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25 条记录 (耗时 0.015 秒)

    Method and apparatus for forming an anti-reflection film for a cathode-ray tube
    2.
    发明公开
    Method and apparatus for forming an anti-reflection film for a cathode-ray tube 失效
    形成阴极射线管的抗反射膜的方法和装置

    公开(公告)号：EP0533030A3

    公开(公告)日：1993-05-26

    申请号：EP92115338.3

    申请日：1992-09-08

    申请人： HITACHI, LTD.

    发明人： Oishi, Tomoji ,  Maekawa, Sachiko ,  Kato, Akira ,  Nishizawa, Masahiro ,  Tomita, Yoshifumi ,  Okude, Kojiro ,  Tochigi, Kenji ,  Misawa, Yutaka

    IPC分类号： H01J29/89 ,  G02B1/10

    CPC分类号： G02B1/11 ,  H01J29/896 ,  H01J2209/012

    摘要： An anti-reflection film (2) is produced on the panel surface of a cathode-ray tube (1) by:
    (A) preparing a solution (8) for forming an anti-reflection film (2), which contains water and an alkoxide having the formula,
            M(OR) n
    wherein M is Si or a metal selected from the group consisting of Ti, Al, Zr, Sn, In, Sb and Zn; R is an alkyl group having 1-10 carbon atoms; n is an integer of from 1 to 8; and when n is not 1, the alkyl groups represented by R may be the same or different, (B) coating the solution (8) for forming an anti-reflection film (2) on the outermost surface of the panel of a cathode-ray tube (1), and (C) applying an ultraviolet light (7) to the solution (8) for forming an anti-reflection film (2) coated on said surface to cure the solution to form a transparent film with fine roughness. This production method is carried out using an apparatus having:
    (a) a coating means (3) for coating the above solution (8) for forming an anti-reflection film (2) on the outermost surface of the panel of a cathode-ray tube (1), (b) a transferring means (4) for transferring the solution-coated cathode-ray tube (1), and (c) an ultraviolet light-applying means (7) for photocuring the solution (8) coated on the cathode-ray tube (1) during the transfer of the solution-coated cathode-ray tube. In the above method, when a silicon alkoxide is used as the metal alkoxide, there can be obtained a cathode-ray tube having an anti-reflection film made of alkali-free silica on the outermost surface of the panel, said anti-reflection film giving a ratio of Si-O-Si peak intensity to Si-OH peak intensity of 4 or more when measured for infrared spectrum. Further embodiments include an antistatic layer and the inclusion of an organic dye into the anti-reflection film.

    Magnetic head
    3.
    发明公开
    Magnetic head 失效
    磁头

    公开(公告)号：EP0538852A1

    公开(公告)日：1993-04-28

    申请号：EP92118074.1

    申请日：1992-10-22

    申请人： HITACHI, LTD.

    发明人： Naito, Takashi ,  Namekawa, Takashi ,  Kato, Akira ,  Suzuki, Yasutaka ,  Arikawa, Kouji ,  Ohata,Tsukasa ,  Yamamura, Shigeki ,  Gunji, Hideki

    IPC分类号： G11B5/127 ,  G11B5/23

    CPC分类号： G11B5/23 ,  G11B5/1276

    摘要： In a magnetic head, a pair of magnetic cores, which include magnetic films (1, 1') of a high saturation magnetic flux density formed respectively on substrates (2, 2',) are opposed to each other with a magnetic gap (3) provided therebetween, and the magnetic head is bonded by oxide glass (4, 4') comprising vanadium element as one of main constituent elements. An intervening layer (5, 5',) containing at least one of the constituent elements of the bonding glass, is provided between the bonding glass and a material to be bonded.
    According to the present invention, excellent characteristics of the bonding glass can be sufficiently utilized, and the magnetic head excellent in mass-producibility and reliability can be obtained. And besides, even when conventional glass is used as the bonding glass, the intervening layer defined in the present invention is effective.

    摘要翻译： 在磁头中，包括分别形成在基片（2,2'）上的具有高饱和磁通密度的磁膜（1,1'）的一对磁芯以磁隙（3' ），并且磁头通过包含钒元素作为主要构成元素之一的氧化物玻璃（4,4'）结合。 包含键合玻璃的至少一种组成元素的中间层（5,5'）设置在键合玻璃和待键合材料之间。 根据本发明，可以充分利用粘结玻璃的优良特性，并且可以获得批量生产性和可靠性优异的磁头。 而且，即使当传统玻璃用作粘合玻璃时，本发明中限定的中间层也是有效的。

    Method for growing thin film by beam deposition
    5.
    发明公开
    Method for growing thin film by beam deposition 失效
    通过光束沉积生长薄膜的方法及其实施方法

    公开(公告)号：EP0399470A3

    公开(公告)日：1991-07-24

    申请号：EP90109708.9

    申请日：1990-05-22

    申请人： HITACHI, LTD.

    发明人： Muranaka, Yasushi ,  Yamashita, Hisao ,  Kato, Akira ,  Miyadera, Hiroshi

    IPC分类号： C23C14/22 ,  C23C16/50 ,  C23C14/14

    CPC分类号： C23C14/221

    摘要： A method for growing a thin film on a substrate (6) of metal or ceramics by beam deposition comprising the steps of:
    (I) producing from starting gases ions of elements or compounds thereof to be deposited on the substrate (6);
    (II) irradiating (16) the ions produced in step (I) with electromagnetic waves to electronically excite at least one sort of said ions; and
    (III) impacting an ion beam comprising the ions excited in step (II) onto said substrate (6) to deposit thereon, thereby growing a film,
    and an apparatus for practicing the method. The method enables the formation of thin films having a higher crystallinity by electronically exciting ions or neutral species to increase the internal energy thereof and then impacting a beam comprising the excited ions or neutral species onto the substrate (6).

    Process for removing nitrogen oxides and carbon monoxide simultaneously
    8.
    发明公开
    Process for removing nitrogen oxides and carbon monoxide simultaneously 失效
    Verfahren zur gleichzeitigen Beseitigung von Stickstoffoxiden und Kohlenstoffmonoxid。

    公开(公告)号：EP0208434A1

    公开(公告)日：1987-01-14

    申请号：EP86304590.2

    申请日：1986-06-16

    申请人： HITACHI, LTD. ,  BABCOCK-HITACHI KABUSHIKI KAISHA

    发明人： Kato, Akira ,  Yamashita, Hisao ,  Kawagoshi, Hiroshi ,  Tachi, Takahiro ,  Watanabe, Noriko ,  Matsuda, Shinpei

    IPC分类号： B01D53/36 ,  B01J23/89

    CPC分类号： B01J23/89 ,  B01D53/865 ,  B01J23/63 ,  B01J23/64

    摘要： A process for removing NO x and CO simultaneously is characterized in that an exhaust gas comprising NO x , CO and O 2 is contacted with a catalyst in the presence of steam and ammonia to reduce NO, into harmless N 2 and also to react CO with H 2 0 to convert them into CO 2 and H 2 over the same catalyst. The catalyst comprises titanium oxide, oxide of at least one metal selected from the group consisting of molybdenum, tungsten, vanadium, cerium, nickel, cobalt and manganese, and at least one metal selected from the group consisting of platinum, palladium, rhodium and ruthenium.

    摘要翻译： 用于同时除去NOx和CO的方法的特征在于，在蒸汽和氨的存在下，包含NOx，CO和O 2的废气与催化剂接触以将NO x还原成无害的N 2，并且还使CO与H 2 O反应以将其转化成 CO2和H2在同一催化剂上。 催化剂包括氧化钛，选自钼，钨，钒，铈，镍，钴和锰中的至少一种金属的氧化物，以及选自铂，钯，铑和钌中的至少一种金属。 。

    Method for growing thin film by beam deposition
    10.
    发明公开
    Method for growing thin film by beam deposition 失效
    一种用于执行该方法生产由束沉积的薄膜，以及设备的过程。

    公开(公告)号：EP0399470A2

    公开(公告)日：1990-11-28

    申请号：EP90109708.9

    申请日：1990-05-22

    申请人： HITACHI, LTD.

    发明人： Muranaka, Yasushi ,  Yamashita, Hisao ,  Kato, Akira ,  Miyadera, Hiroshi

    IPC分类号： C23C14/22 ,  C23C16/50 ,  C23C14/14

    CPC分类号： C23C14/221

    摘要： A method for growing a thin film on a substrate (6) of metal or ceramics by beam deposition comprising the steps of:
    (I) producing from starting gases ions of elements or compounds thereof to be deposited on the substrate (6);
    (II) irradiating (16) the ions produced in step (I) with electromagnetic waves to electronically excite at least one sort of said ions; and
    (III) impacting an ion beam comprising the ions excited in step (II) onto said substrate (6) to deposit thereon, thereby growing a film,
    and an apparatus for practicing the method. The method enables the formation of thin films having a higher crystallinity by electronically exciting ions or neutral species to increase the internal energy thereof and then impacting a beam comprising the excited ions or neutral species onto the substrate (6).

    摘要翻译： 一种用于在金属或陶瓷构成的基片（6）由束沉积，包括以下步骤生长薄膜的方法：（i）从开始其将要在基片（6）沉积的元素或化合物的气体离子生产; （II）照射（16）在步骤（I）制备用电磁波以激发电子的至少一种类型的所述离子的离子; 和（III）影响着离子束包括在步骤（II）到所述衬底激发的离子（6）以在其上沉积，从而生长膜，并且向装置实施该方法。 该方法使得具有薄膜更高的结晶度通过电子激动人心离子或中性物质以增加其内部能量，然后 - 影响的光束包含被激发的离子或中性粒子到基板（6）的形成。