公开(公告)号：EP2395127A1

公开(公告)日：2011-12-14

申请号：EP11169596.1

申请日：2011-06-10

申请人： AIR PRODUCTS AND CHEMICALS, INC.

发明人： Behm, Philip E. ,  McDermott, Wayne Thomas ,  Xiao, Manchao ,  Pearlstein, Ronald Martin ,  Lo, Sai-Hong A. ,  Derecskei-Kovacs, Agnes

IPC分类号： C23C16/448

CPC分类号： C23C16/448

摘要： The present invention is a container and a process for passivating the internal surface of the container to store monochlorosilane in a stable manner without degradation of the monochlorosilane. Various container surface modifications have been identified to reduce surface reactions to acceptable levels. Some of the described surface modifications result in significant reduction in monochlorosilane instability.

摘要翻译： 本发明是一种用于钝化容器内表面的容器和方法，以稳定地存储一氯硅烷而不降解一氯硅烷。 已经确定了各种容器表面改性以将表面反应降低至可接受的水平。 一些所述的表面改性导致一氯硅烷不稳定性的显着降低。

公开(公告)号：EP2639331A3

公开(公告)日：2014-04-09

申请号：EP13159800.5

申请日：2013-03-18

申请人： AIR PRODUCTS AND CHEMICALS, INC.

发明人： Xiao, Manchao ,  Pearlstein, Ronald Martin ,  Derecskei-Kovacs, Agnes ,  Lei, Xinjian ,  Ho, Richard ,  O'Neill, Mark Leonard ,  Spence, Daniel P. ,  Mayorga, Steven Gerard

IPC分类号： C23C18/12 ,  C07F7/08 ,  C07F7/12 ,  C07F7/18 ,  C09D5/00

CPC分类号： C09D5/00 ,  C23C18/122 ,  C23C18/1254 ,  C23C18/1295

摘要： A formulation comprising a first organosilane precursor, optionally a halogenation reagent, and a second organosilane precursor are described. At least a portion or all of the halogenation reagent may react with the first organosilane precursor to provide the second organosilane precursor. Methods of generating such formulation in situ from readily available pure materials are also provided. Further provided are methods of using the formulations as the precursor for a flowable vapor deposition process.

公开(公告)号：EP2535343B1

公开(公告)日：2016-03-30

申请号：EP12169229.7

申请日：2012-05-24

申请人： AIR PRODUCTS AND CHEMICALS, INC.

发明人： Xiao, Manchao ,  Lei, Xinjian ,  Han, Bing ,  O'Neill, Mark Leonard ,  Pearlstein, Ronald Martin ,  Ho, Richard ,  Chandra, Haripin ,  Derecskei-Kovacs, Agnes

IPC分类号： C07F7/02 ,  C23C16/36 ,  H01L21/02

CPC分类号： C23C16/24 ,  C07F7/025 ,  C07F7/10 ,  C23C16/308 ,  C23C16/32 ,  C23C16/345 ,  C23C16/347 ,  C23C16/401 ,  C23C16/402 ,  C23C16/45553 ,  H01L21/02126 ,  H01L21/02164 ,  H01L21/02219 ,  H01L21/0228

公开(公告)号：EP2574611A1

公开(公告)日：2013-04-03

申请号：EP12185977.1

申请日：2012-09-25

申请人： AIR PRODUCTS AND CHEMICALS, INC.

发明人： Xiao Manchao ,  Lei, Xinjian ,  O'Neill, Mark Leonard ,  Han, Bing ,  Pearlstein, Ronald Martin ,  Chandra, Haripin ,  Bowen, Heather Regina ,  Derecskei-Kovacs, Agnes

IPC分类号： C07F7/12 ,  C23C16/30 ,  H01L21/00

CPC分类号： C07F7/025 ,  C07F7/12 ,  C23C16/402 ,  C23C16/45536 ,  C23C16/45553 ,  H01L21/02126 ,  H01L21/02164 ,  H01L21/02219 ,  H01L21/0228 ,  H01L21/02532 ,  H01L21/0262

摘要： Described herein are precursors and methods of forming films. In one aspect, there is provided a precursor having Formula I:

        X m R 1 n H p Si(NR 2 R 3 ) 4-m-n-p      I

wherein X is selected from Cl, Br, I; R 1 is selected from linear or branched C 1 -C 10 alkyl group, a C 2 -C 12 alkenyl group, a C 2 -C 12 alkynyl group, a C 4 -C 10 cyclic alkyl, and a C 6 -C 10 aryl group; R 2 is selected from a linear or branched C 1 - C 10 alkyl, a C 3 - C 12 alkenyl group, a C 3 -C 12 alkynyl group, a C 4 - C 10 cyclic alkyl group, and a C 6 - C 10 aryl group; R 3 is selected from a branched C 3 - C 10 alkyl group, a C 3 -C 12 alkenyl group, a C 3 - C 12 alkynyl group, a C 4 - C 10 cyclic alkyl group, and a C 6 - C 10 aryl group; m is 1 or 2; n is 0, 1, or 2; p is 0, 1 or 2; and m+n+p is less than 4, wherein R 2 and R 3 are linked or not linked to form a ring.

摘要翻译： 在描述的前体和形成薄膜的方法。 在一个方面，提供了一种具有前体通式I：€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒXm个R 1N的ħp的Si（NR 2 R 3）4-MNP€ƒ€ƒ€ ƒ€ƒ€ƒiworin X为选自Cl，Br选择，I; 的R 1选自直链或支链的C 1 -C 10烷基，C 2 -C 12烯基，C 2 -C 12炔基，C 4 -C 10环烷基，和C 6 -C 10 芳基; R 2为选自直链或支链的C 1 - C 10的烷基，一个C 3 - C 12烯基，C 3 -C 12炔基，C 4 - C 10的环状烷基，和C 6 - C ^ 10芳基; C 10的烷基，C 3〜C 12烯基，C 3 - - C 12炔基，C 4 - C 10的环状烷基，和C 6 - ，R 3选自支链C 3选定的C 10 芳基; m是1或2; n为0，1或2; p为0，1或2; 且m + n + p是小于4，worin R 2和R 3连接或不连接形成环。

公开(公告)号：EP2535343A2

公开(公告)日：2012-12-19

申请号：EP12169229.7

申请日：2012-05-24

申请人： AIR PRODUCTS AND CHEMICALS, INC.

发明人： Xiao, Manchao ,  Lei, Xinjian ,  Han, Bing ,  O'Neill, Mark Leonard ,  Pearlstein, Ronald Martin ,  Ho, Richard ,  Chandra, Haripin ,  Derecskei-Kovacs, Agnes

IPC分类号： C07F7/02 ,  C23C16/36 ,  H01L21/02

CPC分类号： C23C16/24 ,  C07F7/025 ,  C07F7/10 ,  C23C16/308 ,  C23C16/32 ,  C23C16/345 ,  C23C16/347 ,  C23C16/401 ,  C23C16/402 ,  C23C16/45553 ,  H01L21/02126 ,  H01L21/02164 ,  H01L21/02219 ,  H01L21/0228

摘要： Described herein are organoaminosilane precursors which can be used to deposit silicon containing films which contain silicon and methods for making these precursors. Also disclosed herein are deposition methods for making silicon-containing films or silicon containing films using the organoaminosilane precursors described herein. Also disclosed herein are the vessels that comprise the organoaminosilane precursors or a composition thereof that can be used, for example, to deliver the precursor to a reactor in order to deposit a silicon-containing film.

摘要翻译： 本文描述了可用于沉积含有硅的含硅膜的有机氨基硅烷前体和用于制备这些前体的方法。 本文还公开了使用本文所述的有机氨基硅烷前体制备含硅膜或含硅膜的沉积方法。 还公开了包含有机氨基硅烷前体或其组合物的容器，其可以用于例如将前体输送到反应器以沉积含硅膜。

公开(公告)号：EP2574611B1

公开(公告)日：2016-03-23

申请号：EP12185977.1

申请日：2012-09-25

申请人： AIR PRODUCTS AND CHEMICALS, INC.

发明人： Xiao Manchao ,  Lei, Xinjian ,  O'Neill, Mark Leonard ,  Han, Bing ,  Pearlstein, Ronald Martin ,  Chandra, Haripin ,  Bowen, Heather Regina ,  Derecskei-Kovacs, Agnes

IPC分类号： C07F7/12 ,  C23C16/30 ,  H01L21/00

CPC分类号： C07F7/025 ,  C07F7/12 ,  C23C16/402 ,  C23C16/45536 ,  C23C16/45553 ,  H01L21/02126 ,  H01L21/02164 ,  H01L21/02219 ,  H01L21/0228 ,  H01L21/02532 ,  H01L21/0262

公开(公告)号：EP2639331A2

公开(公告)日：2013-09-18

申请号：EP13159800.5

申请日：2013-03-18

申请人： AIR PRODUCTS AND CHEMICALS, INC.

发明人： Xiao, Manchao ,  Pearlstein, Ronald Martin ,  Derecskei-Kovacs, Agnes ,  Lei, Xinjian ,  Ho, Richard ,  O'Neill, Mark Leonard ,  Spence, Daniel P. ,  Mayorga, Steven Gerard

IPC分类号： C23C18/12 ,  C07F7/08 ,  C07F7/12 ,  C07F7/18

CPC分类号： C09D5/00 ,  C23C18/122 ,  C23C18/1254 ,  C23C18/1295

摘要： A formulation comprising a first organosilane precursor, optionally a halogenation reagent, and a second organosilane precursor are described. At least a portion or all of the halogenation reagent may react with the first organosilane precursor to provide the second organosilane precursor. Methods of generating such formulation in situ from readily available pure materials are also provided. Further provided are methods of using the formulations as the precursor for a flowable vapor deposition process.

摘要翻译： 描述了包含第一有机硅烷前体，任选的卤化试剂和第二有机硅烷前体的配方。 至少一部分或全部卤化试剂可与第一有机硅烷前体反应以提供第二有机硅烷前体。 还提供了从容易获得的纯物质原位产生这种制剂的方法。 还提供了使用制剂作为可流动气相沉积方法的前体的方法。

公开(公告)号：EP2535343A3

公开(公告)日：2013-03-27

申请号：EP12169229.7

申请日：2012-05-24

申请人： AIR PRODUCTS AND CHEMICALS, INC.

发明人： Xiao, Manchao ,  Lei, Xinjian ,  Han, Bing ,  O'Neill, Mark Leonard ,  Pearlstein, Ronald Martin ,  Ho, Richard ,  Chandra, Haripin ,  Derecskei-Kovacs, Agnes

IPC分类号： C07F7/02 ,  C23C16/36 ,  H01L21/02

CPC分类号： C23C16/24 ,  C07F7/025 ,  C07F7/10 ,  C23C16/308 ,  C23C16/32 ,  C23C16/345 ,  C23C16/347 ,  C23C16/401 ,  C23C16/402 ,  C23C16/45553 ,  H01L21/02126 ,  H01L21/02164 ,  H01L21/02219 ,  H01L21/0228

摘要： Described herein are organoaminosilane precursors which can be used to deposit silicon containing films which contain silicon and methods for making these precursors. Also disclosed herein are deposition methods for making silicon-containing films or silicon containing films using the organoaminosilane precursors described herein. Also disclosed herein are the vessels that comprise the organoaminosilane precursors or a composition thereof that can be used, for example, to deliver the precursor to a reactor in order to deposit a silicon-containing film.