摘要:
A process of producing N -acyl amino acid based surfactants of Formula (I), wherein, R is selected from C6 to C22 alkyl group, R 1 is selected from H, C1 to C4 alkyl, R 2 is selected from all groups on a carbon of natural amino acids, R 3 is selected from COOX, CH 2 -SO 3 X, X is selected from Li + , Na + or K + ; said process comprising steps of A) preparing fatty acid chlorides by halogenating fatty acids with either phosgene or thionyl chloride in the presence of catalytic amount of same or other N -acyl amino acid surfactant of Formula (I) or anhydrides of same surfactant, Formula (II), wherein, R = C6 to C22 alkyl group, R 1 = H, C1 to C4 alkyl, R 2 = all groups on α carbon of natural amino acids, n = 0 to 4, X = C, SO and B) reacting fatty acid chloride of step (A) with an amino acid in the presence of a base under typical aqueous Schotten Baumann conditions such that said process does not employ a step of purification.
摘要:
The present invention relates to a polymerizable composition comprising at least one ethylenically unsaturated, polymerizable compound and at least one oxime sulfonate compound of the formula (I) QAaBbCc where a is 0, 1, 2, 3, 4 or 6, b is 0, 1, 2, 3, 4 or 6, and c is 0, 1, 2, 3, 4 or 6, where the sum of a+b+c is 1, 2, 3, 4 or 6 where (A) is a group (B) is a group (C) is a group where # denotes the point of attachment to Q; X is S or NR14 and Q, R1, R2, R3 and R14 are as defined in claim 1 and in the description. The present invention also relates to the use of the this composition, to novel oxime sulfonates and the use of the oxime sulfonates as thermal curing promoter.
摘要:
The present invention relates to a process for preparing a sulphonic acid anhydride, and more particularly to the preparation of triflic anhydride. The process for preparing a sulphonic acid anhydride according to the invention is characterized in that it comprises reacting a sulphonic acid or a mixture of two sulphonic acids with a reactant exhibiting pseudo acid halide tautomerism with at least one carbon atom which is involved in the tautomerism bearing two halogen atoms.
摘要:
Compounds of the formula (I), (Il) or (III), wherein R1 is for example C1-C18alkylsulfonyl, C1-C10haloalkylsulfonyl, camphorylsulfonyl, phenyl-C1-C3alkylsulfonyl, phenylsulfonyl, naphthylsulfonyl, anthrylsulfonyl, phenanthrylsulfonyl or heteroarylsulfonyl, R'1 is for example phenylenedisulfonyl, R2 is for example CN, C1-C10haloalkyl or C1-C10haloalkyl which is substituted by (IV); Ar1 is for example phenyl optinally substituted by a group of formula (IV); Ar'1 is for example phenylene which optionally is substituted by a group of formula (IV); A1, A2 and A3 independently of each other are for example hydrogen, halogen, CN, or C1-C18alkyl; D2 is for example a direct bond, O, (CO)O, (CO)S, SO2, OSO2 or C1-C18alkylene; or A3 and D2 together form C3-C30cycloalkenyl; or A2 and D2 together with the carbon of the ethylenically unsaturated double bond to which they are attached form C3-C30cycloalkyl; D3 and D4 for example independently of each other are a direct bond, O, S, C1-C18alkylene or C3-C30cycloalkylene provided that at least one of the radicals R2, Ar1 or Ar1' comprises a group of the formula (IV); are suitable as photolatent acid donors and for the preparation of corresponding polymers to be employed in chemically amplified photoresists.
摘要:
Gegenstand der vorliegenden Erfindung ist ein Verfahren zur Herstellung von gegebenenfalls substituierten Arylsulfonsäureanhydriden der allgemeinen Formel (I)
摘要:
Gegenstand der vorliegenden Erfindung ist ein Verfahren zur Herstellung von gegebenenfalls substituierten Arylsulfonsäureanhydriden der allgemeinen Formel (I)
摘要翻译:芳基磺酸酐化合物(I)的制备包括芳基磺酸化合物(II)与亚硫酰氯在至少一种脂族烃或任选的溶剂存在下的反应。 式(I)的芳基磺酸酐化合物的制备包括式(II)的芳基磺酸化合物与亚硫酰氯在至少一种脂族烃或任选的溶剂存在下的反应。 R 1> -R 5> H,1-12C-(氟)烷基,1-12C-(氟)烷氧基,4-18C-芳基,5-19C-芳基烷基,卤素或NO 2。
摘要:
The invention relates to the sulfonyl esters of the general formula R1-COO-SO2-Z-R2, wherein Z, R1 and R2 are defined as in claim 1. The invention further relates to the use of one of the inventive compounds for modifying the kinetics of the enzymatic effect of catalase. A method for measuring a concentration in living and/or active microorganisms in a liquid sample (3) by means of the development of oxygen from hydrogen peroxide is also based on the above-mentioned modification. An inventive compound is admixed in a container (1) to the sample, said compound inactivates the enzymatic effect of endogenous catalase without substantially inactivating the enzymatic effect of the intracellular catalase of microorganisms. Hydrogen peroxide is added and immediately afterwards the pressure present in the sample container is briefly equalized with the atmosphere, the container is closed in a gas-tight manner (2) during a predetermined reaction time and the pressure in the container is measured (9, 10, 11). The pressure measured and the data regarding the microorganisms and the sample dilution are used to calculate (22) the concentration of living and/or active microorganism in the sample and the concentration is optionally displayed (24). The invention further relates to a device for carrying out the inventive method.
摘要:
New oxime sulfonate compounds of the formula (I) and (II), wherein R1 is C1-C12alkyl, C1-C4haloalkyl, hydrogen, OR9, NR10R11, SR12 or is phenyl which is unsubstituted or substituted by OH, C1-C18alkyl, halogen and/or C1-C12alkoxy; R2, R3, R4 and R5 are for example hydrogen or C1-C12alkyl; R6 is for example is C1-C18alkylsulfonyl, phenyl-C1-C3alkylsulfonyl or phenylsulfonyl; R'6 is for example phenylenedisulfonyl or diphenylenedisulfonyl; R7, R8 and R9 for example are hydrogen or C1-C6alkyl; R10 and R11, are for example hydrogen or C1-C18alkyl; R12 is for example hydrogen, phenyl or C1-C18alkyl; A is S, O, NR13, or a group of formula A1, A2 or A3, R21 and R22 independently of one other have one of the meanings given for R7; R23, R24, R25 and R26 independently of one another are for example hydrogen, C1-C4alkyl, halogen or phenyl; Z is CR22 or N; and Z1 is CR22 or N; and Z1 is CR22 or N; and Z1 is CH2-, S, O or NR13 are particularly suitable as photo-latent acids in resist applications.