公开(公告)号：EP3222995A4

公开(公告)日：2018-06-06

申请号：EP15860939

申请日：2015-11-20

申请人： FUJIKIN KK ,  UNIV TOHOKU

发明人： NAGASE MASAAKI ,  NISHINO KOUJI ,  IKEDA NOBUKAZU ,  YAMAJI MICHIO ,  SUGAWA SHIGETOSHI ,  KURODA RIHITO

IPC分类号： G01N21/31 ,  C23C16/18 ,  C23C16/52 ,  G01N33/00 ,  H01L21/205

CPC分类号： G01N21/27 ,  C23C16/18 ,  C23C16/52 ,  G01N21/314 ,  G01N21/3151 ,  G01N21/33 ,  G01N33/0027 ,  G01N2021/3155 ,  G01N2021/3159 ,  G01N2021/3181 ,  G01N2201/0627 ,  G01N2201/0696 ,  G01N2201/12 ,  H01L21/205

摘要： To provide a concentration measurement method with which the concentrations of predetermined chemical components can be measured non-destructively, accurately, and rapidly by a simple means, up to the concentrations in trace amount ranges, as well as a concentration measurement method with which the concentrations of chemical components in a measurement target can be accurately and rapidly measured in real time up to the concentrations in nano-order trace amount ranges, and which is endowed with a versatility that can be realized in a variety of embodiments and modes. [Solution] In the present invention, a measurement target is irradiated, in a time sharing manner, with light of a first wavelength and light of a second wavelength that have different optical absorption rates with respect to the measurement target. The light of each wavelength, arriving optically via the measurement target as a result of irradiation with the light of each wavelength, is received at a shared light-receiving sensor. A differential signal is formed, the differential signal being of a signal pertaining to the light of the first wavelength and a signal pertaining to the light of the second wavelength, the signals outputted from the light-receiving sensor upon receipt of the light. The concentration of a chemical component in the measurement target is derived on the basis of the differential signal.

公开(公告)号：EP0969342A4

公开(公告)日：2004-05-19

申请号：EP99900168

申请日：1999-01-11

申请人： FUJIKIN KK ,  TOKYO ELECTRON LTD ,  OHMI TADAHIRO

发明人： OHMI TADAHIRO ,  KAGAZUME TETU ,  SUGIYAMA KAZUHIKO ,  DOHI RYOUSUKE ,  MINAMI YUKIO ,  NISHINO KOUJI ,  KAWATA KOUJI ,  IKEDA NOBUKAZU ,  YAMAJI MICHIO

IPC分类号： F16K31/06 ,  C01B5/00 ,  G05D7/06 ,  G05D11/13 ,  G05D21/00

CPC分类号： G05D7/0635 ,  Y10T137/7759 ,  Y10T137/7761

摘要： A fluid supply apparatus comprising a pressure flow controller for controlling the rate of flow of fluid, a fluid selector valve for opening/closing the fluid passage on the secondary side, and a fluid supply controller for controlling the operation of them, wherein the pressure flow controller is provided with an orifice (5), a control valve (1) provided on the upstream side of the orifice (5), a pressure sensor (3) provided between the control valve (1) and the orifice (5), and an operation controller (6) for outputting to a driver (2) of the control valve (1) a control signal (Qy) representing the difference between a rate-of-flow signal (Qc=KP1) generated by calculation based on the pressure (P1) measured by the pressure sensor (3) and a rate-of-flow command signal (Qs), and the pressure (P1) on the upstream side of the orifice (5) is adjusted by opening/closing the control valve (1) so as to regulate the rate of flow on the downstream side of the orifice (5).

摘要翻译： 1。一种流体供给装置，其特征在于，具有：控制流体的流量的压力流量控制器;开闭二次侧的流体通路的流体切换阀;以及控制它们的动作的流体供给控制器， （5），设置在节流孔（5）的上游侧的控制阀（1），设置在控制阀（1）和节流孔（5）之间的压力传感器（3），以及 （6），用于向控制阀（1）的驱动器（2）输出表示通过基于压力的计算产生的流量信号（Qc = KP1）之间的差值的控制信号（Qy） （3）测量的压力（P1）和流量指令信号（Qs），并且通过打开/关闭控制阀（5）来调节节流孔（5）上游侧的压力（P1） 1）以调节孔口（5）下游侧的流量。

公开(公告)号：EP1126260A4

公开(公告)日：2003-07-09

申请号：EP00949991

申请日：2000-08-03

申请人： FUJIKIN KK ,  TOKYO ELECTRON LTD ,  OHMI TADAHIRO

发明人： OHMI TADAHIRO ,  HIROSE TAKASHI ,  IDETA EIJI ,  IKEDA NOBUKAZU ,  DOHI RYOUSUKE ,  NISHINO KOUJI ,  YOSHIKAWA KAZUHIRO ,  KAGATSUME SATOSHI ,  HIROSE JUN ,  FUKASAWA KAZUO ,  KOIZUMI HIROSHI ,  NAGAOKA HIDEKI

IPC分类号： G01L9/04 ,  G01L9/00 ,  G01L19/00 ,  G01L19/04 ,  G01L19/06 ,  G01L19/14 ,  G01L7/08

CPC分类号： G01L19/0023 ,  G01L19/0645 ,  G01L19/145 ,  G01L19/147

摘要： A pressure detector mounting structure capable of preventing a diaphragm from being deformed by a stress acting on a diaphragm type pressure detector and output characteristics and temperature characteristics from being varied when the pressure detector is incorporated in a fixture provided in a piping or equipment, wherein the pressure detector formed by fixedly combining a diaphragm base having a diaphragm with a sensor base incorporating a sensor element operating according to the displacement of the diaphragm is inserted into an inserting hole through a gasket and pressed air-tight fixedly from the upper side using a pressing member, the pressing member and the gasket are brought into contact with the upper and lower surfaces of a main body of the diaphragm base, respectively, and a shallow groove is formed in ring-shape in the lower surface of the main body on the inner side of a part in contact with the gasket so as to off set a deformation produced by a pressing force from the pressing member through the shallow groove.

公开(公告)号：EP0751301A3

公开(公告)日：1998-07-15

申请号：EP96110514

申请日：1996-06-28

申请人： OHMI TADAHIRO ,  FUJIKIN KK

发明人： OHMI TADAHIRO ,  HIRAO KEIJI ,  YAMAJI MICHIO ,  ITOI SHIGERU ,  SHINOHARA TSUTOMU ,  IKEDA NOBUKAZU ,  KOJIMA TETSUYA

IPC分类号： G05D7/06 ,  F15B13/00 ,  F15B13/08 ,  G05D16/20

CPC分类号： F15B13/0832 ,  F15B13/0817 ,  F15B13/0871 ,  Y10T137/5109 ,  Y10T137/5283 ,  Y10T137/87885

摘要： A fluid control apparatus (1) comprises a mass flow controller (2), two on-off valves (3,4) disposed at the inlet side of the controller and three on-off valves (5,6,7) disposed at the outlet side of the controller. At the inlet side, a main fluid on-off valve (4) is positioned on a purge fluid on-off valve (3), and at the outlet side, a vent on-off valve (6) is positioned on a vacuum suction on-off valve (5), with a main passage on-off valve (7) further positioned on the vent on-off valve (6).

公开(公告)号：EP1707858A4

公开(公告)日：2008-10-08

申请号：EP05703504

申请日：2005-01-13

申请人： FUJIKIN KK ,  OHMI TADAHIRO

发明人： OHMI TADAHIRO ,  MINAMI YUKIO ,  TUBOTA KENJI ,  SHINOHARA TSUTOMU ,  YAMAJI MICHIO ,  IKEDA NOBUKAZU ,  MORIMOTO AKIHIRO ,  KAWADA KOJI ,  NARIAI TOSHIRO

IPC分类号： F16K51/00 ,  F16L59/06 ,  F16K27/00 ,  F16K51/02

CPC分类号： F16K51/02 ,  Y10T137/6606 ,  Y10T137/7043 ,  Y10T137/7062

摘要： A vacuum heat insulation valve that can be used in high-temperature conditions in a gas supply system and gas discharge system and that can be drastically reduced in size and made compact because of excellent heat insulating performance of the valve. A vacuum heat insulation valve constructed from a valve that has a valve body and an actuator and from a vacuum insulation box that receives the valve. The vacuum heat insulation box (S) is constructed from a rectangular lower vacuum jacket (S5) that has on its side face a tubular vacuum insulation piping receiving section (J) and whose upper face is opened, and from a rectangular upper vacuum jacket (S4) that is air-tightly fitted to the lower vacuum jacket (S5) from the above and whose lower face is opened.

摘要翻译： 一种真空绝热阀，可用于供气系统和排气系统的高温条件下，由于阀门具有优异的绝热性能，可大幅度减小尺寸并制成紧凑的结构。 由阀门构成的真空隔热阀，该阀门具有阀体和致动器，以及来自容纳阀门的真空绝热箱。 真空隔热箱（S）由矩形的下部真空夹套（S5）构成，其侧面具有管状真空隔热管接收部分（J）并且其上表面开口，并且从矩形上部真空夹套 S4）从上方气密地装配到下部真空夹套（S5）并且其下表面打开。

公开(公告)号：EP1672457A4

公开(公告)日：2008-02-13

申请号：EP04817112

申请日：2004-09-14

申请人： FUJIKIN KK ,  OHMI TADAHIRO

发明人： OHMI TADAHIRO ,  TERAMOTO AKINOBU ,  UNO TOMIO ,  DOHI RYOUSUKE ,  NISHINO KOUJI ,  NAKAMURA OSAMU ,  MATSUMOTO ATSUSHI ,  NAGASE MASAAKI ,  IKEDA NOBUKAZU

IPC分类号： G05D7/06 ,  G05D16/20

CPC分类号： G05D16/208 ,  Y10T137/7761 ,  Y10T137/8741 ,  Y10T137/87507

摘要： Flow rate control accuracy is prevented from being reduced in a low flow rate region to enable highly accurate flow rate control over the entire flow rate control region. By this, a chamber inner pressure is highly accurately controlled over a wide range by regulating the flow rate of a gas fed to a chamber. A gas feeding device for feeding a gas to a chamber, where the device is constituted of parallelly connected pressure-type flow rate control devices and a control device for controlling the flow rate control devices and feeds a desired gas, while controlling the flow rate, to a chamber deaerated by a vacuum pump. The gas feeding device is constructed such that one of the pressure-type flow control devices controls a gas flow rate range of up to 10% maximum of the maximum flow rate fed to the chamber and the remaining flow control devices control the remaining range. Further, a pressure detector is installed on a chamber and a detected value from the detector is inputted in the control device. Control signals to the pressure-type flow rate control devices are regulated to control the amount of the gas fed to the chamber, controlling a chamber inner pressure.

公开(公告)号：EP1719981A4

公开(公告)日：2007-11-07

申请号：EP05703505

申请日：2005-01-13

申请人： FUJIKIN KK

发明人： HIRATA KAORU ,  IKEDA NOBUKAZU ,  NISHINO KOUJI ,  DOHI RYOUSUKE

IPC分类号： G01F1/00 ,  G01F1/68 ,  G01F1/684 ,  G01F1/692 ,  G01F1/696 ,  G01F15/04 ,  G01L9/00 ,  G01L19/00 ,  G05D7/06

CPC分类号： G01L19/0023 ,  G01F1/6842 ,  G01F1/6845 ,  Y10T137/7761

摘要： A fluid sensor of an anticorrosive metal comprises a thermal mass flow sensor having an enhanced anticorrosiveness. The measurement accuracy is stable against pressure variation, the response is improved, the senor is free of particles, variation of product quality is prevented, and pressure measurement is possible. A fluid supply device using this fluid sensor is also disclosed. Specifically, the fluid sensor comprises an anticorrosive metal substrate (2), a mass flow sensor section (1) composed of a thin film forming a temperature sensor (3a) and a heater (3b) provided on the back side opposite to the front side of a fluid-contact body of the anticorrosive metal substrate (2), and a pressure sensor section (4) composed of a thin film forming a strain sensor element (4a) provided on the back side opposite to the front side of the fluid-contact body of the anticorrosive metal substrate (2). This fluid sensor is for measuring the mass flow and pressure of a fluid.

公开(公告)号：EP1643218A4

公开(公告)日：2007-05-09

申请号：EP04746098

申请日：2004-06-18

申请人： FUJIKIN KK ,  OHMI TADAHIRO

发明人： OHMI TADAHIRO ,  SUGIYAMA KAZUHIKO ,  UNO TOMIO ,  IKEDA NOBUKAZU ,  NISHINO KOUJI ,  NAKAMURA OSAMU ,  DOHI RYOUSUKE ,  MATSUMOTO ATSUSHI

IPC分类号： G01F1/42 ,  G01F1/00 ,  G01F1/50 ,  G01F1/88 ,  G01F7/00 ,  G05D7/06

CPC分类号： G01F1/50 ,  G01F1/42 ,  G05D7/0635

摘要： A differential pressure type flow meter in which production cost is lowered by simplifying the structure and high-accuracy measurement of flow rate can be carried out in real time under inline state with an error E not higher than (1%SP) over a wide flow rate range of 100%-1%. The differential pressure type flow meter comprises an orifice, a detector of pressure P1 on the upstream side of the orifice, a detector of pressure P2 on the downstream side of the orifice, a detector of fluid temperature T on the upstream side of the orifice, and a control operation circuit for operating the flow rate Q of fluid passing through the orifice using detected pressures P1 and P2 and detected temperature T from respective detectors, wherein the flow rate Q of fluid is operated according to the following expression; Q=C1.P1/√T.((P2/P1) -(P2/P1) ) (where, C1 is a proportional constant, m and n are constants).

公开(公告)号：EP1596107A4

公开(公告)日：2006-05-17

申请号：EP04709325

申请日：2004-02-09

申请人： FUJIKIN KK ,  OHMI TADAHIRO

发明人： OHMI TADAHIRO ,  IKEDA NOBUKAZU ,  YAMAJI MICHIO ,  KITANO MASAFUMI ,  MORIMOTO AKIHIRO

IPC分类号： F04B45/04 ,  F16K7/16 ,  F16K51/02 ,  F16K7/12 ,  F16K27/00

CPC分类号： F16K7/16 ,  F16K51/02

摘要： A diaphragm valve for a vacuum evacuation system applicable to a semiconductor manufacturing system. Corrosion of members due to deposition/adhesion of products produced by thermolysis of gas, clogging due to products, and seat leakage are prevented. This diaphragm valve leads to reduction in the scale of the vacuum evacuation system facility, reduction in cost, and reduction in diameter of piping of the vacuum evacuation system for the purpose of decrease in vacuum evacuation time. Specifically, the diaphragm valve (1) comprises a body (2) having an inlet passage (6), an outlet passage (7), and a valve seat (8) provided between the passages, a diaphragm (3) which is provided to the body (2) and can be separated from the valve seat (8) and brought into contact with the same, and drive means (4) provided to the body (2) and adapted to separate the diaphragm (3) from the valve seat (8) and to bring the diaphragm (3) into contact with the same. The portion (25) of the body (2) and the portion (25) of the diaphragm (3) both coming into contact with a fluid are coated with a synthetic resin coating (5) of predetermined thickness.

公开(公告)号：EP1130309A4

公开(公告)日：2005-07-06

申请号：EP00957104

申请日：2000-09-11

申请人： FUJIKIN KK

发明人： IKEDA NOBUKAZU ,  MORIMOTO AKIHIRO ,  MINAMI YUKIO ,  HONIDEN TERUO ,  KAWADA KOUJI ,  KOMEHANA KATUNORI ,  HIRAI TOURU ,  YAMAJI MICHIO

IPC分类号： B01D53/26 ,  F17D1/04 ,  F17D3/14

CPC分类号： B01D53/26 ,  F17D3/14

摘要： A dewatering method for gas supply systems which is adapted for effective removal of adsorbed water by ordinary-temperature exhaust processing without using the baking method. The dewatering method for gas supply systems which remove water remaining inside a gas supply system by passing a dewatering gas through the gas supply system, characterized in that the dewatering gas flow pressure is set at values which are above a minimum pressure at which the gas flow becomes a viscous flow but which are below the saturated vapor pressure of water at the dewatering gas flow temperature. The condition under which the dewatering gas becomes a viscous flow is determined by the mean free path of gas molecules becoming smaller than the diameter of the piping for the gas supply system. If the dewatering gas is exhausted at ordinary temperature under such condition, the adsorbed water on the inner surface of the piping or in the valve filter can be effectively removed.