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    LATENT ACIDS AND THEIR USE
    6.
    发明公开
    LATENT ACIDS AND THEIR USE 审中-公开
    潜在的酸和它们的用途

    公开(公告)号：EP3253735A1

    公开(公告)日：2017-12-13

    申请号：EP16702104.7

    申请日：2016-01-29

    Applicant: BASF SE

    Inventor： TANAKA, Keita ,  MATSUOKA, Yuki ,  KUNIMOTO, Kazuhiko ,  ASAKURA, Toshikage ,  KURA, Hisatoshi

    IPC: C07D207/20 ,  C07C309/63 ,  C07D209/04

    CPC classification number: C07D307/52 ,  C07D311/16 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/039

    Abstract: Compounds of the formula (I) and (IA) wherein X is -O(CO)-; R1 is C1-C12haloalkyl or C6-C10haloaryl; R2 is located in position 7 of the coumarinyl ring and is OR8; R2a, R2b and R2C independently of each other are hydrogen; R3 is C1-C8haloalkyl or C1-C8haloalkyl; R4 is hydrogen; and R8 is C1-C6alkyI; are suitable as photosensitive acid donors in the preparation of photoresist compositions such as used for example in the preparation of spacers, insulating layers, interlayer dielectric films, insulation layers, planarization layers, protecting layers, overcoat layers, banks for electroluminescence displays and liquid crystal displays (LCD).

    SULFONIUM COMPOUNDS, THEIR PREPARATION AND USE
    8.
    发明公开
    SULFONIUM COMPOUNDS, THEIR PREPARATION AND USE 审中-公开
    SULFONIUMVERBINDUNGEN，DEREN HERSTELLUNG UND VERWENDUNG

    公开(公告)号：EP2838927A2

    公开(公告)日：2015-02-25

    申请号：EP13716792.0

    申请日：2013-04-17

    Applicant: BASF SE

    Inventor： KUNIMOTO, Kazuhiko ,  KURA, Hisatoshi

    IPC: C08G59/68 ,  C08L63/00 ,  G03F7/004 ,  C09D11/02 ,  C09D163/00

    CPC classification number: C08G59/62 ,  B05D3/007 ,  C07C309/08 ,  C07C309/10 ,  C07C2601/08 ,  C07C2601/14 ,  C07D307/10 ,  C07D309/08 ,  C07D333/46 ,  C08G59/4064 ,  C08L63/00 ,  C09D11/02 ,  C09D163/00 ,  C09J163/00 ,  G03F7/0045

    Abstract: Compounds of the formula (I), Ia or (Ib) wherein A
    1- and A
    - is for example (II) is 1 or 2; X is C
    1 -C
    4 alkylene or CO; Y is for example O, O(CO), O(CO)O, R
    1 is for example hydrogen, d-dsalkyl, C
    3 -C
    30 cycloalkyl, phenyl, naphthyl, anthracyl, phenanthryl, biphenylyl, fluorenyl or C
    3 -C
    20 heteroaryl, all of which optionally are substituted; R
    2 and R
    3 for example are C
    1 -C
    10 haloalkylene which is optionally substituted, or R
    2 and R
    3 are phenylene, which optionally is substituted; R
    4 is a group (A) or a group (B); R
    5 and R
    6 for example are C
    1 -C
    20 alkyl; or R
    4 and R
    5 or R
    4 and R
    6 together form a straight-chain C
    2 -C
    6 alkylene, R
    5 and R
    6 together form a straight-chain C
    2 -C
    6 alkylene; R
    7 , R
    8 , R
    9 and R
    10 ifor example are C
    1 -C
    20 alkyl; M for example is C
    1 -C
    20 alkylene, C
    2 -C
    20 alkenylene, C
    2 -C
    20 alkynylene; R
    25 and R
    26 are for example hydrogen, C
    1 -C
    20 alkyl; R
    27 , R
    28 , R
    29 , R
    30 and R
    31 are for example hydrogen, C
    1 -C
    20 alkyl, C
    2 -C
    20 alkenyl, C
    3 -C
    20 cycloalkyl, or two radicals R
    27 and R
    28 , R
    28 and R
    29 , R
    29 and R
    30 and/or R
    30 and R
    31 together form a straight-chain C
    2 -C
    6 alkylene, or R
    25 and R
    27 together form 1,2-phenylene, R
    33 and R
    34 for example are hydrogen, C
    1 -C
    20 alkyl; R
    35 , R
    36 and R
    37 for example are hydrogen, C
    1 -C
    20 alkyl; are suitable as thermo-acid generators.

    Abstract translation: 其中A1和A-为（II）的式（I），（Ia）或（Ib）的化合物为1或2; X是C 1 -C 4亚烷基或CO; Y是例如O，O（CO），O（CO）O，R 1是例如氢，d-二烷基，C 3 -C 30环烷基，苯基，萘基，蒽基，菲基，联苯基，芴基或C 3 -C 20杂芳基， 任选被取代; R 2和R 3例如是任选被取代的C 1 -C 10卤代亚烷基，或者R 2和R 3是任选被取代的亚苯基; R4是一组（A）或一组（B）; R5和R6例如是C1-C20烷基; 或R 4和R 5或R 4和R 6一起形成直链C 2 -C 6亚烷基，R 5和R 6一起形成直链C 2 -C 6亚烷基; R 7，R 8，R 9和R 10如果为C 1 -C 20烷基; M例如是C 1 -C 20亚烷基，C 2 -C 20亚烯基，C 2 -C 20亚炔基; R 25和R 26是例如氢，C 1 -C 20烷基; R27，R28，R29，R30和R31是例如氢，C1-C20烷基，C2-C20链烯基，C3-C20环烷基或两个基团R27和R28，R28和R29，R29和R30和/或R30和R31共同形成直链 链C 2 -C 6亚烷基或R 25和R 27一起形成1,2-亚苯基，R 33和R 34例如是氢，C 1 -C 20烷基; R 35，R 36和R 37例如是氢，C 1 -C 20烷基; 适合作为热酸发生器使用。

    PHOTORESIST COMPOSITION
    9.
    发明公开
    PHOTORESIST COMPOSITION 有权
    光致抗蚀剂组合物

    公开(公告)号：EP2411430A1

    公开(公告)日：2012-02-01

    申请号：EP10709012.8

    申请日：2010-03-17

    Applicant: BASF SE

    Inventor： KURA, Hisatoshi ,  SAMESHIMA, Kaori ,  KUNIMOTO, Kazuhiko ,  NESVADBA, Peter ,  OHWA, Masaki

    IPC: C08F265/02 ,  C08K5/32 ,  C08K5/3435 ,  C07D295/24 ,  G03F7/039

    CPC classification number: G03F7/028 ,  C07D211/94 ,  C07D491/113 ,  C08F110/02 ,  C08F110/06 ,  C08F265/02 ,  C08K5/3435 ,  G03F7/0007 ,  G03F7/031 ,  G03F7/40 ,  C08L33/06

    Abstract: The present invention relates to a radically polymerizable composition comprising a hydroxylamine ester used to manufacture color filters. The invention further relates to novel hydroxylamine esters. The invention further relates to the use of hydroxylamine esters in all liquid crystal display components requiring post-baking. The present invention relates to a radically polymerizable composition comprising: (a) at least one alkaline developable resin; (b) at least one acrylate monomer; (c) at least a photoinitiator; (d) at least one hydroxylamine ester compound of formula (I) wherein R
    a represents an acyl radical; one of R
    b and R
    c represents hydrogen and the other one represents a substituent; or R
    b and R
    c both represent hydrogen or identical or different substituents; or R
    b and R
    c together represent oxygen; or R
    b and R
    c together form a ring; R
    1 - R
    4 each represent C
    1 -C
    6 alkyl; and R
    5 and R
    6 each represent independently of one another hydrogen, C
    1 -C
    6 alkyl or C
    6 -C
    10 aryl; or R
    5 and R
    6 together represent oxygen.

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