form a thin intermediate layer containing at least aluminum and nitrogen on a part or on the entirety of the surface of the single crystal substrate. At least one layer or multiple layers of a single crystal of (Ga 1-x Al x ) 1-y In y N are then formed on the intermediate layer.

摘要翻译： 氮化镓型半导体器件包括硅衬底，由至少包含铝和氮并且形成在硅衬底上的化合物构成的中间层和（Ga 1-x Al x）1-y In y N（0≤x

公开(公告)号：EP0678945B1

公开(公告)日：1998-07-08

申请号：EP95105817.1

申请日：1995-04-19

申请人： TOYODA GOSEI CO., LTD. ,  RESEARCH DEVELOPMENT CORPORATION OF JAPAN ,  Akasaki, Isamu ,  Amano, Hiroshi

发明人： Yamazaki, Shiro ,  Koide, Norikatsu ,  Manabe, Katsuhide ,  Akasaki, Isamu ,  Amano, Hiroshi

IPC分类号： H01S3/19 ,  H01L33/00

CPC分类号： H01S5/32341 ,  H01S5/3086

公开(公告)号：EP0688070B1

公开(公告)日：1998-07-01

申请号：EP95105899.9

申请日：1995-04-20

申请人： Toyoda Gosei Co., Ltd. ,  RESEARCH DEVELOPMENT CORPORATION OF JAPAN ,  Akasaki, Isamu ,  Amano, Hiroshi

发明人： Kato, Hisaki ,  Koide, Norikatsu ,  Koike, Masayoshi ,  Akasaki, Isamu ,  Amano, Hiroshi

IPC分类号： H01S3/19 ,  H01L33/00

CPC分类号： H01S5/32341 ,  H01S5/0202 ,  H01S5/0213

公开(公告)号：EP0559326A1

公开(公告)日：1993-09-08

申请号：EP93300724.7

申请日：1993-02-01

申请人： PIONEER ELECTRONIC CORPORATION ,  Amano, Hiroshi ,  Akasaki, Isamu

发明人： Watanabe, Atsushi, c/o Pioneer Electronic Corp. ,  Amano, Hiroshi, Nijigaoka-higashidanchi ,  Hiramatsu, Kazumasa ,  Akasaki, Isamu

IPC分类号： C30B25/14 ,  C23C16/44

CPC分类号： C30B25/14 ,  C23C16/455

摘要： A compound semiconductor vapor phase epitaxial device comprises a cylindrical reactor vessel (2), a plurality of flow channels (17, 27) disposed in the reactor vessel, a crystal substrate (7) disposed in one of the flow channels, a plurality of gas supply pipes for respectively supplying gas containing element of compound to be grown on the crystal substrate and at least one slit (10) or linearly arranged fine holes (P) communicating adjacent two flow channels so as to extend in a direction normal to a direction of the gas flow to form a laminate layer flow consisting of two or more than two gases at an upstream portion of location of the crystal substrate.

摘要翻译： 化合物半导体气相外延装置包括圆柱形反应器容器（2），设置在反应器容器中的多个流动通道（17,27），设置在一个流动通道中的晶体基板（7），多个气体 用于分别供给在晶体基板上生长的化合物的气体的供给管和至少一个狭缝（10）或与两个流动通道相邻的线状排列的细孔（P），以沿着垂直于 气流在晶体基板的位置的上游部分处形成由两个或多于两个气体组成的层压层流。