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    Projection optical system, exposure apparatus, and exposure method
    1.
    发明公开
    Projection optical system, exposure apparatus, and exposure method 审中-公开
    Optisches Projektionssystem，Belichtungsvorrichtung und Belichtungsverfahren

    公开(公告)号：EP2672307A2

    公开(公告)日：2013-12-11

    申请号：EP13175504.3

    申请日：2004-05-06

    申请人： Nikon Corporation

    发明人： Omura, Yasuhiro

    IPC分类号： G02B17/08 ,  H01L21/027

    CPC分类号： G03B27/522 ,  G02B17/08 ,  G02B17/0812 ,  G02B17/0828 ,  G02B17/0844 ,  G02B17/0892 ,  G03F7/70225 ,  G03F7/70341

    摘要： A catadioptric projection optical system for forming a reduced image of a first surface (R) on a second surface (W) is a relatively compact projection optical system having excellent imaging performance as well corrected for various aberrations, such as chromatic aberration and curvature of field, and being capable of securing a large effective image-side numerical aperture while suitably suppressing reflection loss on optical surfaces. The projection optical system comprises at least two reflecting mirrors (CM1, CM2), and a boundary lens (Lb) whose surface on the first surface side has a positive refracting power, and an optical path between the boundary lens and the second surface is filled with a medium (Lm) having a refractive index larger than 1.1. Every transmitting member and every reflecting member with a refracting power forming the projection optical system are arranged along a single optical axis (AX) and the projection optical system has an effective imaging area of a predetermined shape not including the optical axis.

    摘要翻译： 用于在第二表面（W）上形成第一表面（R）的缩小图像的反射折射投射光学系统是具有优异成像性能的相对紧凑的投影光学系统，并且还针对各种像差（诸如色差和曲率）进行校正 并且能够确保大的有效的图像侧数值孔径，同时适当地抑制光学表面上的反射损失。 投影光学系统包括至少两个反射镜（CM1，CM2）和第一表面侧的表面具有正折射力的边界透镜（Lb），并且填充了边界透镜和第二表面之间的光路 具有折射率大于1.1的介质（Lm）。 每个发射构件和具有形成投影光学系统的折射能力的每个反射构件沿着单个光轴（AX）布置，并且投影光学系统具有不包括光轴的预定形状的有效成像区域。

    PROJECTION OPTICAL SYSTEM, AND EXPOSURE APPARATUS AND EXPOSURE METHOD
    2.
    发明公开
    PROJECTION OPTICAL SYSTEM, AND EXPOSURE APPARATUS AND EXPOSURE METHOD 审中-公开
    光学投影系统和曝光装置以及曝光方法

    公开(公告)号：EP1630585A4

    公开(公告)日：2010-07-14

    申请号：EP04731484

    申请日：2004-05-06

    申请人： NIPPON KOGAKU KK

    发明人： OMURA YASUHIRO

    IPC分类号： G02B17/08 ,  G03F7/20 ,  H01L21/027

    CPC分类号： G03B27/522 ,  G02B17/08 ,  G02B17/0812 ,  G02B17/0828 ,  G02B17/0844 ,  G02B17/0892 ,  G03F7/70225 ,  G03F7/70341

    摘要： A catadioptric projection optical system for forming a reduced image of a first surface (R) on a second surface (W) is a relatively compact projection optical system having excellent imaging performance as well corrected for various aberrations, such as chromatic aberration and curvature of field, and being capable of securing a large effective image-side numerical aperture while suitably suppressing reflection loss on optical surfaces. The projection optical system comprises at least two reflecting mirrors (CM1, CM2), and a boundary lens (Lb) whose surface on the first surface side has a positive refracting power, and an optical path between the boundary lens and the second surface is filled with a medium (Lm) having a refractive index larger than 1.1. Every transmitting member and every reflecting member with a refracting power forming the projection optical system are arranged along a single optical axis (AX) and the projection optical system has an effective imaging area of a predetermined shape not including the optical axis.

    Catadioptric projection objective
    3.
    发明公开
    Catadioptric projection objective 有权
    反折射投影物镜

    公开(公告)号：EP2189848A3

    公开(公告)日：2010-06-09

    申请号：EP09015829.6

    申请日：2005-07-08

    申请人： Carl Zeiss SMT AG

    发明人： Shafer, David ,  Ulrich, Wilhelm ,  Dodoc, Aurelian ,  Von Bünau, Rudolf ,  Mann, Hans-Jürgen ,  Epple, Alexander ,  Beder, Susanne ,  Singer, Wolfgang

    IPC分类号： G03F7/20 ,  G02B13/14

    CPC分类号： G02B17/0892 ,  G02B17/0828 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/70341

    摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter D max , a maximum image field height Y', and an image side numerical aperture NA; wherein COMP1 = D max / (Y' · NA 2 ) and wherein the condition COMP1

    摘要翻译： 用于将提供在投影物镜的物平面中的图案成像到投影物镜的成像平面上的折反射投影物镜具有：第一折射物镜部分，用于将提供在物平面中的图案成像为第一中间图像; 第二物镜部分，其包括用于将第一中间成像成像为第二中间图像的至少一个凹面镜; 以及第三折射物镜部分，用于将第二中间成像成像到像平面上; 其中投影物镜具有最大透镜直径Dmax，最大像场高度Y'和像侧数值孔径NA; 其中COMP1 = Dmax /（Y'·NA2）并且其中条件COMP1 <10成立。

    Catadioptric projection objective
    6.
    发明公开
    Catadioptric projection objective 有权
    加泰罗尼亚

    公开(公告)号：EP2189848A2

    公开(公告)日：2010-05-26

    申请号：EP09015829.6

    申请日：2005-07-08

    申请人： Carl Zeiss SMT AG

    发明人： Shafer, David ,  Ulrich, Wilhelm ,  Dodoc, Aurelian ,  Von Bünau, Rudolf ,  Mann, Hans-Jürgen ,  Epple, Alexander ,  Beder, Susanne ,  Singer, Wolfgang

    IPC分类号： G03F7/20 ,  G02B13/14

    CPC分类号： G02B17/0892 ,  G02B17/0828 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/70341

    摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter D max , a maximum image field height Y', and an image side numerical aperture NA; wherein COMP1 = D max / (Y' · NA 2 ) and wherein the condition COMP1

    摘要翻译： 用于将设置在投影物镜的物平面中的图案成像到投影物镜的像平面上的折反射投射物镜具有用于将设置在物平面中的图案成像为第一中间图像的第一折射目标部分; 第二目标部分，包括用于将第一中间成像成像成第二中间图像的至少一个凹面镜; 以及第三折射目标部分，用于将所述第二中间成像成像到所述图像平面上; 其中所述投影物镜具有最大透镜直径D max，最大像场高度Y'和像侧数值孔径NA; 其中COMP1 = Dmax /（Y'·NA2），其中条件COMP1 <10成立。

    Rear-projection system with obliquely incident light beam
    9.
    发明公开
    Rear-projection system with obliquely incident light beam 有权
    倾斜入射光束的背投系统

    公开(公告)号：EP1855137A3

    公开(公告)日：2007-11-21

    申请号：EP07075682.0

    申请日：2000-07-12

    申请人： NEC Display Solutions, Ltd.

    发明人： Matsuo, Eiki

    IPC分类号： G02B13/16 ,  G02B17/08

    CPC分类号： G02B17/0852 ,  G02B13/16 ,  G02B13/18 ,  G02B17/08 ,  G02B17/0812 ,  G02B17/0828 ,  G02B17/0844 ,  G02B17/0848 ,  G03B21/10 ,  G03B21/28

    摘要： Oblique projector, capable of rear-projection, wherein a luminous flux, from one conjugate surface (A), having a divergence angle of at least 10° sequentially passes through a first optical system (30) having a convergent action in the vicinity of its reference axis and a second optical system (31) having a divergent action in the vicinity of its reference axis, and images on another conjugate surface (B). A specific condition is given to the converging distance of each converging point at a luminous flux section, including a principal ray according to the passing position of the luminous flux through the first optical system (30) to thereby implement an oblique-incident optical system having a half angle of at least 60° and a comparatively simple structure irrespective of the type of optical element used.

    摘要翻译： 能够背投的倾斜投影仪，其中来自一个共轭表面（A）的具有至少10°发散角的光通量依次通过在其附近具有会聚作用的第一光学系统（30） 以及在其参考轴附近具有发散作用的第二光学系统（31）和在另一个共轭表面（B）上的图像。 根据通过第一光学系统（30）的光通量的通过位置，在包括主光线在内的光通量部分处的每个会聚点的会聚距离给予特定的条件，从而实现一种倾斜入射光学系统， 与所用光学元件的类型无关，至少60°的半角和相对简单的结构。