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    PROCEDE DE FABRICATION D'UN SUBSTRAT DE SILICIUM COMPORTANT UNE MINCE COUCHE D'OXYDE DE SILICIUM ENSEVELIE
    1.
    发明授权
    PROCEDE DE FABRICATION D'UN SUBSTRAT DE SILICIUM COMPORTANT UNE MINCE COUCHE D'OXYDE DE SILICIUM ENSEVELIE 有权
    PROCESS FOR具有薄，掩埋氧化物硅SILICON SUBSTRATE

    公开(公告)号：EP1186024B1

    公开(公告)日：2006-11-15

    申请号：EP00940457.5

    申请日：2000-06-08

    申请人： Fahrenheit Thermoscope LLC

    发明人： JURCZAK, Malgorzata ,  SKOTNICKI, Thomas

    IPC分类号： H01L21/762 ,  H01L21/20

    CPC分类号： H01L21/76251

    摘要： The invention concerns a method consisting in: a) producing a first element (A) comprising a first silicon body (1a) whereof the main surface is coated, in succession, with a buffer layer (2a) of germanium or of an alloy of germanium and silicon and with a thin silicon film (3a); b) producing a second element (B), comprising a silicon body (1b) whereof a main surface is coated with a thin silicon oxide film (2b); c) linking the first element (A) with the second element (B) such that the thin silicon film (3a) of the first element (A) is in contact with the thin silicon oxide film (2b) of the second element (B); and d) eliminating the buffer layer (2a) to recuperate the silicon substrate comprising a buried thin silicon oxide film, and a reusable silicon substrate. The invention is useful for making microelectronic devices such as CMOS and MOSFET devices.

    ELLIPSOMETRE SPECTROSCOPIQUE A FAIBLE BRUIT
    5.
    发明授权
    ELLIPSOMETRE SPECTROSCOPIQUE A FAIBLE BRUIT 有权
    OUT CHARM分光椭率

    公开(公告)号：EP1290417B1

    公开(公告)日：2009-03-04

    申请号：EP01945381.0

    申请日：2001-06-08

    申请人： Fahrenheit Thermoscope LLC

    发明人： FERRIEU, Frédéric

    IPC分类号： G01J4/00 ,  G01N21/21

    CPC分类号： G01J4/00 ,  G01N21/211

    摘要： The invention concerns a spectroscopic ellipsometer comprising a light source (1) emitting an optical beam, a polarizer (2) arranged on the path of the optical beam emitted by the light source, a sample holder (9) receiving the optical beam from the polarizer output, a polarisation analyser (3) designed to be traversed by the beam reflected by the sample to be analysed, a detection set which receives the beam from the analyser output and which comprises a monochromator (5) and a photodetector (4), means (6) for processing the signal in said detection set output, which include an electronic counter (13). Cooling means (12) maintain the detection set at a temperature lower than room temperature, minimising the noise of the detector so as to be constantly in the condition of minimum photon noise. The optimal measuring condition of the ellipsometer is reached by minimising all the sources of noise (lamps, detection, ambient noise).