公开(公告)号：EP3106543A1

公开(公告)日：2016-12-21

申请号：EP15172513.2

申请日：2015-06-17

申请人： BASF SE ,  Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V.

发明人： Schwab, Matthias Georg ,  Rincon-Ovalles, Rosalba Adriana ,  Venkataraman, Shyam Sundar ,  Mueller, Andreas ,  Peng, Xu Yuan ,  Bayer, Domnik ,  Muellen, Klaus ,  Sachdev, Hermann

IPC分类号： C25B11/04 ,  C25B11/12 ,  C25B1/10 ,  B01J21/18 ,  B01J35/10

CPC分类号： C25B1/10 ,  B01J21/18 ,  B01J23/462 ,  B01J23/468 ,  B01J27/24 ,  B01J35/0033 ,  B01J35/1019 ,  C25B11/041 ,  C25B11/12 ,  Y02E60/366

摘要： The present invention relates to a polymer electrolyte membrane (PEM) water electrolyser, wherein a nitrogen-doped carbon is present in the anode-containing half-cell.

摘要翻译： 本发明涉及一种聚合物电解质膜（PEM）水电解槽，其中在含阳极的半电池中存在氮掺杂碳。

公开(公告)号：EP2878709A8

公开(公告)日：2015-09-02

申请号：EP13194792.1

申请日：2013-11-28

申请人： BASF SE ,  Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V.

发明人： Venkataraman, Shyam Sundar ,  Kurkina, Tetiana ,  Feng, Xinliang ,  Parvez, Khaled ,  Müllen, Klaus

IPC分类号： C25B1/00 ,  C01B31/04

CPC分类号： C25B1/00 ,  C01B32/19

摘要： The present invention relates to a process for preparing graphene by electrochemical exfoliation, which comprises:
- providing a first electrode E1 and a second electrode E2, wherein at least the first electrode E1 comprises a carbon starting material having a layered structure;
- bringing at least the first electrode E1 in contact with a liquid electrolyte,
wherein the liquid electrolyte comprises
- an ammonium cation, and
- an inorganic sulphur-containing anion,

- applying an electric potential between the first electrode E1 and the second electrode E2 so as to exfoliate graphene from the carbon starting material.

公开(公告)号：EP2428541A1

公开(公告)日：2012-03-14

申请号：EP11179985.4

申请日：2011-09-05

申请人： BASF SE

发明人： Li, Yuzhuo ,  Chu, Jea-Ju ,  Venkataraman, Shyam Sundar ,  Chiu, Wei Lan William ,  Pinder, Harvey Wayne

IPC分类号： C09K3/14 ,  C09G1/02

CPC分类号： C09K13/00 ,  C09G1/02 ,  C09K3/1463 ,  H01L21/31053

摘要： An aqueous polishing composition has been found, the said aqueous polishing composition comprising
(A) at least one type of abrasive particles which are positively charged when dispersed in an aqueous medium free from component (B) and having a pH in the range of from 3 to 9 as evidenced by the electrophoretic mobility;
(B) at least one water-soluble polymer selected from the group consisting of linear and branched alkylene oxide homopolymers and copolymers; and
(C) at least one anionic phosphate dispersing agent;

and a process for polishing substrate materials for electrical, mechanical and optical devices making use of the aqueous polishing composition.

摘要翻译： 在wässrige抛光组合物，已经发现，所述的wässrige在3的范围内的抛光组合物，包括（A）至少一种类型的具有正电荷的当wässrige介质不含组分（B）分散在磨粒且pH 9如由电泳迁移率; （B）选自直链和支化的亚烷基氧化物共聚物和均聚物的至少一种水溶性聚合物; 和（C）至少一种分散剂阴离子磷酸盐; 和用于抛光基片的材料用于利用wässrige抛光组合物的电气，机械和光学器件的方法。

公开(公告)号：EP3385363A1

公开(公告)日：2018-10-10

申请号：EP18169062.9

申请日：2013-01-24

申请人： BASF SE ,  BASF Schweiz AG

发明人： Li, Yuzhuo ,  Venkataraman, Shyam Sundar ,  Zhong, Mingije

IPC分类号： C11D7/22 ,  H01L21/02 ,  C11D1/722 ,  C11D7/34 ,  C11D11/00 ,  C11D3/34 ,  C11D3/37 ,  C11D3/20

CPC分类号： C11D3/3427 ,  C11D1/722 ,  C11D3/2065 ,  C11D3/2082 ,  C11D3/2086 ,  C11D3/349 ,  C11D3/3757 ,  C11D7/261 ,  C11D7/268 ,  C11D7/34 ,  C11D11/0047 ,  C11D11/0064 ,  H01L21/02074

摘要： A post chemical-mechanical-polishing (post-CMP) cleaning composition comprising:
(A) is cysteine, glutathione, N-acetylcysteine, thiourea,
(L) at least one oligomeric or polymeric polycarboxylic acid, and (C) water,
wherein the post-CMP cleaning composition has a pH-value in the range of from 4 to not more than 7.
The use of the composition for removing residues and contaminants from the surface of semiconductor substrates useful for manufacturing microelectronic devices.
A process for manufacturing microelectronic devices from semiconductor substrates comprising the step of removing residues and contaminants from the surface of the semiconductor substrates by contacting them at least once with the post-CMP cleaning composition.

公开(公告)号：EP2428541B1

公开(公告)日：2019-03-06

申请号：EP11179985.4

申请日：2011-09-05

申请人： BASF SE

发明人： Li, Yuzhuo ,  Chu, Jea-Ju ,  Venkataraman, Shyam Sundar ,  Chiu, Wei Lan William ,  Pinder, Harvey Wayne

IPC分类号： C09K3/14 ,  C09G1/02 ,  H01L21/3105 ,  C09K13/00