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    OXIME SULFONATE DERIVATIVES
    3.
    发明公开
    OXIME SULFONATE DERIVATIVES 审中-公开

    公开(公告)号：EP3186226A1

    公开(公告)日：2017-07-05

    申请号：EP15835348.2

    申请日：2015-08-13

    Applicant: BASF SE

    Inventor： KUNIMOTO, Kazuhiko ,  SAMESHIMA, Kaori ,  KURA, Hisatoshi ,  MATSUOKA, Yuki

    IPC: C07D213/59 ,  C07D265/32 ,  C07D277/54 ,  C07D291/02 ,  C07D327/06 ,  C07C309/30 ,  C07C327/58 ,  H01L21/027

    CPC classification number: C07C327/58 ,  C07C2601/20 ,  C07D209/48 ,  G02B1/14 ,  G02B5/201 ,  G02B5/223 ,  G02F1/133516 ,  G02F1/1339 ,  G02F2001/133519 ,  G03F7/0007 ,  G03F7/031 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2002 ,  G03F7/38 ,  G03F7/40

    Abstract: Oxime sulfonate compounds of the formula (I), wherein R 1 is O(CO)R 4, COOR 5 or CONR 6R 7; n is 1 or 2; R 2 for example is C 1-C 8alkyl, C 3-C 6cycloalkyl or benzyl; R 3 is for example C 1-C 8alkyl, C 3-C 6cycloalkyl, C 1-C 8haloalkyl, C 2-C 8alkenyl, benzyl, phenyl or naphthyl, which optionally are substituted; R 4 is for example C 1-C 8alkyl, C 3-C 6cycloalkyl, C 1-C 8haloalkyl, C 2-C 8alkenyl, benzyl, phenyl or naphthyl, which optionally are substituted; R 5 is for example C 3-C 20alkyl, C 3-C 14cycloalkyl, C 2-C 8alkenyl, C 1-C 12alkyl which is substituted for example by one or more halogen; or R 5 is phenyl or naphthyl, which are unsubstituted; R 6 and R 7 each independently of one another for example are hydrogen, C 1-C 12alkyl, C 1-C 4haloalkyl, phenyl-C 1-C 4alkyl, C 2-C 8alkenyl or C 3-C 6cycloalkyl, phenyl or naphthyl; or R 6 and R 7, together with the N-atom to which they are attached, form a 5- or 6-membered ring; are suitable as thermal radical initiators.

    Abstract translation: 式（I）的肟磺酸酯化合物，其中R 1是O（CO）R 4，COOR 5或CONR 6 R 7; n是1或2; R 2例如为C 1 -C 8烷基，C 3 -C 6环烷基或苄基; R 3例如为任选被取代的C 1 -C 8烷基，C 3 -C 6环烷基，C 1 -C 8卤代烷基，C 2 -C 8链烯基，苄基，苯基或萘基; R 4例如为任选被取代的C 1 -C 8烷基，C 3 -C 6环烷基，C 1 -C 8卤代烷基，C 2 -C 8链烯基，苄基，苯基或萘基; R 5例如为C 3 -C 20烷基，C 3 -C 14环烷基，C 2 -C 8链烯基，例如被一个或多个卤素取代的C 1 -C 12烷基; 或R 5是未取代的苯基或萘基; R 6和R 7各自彼此独立地为例如氢，C 1 -C 12烷基，C 1 -C 4卤代烷基，苯基-C 1 -C 4烷基，C 2 -C 8链烯基或C 3 -C 6环烷基，苯基或萘基 ; 或R 6和R 7与它们所连接的N原子一起形成5-或6-元环; 适合作为热自由基引发剂。

    OXIME ESTER PHOTOINITIATORS
    4.
    发明公开
    OXIME ESTER PHOTOINITIATORS 审中-公开
    OXIME酯摄影师

    公开(公告)号：EP3019473A1

    公开(公告)日：2016-05-18

    申请号：EP14822764.8

    申请日：2014-06-30

    Applicant: BASF SE

    Inventor： TANAKA, Keita ,  KURA, Hisatoshi ,  KUNIMOTO, Kazuhiko ,  SAMESHIMA, Kaori

    IPC: C07D209/88 ,  C07D409/14

    CPC classification number: G03F7/031 ,  C07D209/86 ,  C07D409/14 ,  C08F22/20 ,  G02B5/201 ,  G03F7/0007 ,  G03F7/027 ,  G03F7/032 ,  G03F7/033 ,  G03F7/0388 ,  G03F7/20 ,  G03F7/322

    Abstract: Compounds of the formula (I) n, wherein Q is a direct bond or an n-valent linking group; n is an integer 2, 3, or 4; Z is for example C1-C20alkylene, C2-C20alkenylene,C5-C8 cycloalkylene or C5-C8 cycloalkenylene; Y is for example C6-C20aryl or C3-C20heteroaryl; R1 is for example hydrogen, C2-C5alkenyl, C3-C8cycloalkyl, C1-C12alkyl, phenyl, naphthyl, C3-C20heteroaryl, C1-C8alkoxy, benzyloxy or phenoxy; R2 is for example C1-C20alkyl, C2-C12alkenyl, C4-C8cycloalkenyl, C2-C12alkinyl, C3-C10cycloalkyl, phenyl or naphthyl; R15, R16, R17, R18, R19 and R20 independently of each other for example are hydrogen, halogen, C1-C20alkyl, C6-C20aryl or C4-C20heteroaryl; provided that a compound wherein R15, R16, R17, R18, R19 and R20 are hydrogen, Y is thienyl, R1 is methyl, R2 is ethyl, n is 2, Q is a direct bond and Z is n-propylene and a compound wherein R15, R16, R17, R18, R19 and R20 are hydrogen, Y is thienyl, R1 is methyl, R2 is ethyl, n is 2, Q as an n-valent linking group is methylene and Z is methylene are excluded; are reactive photoinitiators in particular in electronic applications.

    Abstract translation: 式（I）n的化合物，其中Q是直接键或n价连接基团; n是整数2,3或4; Z为例如C 1 -C 20亚烷基，C 2 -C 20亚烯基，C 5 -C 8亚环烷基或C 5 -C 8亚环烯基; Y为例如C 6 -C 20芳基或C 3 -C 20杂芳基; R 1为例如氢，C 2 -C 5烯基，C 3 -C 8环烷基，C 1 -C 12烷基，苯基，萘基，C 3 -C 20杂芳基，C 1 -C 8烷氧基，苄氧基或苯氧基; R 2例如为C 1 -C 20烷基，C 2 -C 12链烯基，C 4 -C 8环烯基，C 2 -C 12炔基，C 3 -C 10环烷基，苯基或萘基; R 15，R 16，R 17，R 18，R 19和R 20彼此独立地为例如氢，卤素，C 1 -C 20烷基，C 6 -C 20芳基或C 4 -C 20杂芳基; 条件是其中R 15，R 16，R 17，R 18，R 19和R 20是氢，Y是噻吩基，R 1是甲基，R 2是乙基，n是2，Q是直接键和Z 是正亚丙基和其中R 15，R 16，R 17，R 18，R 19和R 20是氢，Y是噻吩基，R 1是甲基，R 2是乙基，n是2的化合物，n是n 排除了价键连接基团是亚甲基和Z是亚甲基; 是反应性光引发剂，特别是在电子应用中。

    PHOTORESIST COMPOSITION
    7.
    发明公开
    PHOTORESIST COMPOSITION 有权
    光致抗蚀剂组合物

    公开(公告)号：EP2411430A1

    公开(公告)日：2012-02-01

    申请号：EP10709012.8

    申请日：2010-03-17

    Applicant: BASF SE

    Inventor： KURA, Hisatoshi ,  SAMESHIMA, Kaori ,  KUNIMOTO, Kazuhiko ,  NESVADBA, Peter ,  OHWA, Masaki

    IPC: C08F265/02 ,  C08K5/32 ,  C08K5/3435 ,  C07D295/24 ,  G03F7/039

    CPC classification number: G03F7/028 ,  C07D211/94 ,  C07D491/113 ,  C08F110/02 ,  C08F110/06 ,  C08F265/02 ,  C08K5/3435 ,  G03F7/0007 ,  G03F7/031 ,  G03F7/40 ,  C08L33/06

    Abstract: The present invention relates to a radically polymerizable composition comprising a hydroxylamine ester used to manufacture color filters. The invention further relates to novel hydroxylamine esters. The invention further relates to the use of hydroxylamine esters in all liquid crystal display components requiring post-baking. The present invention relates to a radically polymerizable composition comprising: (a) at least one alkaline developable resin; (b) at least one acrylate monomer; (c) at least a photoinitiator; (d) at least one hydroxylamine ester compound of formula (I) wherein R
    a represents an acyl radical; one of R
    b and R
    c represents hydrogen and the other one represents a substituent; or R
    b and R
    c both represent hydrogen or identical or different substituents; or R
    b and R
    c together represent oxygen; or R
    b and R
    c together form a ring; R
    1 - R
    4 each represent C
    1 -C
    6 alkyl; and R
    5 and R
    6 each represent independently of one another hydrogen, C
    1 -C
    6 alkyl or C
    6 -C
    10 aryl; or R
    5 and R
    6 together represent oxygen.

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