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公开(公告)号：EP2103717A1
公开(公告)日：2009-09-23
申请号：EP08003786.4
申请日：2008-02-29
IPC分类号： C25D3/60
CPC分类号： C25D3/60
摘要： Beschrieben wird ein wässriges cyanid-freies Elektrolytbad zur Abscheidung von Zinn-Legierungsschichten auf Substratoberflächen, umfassend (i) eine Zinn-Ionenquelle und eine Quelle für ein weiteres Legierungselement, dadurch gekennzeichnet, dass sie weiterhin (ii) N-Methylpyrrolidon enthält.
摘要翻译： 无氰水溶液电解液包含锡离子源和另一合金元素源; 和N-甲基吡咯烷酮。 包括用于电镀光泽均匀的锡合金涂层的方法的独立权利要求，其包括将要涂覆的基底引入无氰化物的电解液浴中，并将锡合金涂层电镀在基底上。
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公开(公告)号：EP3933072A1
公开(公告)日：2022-01-05
申请号：EP21186683.5
申请日：2018-06-18
摘要： The present invention is related to a nickel electroplating bath for depositing a decorative nickel coating on a substrate to be treated characterized in that the electroplating bath comprises at least a nickel ion source, at least one amino acid and/or at least one carboxylic acid, which is not an amino acid; wherein the total concentration of the amino acid(s) is ranging from 1 to 10 g/l, wherein the total concentration of carboxylic acid(s), which is/are not an amino acid, is ranging from 10 to 40 g/l; wherein the electroplating bath is free of boric acid; wherein the total concentration of the nickel ions is ranging from 55 to 80 g/l; and wherein the nickel electroplating bath has a chloride content ranging from 7.5 to 40 g/l.
The present invention is also related to a method for depositing a nickel coating on a substrate to be treated; and the use of such an inventive nickel electroplating bath for depositing a bright, semi-bright, satin, matte or non-conductive particle containing nickel coating by conducting such a method.-
3.发明授权Pyrophosphathaltiges Bad zur cyanidfreien Abscheidung von Kupfer-Zinn-Legierungen 有权Pyrophosphathaltiges浴铜 - 锡合金的无氰沉积
公开(公告)号：EP2130948B1
公开(公告)日：2010-12-22
申请号：EP08010058.9
申请日：2008-06-02
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4.发明授权Method for increasing adhesion between a chromium surface and a lacquer 有权Verfahren zurErhöhungderAdhäsionzwischen einerChromoberflächeund Lack
公开(公告)号：EP3045565B1
公开(公告)日：2017-03-08
申请号：EP15150950.2
申请日：2015-01-13
摘要： The present invention concerns a method for increasing the adhesion between a chromium surface and a lacquer wherein said chromium surface is contacted with an aqueous solution comprising at least one phosphorous compound according to formulae R 1 -P(O)(OR 2 R 3 ) 1 and R 1 -O-P(O)(OR 2 R 3 ) 2 wherein R 1 is a C 1 to C 12 alkyl group, linear, branched or cyclic comprising at least one polar residue and R 2 and R 3 are independently selected from the group consisting of hydrogen, lithium, sodium, potassium, ammonium and C 1 to C 4 alkyl while passing an external electrical current through said substrate and at least one anode wherein said substrate serves as the cathode.
摘要翻译： 本发明涉及增加铬表面和漆之间的粘合力的方法，其中所述铬表面与包含至少一种根据式R 1 -P（O）（OR 2 R 3）1的磷化合物的水溶液接触 和R 1 -OP（O）（OR 2 R 3）2，其中R 1是C 1至C 12烷基，包括至少一个极性残基的直链，支链或环状，R 2和R 3独立地选自 通过外部电流通过所述衬底和至少一个阳极，其中所述衬底用作阴极，由氢，锂，钠，钾，铵和C 1至C 4烷基组成的组。
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5.发明公开
公开(公告)号：EP3045565A1
公开(公告)日：2016-07-20
申请号：EP15150950.2
申请日：2015-01-13
摘要： The present invention concerns a method for increasing the adhesion between a chromium surface and a lacquer wherein said chromium surface is contacted with an aqueous solution comprising at least one phosphorous compound according to formulae R 1 -P(O)(OR 2 R 3 ) 1 and R 1 -O-P(O)(OR 2 R 3 ) 2 wherein R 1 is a C 1 to C 12 alkyl group, linear, branched or cyclic comprising at least one polar residue and R 2 and R 3 are independently selected from the group consisting of hydrogen, lithium, sodium, potassium, ammonium and C 1 to C 4 alkyl while passing an external electrical current through said substrate and at least one anode wherein said substrate serves as the cathode.
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公开(公告)号：EP4101948A1
公开(公告)日：2022-12-14
申请号：EP21178856.7
申请日：2021-06-10
摘要： The present invention relates to a method for adjusting the brightness L* of an electroplated chromium layer, in particular of a dark electroplated chromium layer. The method includes an aqueous trivalent chromium electroplating bath comprising colloidal particles and/or agglomerates thereof and a step of fully or partially removing same with optionally adding colloidal particles.
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8.发明公开Pyrophosphathaltiges Bad zur cyanidfreien Abscheidung von Kupfer-Zinn-Legierungen 有权Pyrophosphathaltiges on ur ur en en en en en en en en en en en en en en en en en en en en en en en en
公开(公告)号：EP2130948A1
公开(公告)日：2009-12-09
申请号：EP08010058.9
申请日：2008-06-02
摘要： Beschrieben wird ein pyrophosphathaltiges Bad zur cyanidfreien Abscheidung von Kupferlegierungen auf Substratoberflächen, umfassend ein Umsetzungsprodukt eines sekundären Monoamins mit einem Diglycidylether. Das Elektrolytbad eignet sich zur galvanischen Abscheidung von glänzenden weißen, ebenen und einheitlichen Kupfer-Zinn-Legierungsüberzügen.
摘要翻译： 含有焦磷酸盐的浴（I）包括二次单胺与二缩水甘油醚的反应产物，其中二元单胺是吗啉，二缩水甘油醚是甘油二缩水甘油醚，聚（丙二醇）二缩水甘油醚和/或聚（乙二醇）二缩水甘油醚。 包括以下独立权利要求：（1）光亮剂和铜 - 锡合金涂层的电离分离，包括使待涂覆的基底和不含氰酸水溶液（I）接触并分离基底上的铜 - 锡合金涂层; 和（2）反应产物。
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