OXIME SULFONATE DERIVATIVES
    2.
    发明公开

    公开(公告)号:EP3186226A1

    公开(公告)日:2017-07-05

    申请号:EP15835348.2

    申请日:2015-08-13

    Applicant: BASF SE

    Abstract: Oxime sulfonate compounds of the formula (I), wherein R 1 is O(CO)R 4, COOR 5 or CONR 6R 7; n is 1 or 2; R 2 for example is C 1-C 8alkyl, C 3-C 6cycloalkyl or benzyl; R 3 is for example C 1-C 8alkyl, C 3-C 6cycloalkyl, C 1-C 8haloalkyl, C 2-C 8alkenyl, benzyl, phenyl or naphthyl, which optionally are substituted; R 4 is for example C 1-C 8alkyl, C 3-C 6cycloalkyl, C 1-C 8haloalkyl, C 2-C 8alkenyl, benzyl, phenyl or naphthyl, which optionally are substituted; R 5 is for example C 3-C 20alkyl, C 3-C 14cycloalkyl, C 2-C 8alkenyl, C 1-C 12alkyl which is substituted for example by one or more halogen; or R 5 is phenyl or naphthyl, which are unsubstituted; R 6 and R 7 each independently of one another for example are hydrogen, C 1-C 12alkyl, C 1-C 4haloalkyl, phenyl-C 1-C 4alkyl, C 2-C 8alkenyl or C 3-C 6cycloalkyl, phenyl or naphthyl; or R 6 and R 7, together with the N-atom to which they are attached, form a 5- or 6-membered ring; are suitable as thermal radical initiators.

    Abstract translation: 式(I)的肟磺酸酯化合物,其中R 1是O(CO)R 4,COOR 5或CONR 6 R 7; n是1或2; R 2例如为C 1 -C 8烷基,C 3 -C 6环烷基或苄基; R 3例如为任选被取代的C 1 -C 8烷基,C 3 -C 6环烷基,C 1 -C 8卤代烷基,C 2 -C 8链烯基,苄基,苯基或萘基; R 4例如为任选被取代的C 1 -C 8烷基,C 3 -C 6环烷基,C 1 -C 8卤代烷基,C 2 -C 8链烯基,苄基,苯基或萘基; R 5例如为C 3 -C 20烷基,C 3 -C 14环烷基,C 2 -C 8链烯基,例如被一个或多个卤素取代的C 1 -C 12烷基; 或R 5是未取代的苯基或萘基; R 6和R 7各自彼此独立地为例如氢,C 1 -C 12烷基,C 1 -C 4卤代烷基,苯基-C 1 -C 4烷基,C 2 -C 8链烯基或C 3 -C 6环烷基,苯基或萘基 ; 或R 6和R 7与它们所连接的N原子一起形成5-或6-元环; 适合作为热自由基引发剂。

    LATENT ACIDS AND THEIR USE
    4.
    发明公开
    LATENT ACIDS AND THEIR USE 审中-公开
    潜在的酸和它们的用途

    公开(公告)号:EP3253735A1

    公开(公告)日:2017-12-13

    申请号:EP16702104.7

    申请日:2016-01-29

    Applicant: BASF SE

    Abstract: Compounds of the formula (I) and (IA) wherein X is -O(CO)-; R1 is C1-C12haloalkyl or C6-C10haloaryl; R2 is located in position 7 of the coumarinyl ring and is OR8; R2a, R2b and R2C independently of each other are hydrogen; R3 is C1-C8haloalkyl or C1-C8haloalkyl; R4 is hydrogen; and R8 is C1-C6alkyI; are suitable as photosensitive acid donors in the preparation of photoresist compositions such as used for example in the preparation of spacers, insulating layers, interlayer dielectric films, insulation layers, planarization layers, protecting layers, overcoat layers, banks for electroluminescence displays and liquid crystal displays (LCD).

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