公开(公告)号：EP2688966A1

公开(公告)日：2014-01-29

申请号：EP12760432.0

申请日：2012-03-19

申请人： BASF SE

发明人： NOLLER, Bastian ,  LAUTER, Michael ,  SUGIHARTO, Albert Budiman ,  LI, Yuzhuo ,  RUSHING, Kenneth ,  FRANZ, Diana ,  BÖHN, Roland ,  GAO, Ning

IPC分类号： C09G1/02

CPC分类号： H01L21/3212 ,  C09G1/02 ,  C09G1/04 ,  C09K3/1463 ,  H01L21/30625

摘要： A chemical-mechanical polishing ("CMP") composition (P) comprising (A) inorganic particles, organic particles, or a mixture or composite thereof, (B) at least one type of N-heterocyclic compound as corrosion inhibitor, (C) at least one type of a further corrosion inhibitor selected from the group consisting of: (C1) an acetylene alcohol, and (C2) a salt or an adduct of (C2a) an amine, and (C2b) a carboxylic acid comprising an amide moiety, (D) at least one type of an oxidizing agent, (E) at least one type of a complexing agent, and (F) an aqueous medium.

公开(公告)号：EP2451613A1

公开(公告)日：2012-05-16

申请号：EP10723957.6

申请日：2010-05-18

申请人： Evonik Degussa GmbH ,  BASF SE

发明人： KRÖLL, Michael ,  LORTZ, Wolfgang ,  HEBERER, Stefan ,  BRANDS, Mario ,  LI, Yuzhuo ,  DRESCHER, Bettina ,  FRANZ, Diana

IPC分类号： B24D3/00 ,  C03C19/00 ,  C09G1/02 ,  C09K3/14 ,  H01L21/321

CPC分类号： C09G1/02 ,  C09K3/1463 ,  H01L21/31053

摘要： Aqueous dispersion comprising cerium oxide and silicon dioxide, obtainable by first mixing a cerium oxide starting dispersion and a silicon dioxide starting dispersion while stirring, and then dispersing at a shear rate of 10000 to 30000 s
-1 , wherein a) the cerium oxide starting dispersion - contains 0.5 to 30% by weight of cerium oxide particles as the solid phase, - has a d5o of the particle size distribution of 10 to 100 nm - and has a pH of 1 to 7, and b) the silicon dioxide starting dispersion - contains 0.1 to 30% by weight of colloidal silicon dioxide particles as the solid phase, has a d5o of the particle size distribution of 3 to 50 nm and has a pH of 6 to 11.5, d) with the proviso that the d5o of the particle size distribution of the cerium oxide particles is greater than that of the silicon dioxide particles, the cerium oxide/silicon dioxide weight ratio is >1 and the amount of cerium oxide starting dispersion is such that the zeta potential of the dispersion is negative.

公开(公告)号：EP2016106A1

公开(公告)日：2009-01-21

申请号：EP07728546.8

申请日：2007-04-26

申请人： BASF SE

发明人： GUZMANN, Marcus ,  KONRAD, Rouven ,  FRANZ, Diana ,  STÖSSER, Michael ,  PAKUSCH, Joachim Dr. ,  MIJOLVIC, Darijo Dr. ,  LÖFFLER, Achim Dr. ,  RITTIG, Frank Dr.

IPC分类号： C08F220/00

CPC分类号： C08F220/58 ,  C08F220/06

摘要： The present invention relates to copolymers which are obtainable from the free-radical copolymerization of at least (a) a monoethylenically unsaturated carboxylic acid having from 3 to 6 carbon atoms or its anhydride with (b) a reaction mixture comprising a component of the general structural formula (I) where R1, R2, R3, R4 are each independently H or C1-C4-alkyl, n and m are each independently an integer from 1 to 100 and R5 is H or methyl, to a process for preparing the inventive polymer and to its use as a scale inhibitor.

公开(公告)号：EP3214938A1

公开(公告)日：2017-09-13

申请号：EP15790916.9

申请日：2015-11-03

申请人： BASF SE

发明人： MECFEL-MARCZEWSKI, Joanna ,  KREJCA, Matthias ,  FRANZ, Diana ,  BRATZ, Matthias ,  BERGHAUS, Rainer ,  MORAN PUENTE, Diana Westfalia ,  PUTZIEN, Sophie

IPC分类号： A01N57/20 ,  A01N37/40 ,  A01N47/06 ,  A01N25/02 ,  A01P13/00 ,  A01N37/50

CPC分类号： A01N47/06 ,  A01N25/02 ,  A01N37/50 ,  A01N57/20 ,  C07D325/00

摘要： The present invention relates to a method for preparing a tank mix, which comprises the step of contacting a pesticide formulation, water, and a tank mix adjuvant which comprises a carbonate of the formula (I); to a pesticide formulation comprising the tank mix adjuvant; to a method of controlling phytopathogenic fungi and/or undesired vegetation and/or undesired insect or mite attack and/or for regulating the growth of plants, wherein the tank mix or the pesticide formulation is allowed to act on the respective pests, their environment or the plants to be protected from the respective pest, on the soil and/or on undesired plants and/or the crop plants and/or their environment; and to a use of the tank mix adjuvant for increasing the efficacyl of a pesticide.

摘要翻译： 含有2-氧代-1,3-二氧戊环-4-羧酸盐的农用化学助剂本发明涉及一种制备罐混合物的方法，该方法包括使农药制剂，水和桶混物助剂接触的步骤，该助剂包含 公式（I）; 涉及包含罐混物助剂的农药制剂; 涉及控制植物病原性真菌和/或不希望的植物和/或不希望的昆虫或螨攻击和/或调节植物生长的方法，其中罐混合物或农药制剂被允许作用于相应的害虫，其环境或 要保护的植物免受相应害虫，土壤和/或不期望的植物和/或作物植物和/或它们的环境的影响; 并且涉及桶混物助剂用于增加杀虫剂功效的用途。

公开(公告)号：EP2852644A1

公开(公告)日：2015-04-01

申请号：EP13794728.9

申请日：2013-05-21

申请人： BASF SE

发明人： NOLLER, Bastian Marten ,  GILLOT, Christophe ,  FRANZ, Diana ,  LI, Yuzhuo

IPC分类号： C09G1/02 ,  H01L21/304 ,  H01L21/306

CPC分类号： C09G1/02 ,  B81C2201/0121 ,  B81C2201/0123 ,  B81C2201/0126 ,  H01L21/02024 ,  H01L21/302 ,  H01L21/304 ,  H01L21/30625 ,  H01L21/3212 ,  H01L21/461

摘要： A process for the manufacture of semiconductor devices comprising the chemical-mechanical polishing of a substrate or layer containing at least one lll-V material in the presence of a chemical-mechanical polishing composition (Q1) comprising (A) inorganic particles, organic particles, or a mixture or composite thereof, (B) at least one amphiphilic non-ionic surfactant having (b1) at least one hydrophobic group; and (b2) at least one hydrophilic group selected from the group consisting of polyoxyalkylene groups comprising (b22) oxyalkylene monomer units other than oxyethylene monomer units; and (M) an aqueous medium.

公开(公告)号：EP2137279A1

公开(公告)日：2009-12-30

申请号：EP08736064.0

申请日：2008-04-10

申请人： BASF SE

发明人： GUZMANN, Marcus ,  LIU, Yaqian ,  KONRAD, Rouven ,  FRANZ, Diana

IPC分类号： C09K8/524 ,  C10L1/10 ,  F17D1/08

CPC分类号： C09K8/524 ,  C10L1/10 ,  C10L1/125 ,  C10L1/1824 ,  C10L1/1826 ,  C10L1/1881 ,  C10L1/1963 ,  C10L1/1966 ,  C10L1/1973 ,  C10L1/1985 ,  C10L1/2222 ,  C10L1/2225 ,  C10L1/223 ,  C10L1/224 ,  C10L1/23 ,  C10L1/2364 ,  C10L1/238 ,  C10L1/2381 ,  C10L1/2437 ,  C10L1/2641 ,  C10L1/2658 ,  C10L10/16

摘要： The present invention relates to a method for the production of a paraffin inhibitor formulation, comprising the following steps: (a) producing a mixture containing (i) a wax-like paraffin inhibitor component having a melting point of > 0ºC, (ii) an emulsifier component, and (iii) optionally water at a temperature in a first temperature range, wherein the first temperature range is higher than the melting point of the component (i), and wherein the optionally present water produces an w/o emulsion and has a weight proportion that is lower than the sum of the weight proportions of the components (i) and (ii); (b) adding water to the mixture, wherein after the water has been completely added an o/w emulsion is present; (c) cooling the o/w emulsion from step (b) to a temperature in a second temperature range, which is lower than the melting point of the component (i); and (d) optionally adding an organic solvent component (iv), which can be mixed at least partly with water and in which the paraffin inhibitor component is not soluble. The present invention further relates to formulations that can be obtained from a production method, and to the use and application for paraffin inhibitors/solidification point reduction of crude oil or crude oil raffinates.

公开(公告)号：EP2688966B1

公开(公告)日：2016-03-09

申请号：EP12760432.0

申请日：2012-03-19

申请人： BASF SE

发明人： NOLLER, Bastian ,  LAUTER, Michael ,  SUGIHARTO, Albert Budiman ,  LI, Yuzhuo ,  RUSHING, Kenneth ,  FRANZ, Diana ,  BÖHN, Roland ,  GAO, Ning

IPC分类号： C09G1/02 ,  H01L21/321

CPC分类号： H01L21/3212 ,  C09G1/02 ,  C09G1/04 ,  C09K3/1463 ,  H01L21/30625

公开(公告)号：EP2847785A1

公开(公告)日：2015-03-18

申请号：EP13788644.6

申请日：2013-04-29

申请人： BASF SE

发明人： FRANZ, Diana ,  NOLLER, Bastian Marten

IPC分类号： H01L21/304 ,  H01L21/302

CPC分类号： C09G1/02 ,  C09K3/1463 ,  H01L21/02024 ,  H01L21/30625

摘要： A process for the manufacture of semiconductor devices is provided. The process comprises the chemical-mechanical polishing of a substrate or layer containing at least one III-V material in the presence of a chemical-mechanical polishing composition (Q1) comprising (A) inorganic particles, organic particles, or a mixture or composite thereof, (B) a polymer comprising at least one N-heterocycle, and (M) an aqueous medium and whereas Q1 has a pH of from 1.5 to 4.5.

公开(公告)号：EP2614122A1

公开(公告)日：2013-07-17

申请号：EP11823140.6

申请日：2011-09-06

申请人： BASF SE

发明人： NOLLER, Bastian ,  FRANZ, Diana ,  LI, Yuzhuo ,  USMAN IBRAHIM, Sheik Ansar ,  PINDER, Harvey Wayne ,  VENKATARAMAN, Shyam Sundar

IPC分类号： C09G1/02 ,  C09G1/04 ,  A01N51/00

CPC分类号： C09K13/00 ,  C09G1/02 ,  C09K3/1463 ,  H01L21/31053

摘要： An aqueous polishing composition comprising (A) at least one water-soluble or water-dispersible compound selected from the group consisting of N-substituted diazenium dioxides and N'-hydroxy-diazenium oxide salts; and (B) at least one type of abrasive particles; the use of the compounds (A) for manufacturing electrical, mechanical and optical devices and a process for polishing substrate materials for electrical, mechanical and optical devices making use of the aqueous polishing composition.