Abstract:
The present invention relates to a polymerizable composition comprising at least one ethylenically unsaturated, polymerizable compound and at least one oxime sulfonate compound of the formula (I) QAaBbCc where a is 0, 1, 2, 3, 4 or 6, b is 0, 1, 2, 3, 4 or 6, and c is 0, 1, 2, 3, 4 or 6, where the sum of a+b+c is 1, 2, 3, 4 or 6 where (A) is a group (B) is a group (C) is a group where # denotes the point of attachment to Q; X is S or NR14 and Q, R1, R2, R3 and R14 are as defined in claim 1 and in the description. The present invention also relates to the use of the this composition, to novel oxime sulfonates and the use of the oxime sulfonates as thermal curing promoter.
Abstract:
Oxime sulfonate compounds of the formula (I), wherein R 1 is O(CO)R 4, COOR 5 or CONR 6R 7; n is 1 or 2; R 2 for example is C 1-C 8alkyl, C 3-C 6cycloalkyl or benzyl; R 3 is for example C 1-C 8alkyl, C 3-C 6cycloalkyl, C 1-C 8haloalkyl, C 2-C 8alkenyl, benzyl, phenyl or naphthyl, which optionally are substituted; R 4 is for example C 1-C 8alkyl, C 3-C 6cycloalkyl, C 1-C 8haloalkyl, C 2-C 8alkenyl, benzyl, phenyl or naphthyl, which optionally are substituted; R 5 is for example C 3-C 20alkyl, C 3-C 14cycloalkyl, C 2-C 8alkenyl, C 1-C 12alkyl which is substituted for example by one or more halogen; or R 5 is phenyl or naphthyl, which are unsubstituted; R 6 and R 7 each independently of one another for example are hydrogen, C 1-C 12alkyl, C 1-C 4haloalkyl, phenyl-C 1-C 4alkyl, C 2-C 8alkenyl or C 3-C 6cycloalkyl, phenyl or naphthyl; or R 6 and R 7, together with the N-atom to which they are attached, form a 5- or 6-membered ring; are suitable as thermal radical initiators.
Abstract:
Compounds of the formula (I) and (IA) wherein X is -O(CO)-; R1 is C1-C12haloalkyl or C6-C10haloaryl; R2 is located in position 7 of the coumarinyl ring and is OR8; R2a, R2b and R2C independently of each other are hydrogen; R3 is C1-C8haloalkyl or C1-C8haloalkyl; R4 is hydrogen; and R8 is C1-C6alkyI; are suitable as photosensitive acid donors in the preparation of photoresist compositions such as used for example in the preparation of spacers, insulating layers, interlayer dielectric films, insulation layers, planarization layers, protecting layers, overcoat layers, banks for electroluminescence displays and liquid crystal displays (LCD).
Abstract:
The present invention relates to a polymerizable composition comprising at least one ethylenically unsaturated, polymerizable compound and at least one oxime sulfonate compound of the formula (I) QAaBbCc where a is 0, 1, 2, 3, 4 or 6, b is 0, 1, 2, 3, 4 or 6, and c is 0, 1, 2, 3, 4 or 6, where the sum of a+b+c is 1, 2, 3, 4 or 6 where (A) is a group (B) is a group (C) is a group where # denotes the point of attachment to Q; X is S or NR14 and Q, R1, R2, R3 and R14 are as defined in claim 1 and in the description. The present invention also relates to the use of the this composition, to novel oxime sulfonates and the use of the oxime sulfonates as thermal curing promoter.