公开(公告)号：EP1700163A1

公开(公告)日：2006-09-13

申请号：EP04803844.2

申请日：2004-12-14

申请人： Carl Zeiss SMT AG ,  Singer, Dr., Wolfgang

发明人： SHAFER, David ,  BEDER, Susanne ,  SCHUSTER, Karl-Heinz ,  SINGER, Wolfgang, Dr.

IPC分类号： G03F7/20

CPC分类号： G02B3/12 ,  G02B17/0812 ,  G02B17/0856 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70341 ,  G03F7/70958 ,  G03F7/70966

摘要： The invention relates to an objective designed as a microlithography projection objective for an operating wavelength. The objective has a greatest adjustable image-side numerical aperture NA, at least one first lens made from a solid transparent body, in particular glass or crystal, with a refractive index nL and at least one liquid lens (F) made from a transparent liquid, with a refractive index NF. At the operating wavelength the first lens has the greatest refractive index nL of all solid lenses of the objective, the refractive index nF of the at least one liquid lens (F) is bigger than the refractive index nL of the first lens and the value of the numerical aperture NA is bigger than 1.

公开(公告)号：EP1709472B1

公开(公告)日：2008-08-06

申请号：EP05700877.3

申请日：2005-01-13

申请人： Carl Zeiss SMT AG

发明人： SHAFER, David ,  ULRICH, Wilhelm ,  DODOC, Aurelian ,  VON BÜNAU, Rudolf ,  MANN, Hans-Jürgen ,  EPPLE, Alexander

IPC分类号： G02B17/00 ,  G03F7/20

CPC分类号： G03F7/70958 ,  G02B13/22 ,  G02B17/0812 ,  G02B17/0892 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/70341 ,  G03F7/70966

摘要： A catadioptric projection objective (200) for imaging a pattern provided in an object plane (201) of the projection objective onto an image plane (202) of the projection objective comprises: a first objective part (210) for imaging the pattern provided in the object plane into a first intermediate image; a second objective part (220) for imaging the first intermediate imaging into a second intermediate image; a third objective part (230) for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror (221) having a first continuous mirror surface and at least one second concave mirror (222) having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface. The system has potential for very high numerical apertures at moderate lens material mass consumption.

公开(公告)号：EP1771771A1

公开(公告)日：2007-04-11

申请号：EP05785351.7

申请日：2005-07-08

申请人： Carl Zeiss SMT AG

发明人： SHAFER, David ,  ULRICH, Wilhelm ,  DODOC, Aurelian ,  VON BÜNAU, Rudolf ,  MANN, Hans-Jürgen ,  EPPLE, Alexander ,  BEDER, Susanne ,  SINGER, Wolfgang

IPC分类号： G03F7/00 ,  G02B17/00 ,  G02B17/08

CPC分类号： G02B17/0892 ,  G02B17/0828 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/70341

摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax , a maximum image field height Y', and an image side numerical aperture NA; wherein COMP1 = Dmax / (Y' • NA2) and wherein the condition COMP1

公开(公告)号：EP1709472A2

公开(公告)日：2006-10-11

申请号：EP05700877.3

申请日：2005-01-13

申请人： Carl Zeiss SMT AG

发明人： SHAFER, David ,  ULRICH, Wilhelm ,  DODOC, Aurelian ,  VON BÜNAU, Rudolf ,  MANN, Hans-Jürgen ,  EPPLE, Alexander

IPC分类号： G02B17/00

CPC分类号： G03F7/70958 ,  G02B13/22 ,  G02B17/0812 ,  G02B17/0892 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/70341 ,  G03F7/70966

摘要： A catadioptric projection objective (200) for imaging a pattern provided in an object plane (201) of the projection objective onto an image plane (202) of the projection objective comprises: a first objective part (210) for imaging the pattern provided in the object plane into a first intermediate image; a second objective part (220) for imaging the first intermediate imaging into a second intermediate image; a third objective part (230) for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror (221) having a first continuous mirror surface and at least one second concave mirror (222) having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface. The system has potential for very high numerical apertures at moderate lens material mass consumption.

摘要翻译： 用于将提供在投影物镜的物平面（201）中的图案成像到投影物镜的图像平面（202）上的反折射投影物镜（200）包括：第一物镜部分（210），用于对在第 物体平面转换成第一中间图像; 第二物镜部分（220），用于将第一中间成像成像为第二中间图像; 第三物镜部分（230），用于将第二中间成像直接成像到图像平面上; 其中具有第一连续镜面的第一凹面镜（221）和具有第二连续镜面的至少一个第二凹面镜（222）布置在所述第二中间图像的上游; 在物平面与第一中间图像之间，第一中间图像与第二中间图像之间以及第二中间图像与图像平面之间形成瞳孔表面; 并且所有凹面镜都光学远离光瞳表面布置。 该系统在中等镜片材料的大量消耗下具有非常高的数值孔径的潜力。

公开(公告)号：EP1771771B1

公开(公告)日：2009-12-30

申请号：EP05785351.7

申请日：2005-07-08

申请人： Carl Zeiss SMT AG

发明人： SHAFER, David ,  ULRICH, Wilhelm ,  DODOC, Aurelian ,  VON BÜNAU, Rudolf ,  MANN, Hans-Jürgen ,  EPPLE, Alexander ,  BEDER, Susanne ,  SINGER, Wolfgang

IPC分类号： G03F7/00 ,  G02B17/00 ,  G02B17/08

CPC分类号： G02B17/0892 ,  G02B17/0828 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/70341

公开(公告)号：EP2021854A2

公开(公告)日：2009-02-11

申请号：EP07783270.7

申请日：2007-05-04

申请人： Carl Zeiss SMT AG

发明人： SHAFER, David ,  DODOC, Aurelian ,  FELDMANN,, Heiko ,  ZELLNER, Johannes ,  ULRICH, Wilhelm ,  WALTER, Holger ,  LOERING, Ulrich ,  KRAEHMER, Daniel ,  FUERTER, Gerhard

IPC分类号： G02B13/14 ,  G02B13/26 ,  G03F7/20

CPC分类号： G02B13/143 ,  G02B13/26 ,  G03F7/70241

摘要： The invention features a system for microlithography that includes a mercury light source configured to emit radiation at multiple mercury emission lines, a projection objective positioned to receive radiation emitted by the mercury light source, and a stage configured to position a wafer relative to the projection objective. During operation, the projection objective directs radiation from the light source to the wafer, where the radiation at the wafer includes energy from more than one of the emission lines. Optical lens systems for use in said projection objective comprise four lens groups, each having two lenses comprising silica, the first and second lens groups on one hand and the third and fourth lens groups on the other hand are positioned symmetrically with respect to a plane perpendicular to the optical axis of said lens system.

公开(公告)号：EP1828829A1

公开(公告)日：2007-09-05

申请号：EP05819425.9

申请日：2005-12-22

申请人： Carl Zeiss SMT AG

发明人： MANN, Hans-Jürgen ,  SHAFER, David ,  ULRICH, Wilhelm

IPC分类号： G02B17/06

CPC分类号： G03F7/70233 ,  G02B13/143 ,  G02B17/0657 ,  G03F7/70225

摘要： The invention relates to a lens, particularly a microlithography projection lens, particularly for wavelengths of = 193 nm, comprising a first partial lens (100), comprising at least one mirror, wherein said mirror (S1) has no opening through which a homocentric beam can pass, and a second partial lens (200) comprising at least one primary concave mirror (SK1) and a secondary concave mirror (SK2), wherein the primary concave mirror (SK1) and the secondary concave mirror (SK2) have an opening enabling a homocentric beam to pass therethrough.