摘要:
A gate turn-off thyristor provided with a disc-shaped semiconductor substrate consisting of at least 4 layers of pnpn forming pn junctions between different layers adjacent to each other, in which the emitter layer (16) on the cathode side is divided into a plurality of elongated regions arranged in the radial direction and disposed in a plurality of rings, in which the base layer (14) on the anode side is formed so as to be connected partially with the anode electrode (2) disposed on the emitter layer on the anode side by a short-circuiting layer having the same conductivity type as the base layer and the short-circuiting layer described above has a coaxial circular pattern, characterized in that the short-circuiting layer described above is formed at least within the part, where the regions between different rings of the emitter layer on the cathode side are projected on the anode side.
摘要:
A gate turn-off thyristor provided with a disc-shaped semiconductor substrate consisting of at least 4 layers of pnpn forming pn junctions between different layers adjacent to each other, in which the emitter layer (16) on the cathode side is divided into a plurality of elongated regions arranged in the radial direction and disposed in a plurality of rings, in which the base layer (14) on the anode side is formed so as to be connected partially with the anode electrode (2) disposed on the emitter layer on the anode side by a short-circuiting layer having the same conductivity type as the base layer and the short-circuiting layer described above has a coaxial circular pattern, characterized in that the short-circuiting layer described above is formed at least within the part, where the regions between different rings of the emitter layer on the cathode side are projected on the anode side.
摘要:
In a turn off type semiconductor device, an n-type emitter layer (16) is divided into a plurality of elements (16a) by trenches (17). A silicide layer (3) of a high melting point metal is provided on a p-type layer (15) adjacent to the individual elements (16a) of the n-type emitter layer (16) on a bottom of each of the trenches (17). A gate electrode (4) is provided on the associated silicide layer so as to surround the plurality of elements (16a) of the n-type emitter layer (16) obtained by the division of the emitter layer. An insulator (5) is filled in each of the trenches (17) dividing the n-type emitter layer (16) surrounded by the gate electrode (4). A cathode electrode (6) is provided on both the insulators (5) and the n-type emitter layer (16).
摘要:
The present invention relates to a buried gate type gate turn-off thyristor. A low-resistance layer which is buried in a cathode base layer has a multiplicity of small bores below a cathode emitter layer. The distance between each pair of adjacent small bores and the thickness of the low-resistance layer are each set so as to be smaller than the carrier diffusion length in an anode base layer. In an on-state, carries flow through the low-resistance layer, thereby allowing the low-resistance layer to become conductive, and thus lowering the on-state voltage. A reduction in the dimension of the small bores lowers the resistance of the low-resistance layer and hence lowers the gate drawing out resistance, so that the interrupting capacity is improved. When gate turn-off thyristor is arranged so as to have an amplifying gate structure, the distance between each pair of adjacent small bores in the amplifying auxiliary thyristor section is set so as to be greater than the carrier diffusion length in the anode base layer. In consequence, the on-state voltage in the auxiliary thyristor section is increased, so that the current selectively flows through the main thyristor section, and the auxiliary thyristor section automatically turns off. Accordingly, when the thyristor is to be turned off, it suffices to turn off the main thyristor section alone.
摘要:
The present invention relates to a buried gate type gate turn-off thyristor. A low-resistance layer which is buried in a cathode base layer has a multiplicity of small bores below a cathode emitter layer. The distance between each pair of adjacent small bores and the thickness of the low-resistance layer are each set so as to be smaller than the carrier diffusion length in an anode base layer. In an on-state, carries flow through the low-resistance layer, thereby allowing the low-resistance layer to become conductive, and thus lowering the on-state voltage. A reduction in the dimension of the small bores lowers the resistance of the low-resistance layer and hence lowers the gate drawing out resistance, so that the interrupting capacity is improved. When gate turn-off thyristor is arranged so as to have an amplifying gate structure, the distance between each pair of adjacent small bores in the amplifying auxiliary thyristor section is set so as to be greater than the carrier diffusion length in the anode base layer. In consequence, the on-state voltage in the auxiliary thyristor section is increased, so that the current selectively flows through the main thyristor section, and the auxiliary thyristor section automatically turns off. Accordingly, when the thyristor is to be turned off, it suffices to turn off the main thyristor section alone.
摘要:
A gate turn-off thyristor of a short-circuited emitter configuration comprises a semiconductor substrate (1) of a P E -N B -P B -N E four-layer structure, wherein a P E -layer (2) is short-circuited through a N B -layer (3 and 4) and an anode (8). The N B -layer includes heavily doped regions (3) with which the anode is in ohmic contact with low resistance. The P E -layer (2) is at least partly at the area corresponding to the projection of the N E -layer (6) onto the surface contacted by the anode (8). The thickness of the heavily doped regions (3) is greater than of the P E -layer (2). This structure achieves satisfactory gate turn-off characteristics, although the semiconductor substrate is not doped with a life time killer impurity.