METALLISIERUNGSVERFAHREN FÜR DIELEKTRIKA
    3.
    发明公开
    METALLISIERUNGSVERFAHREN FÜR DIELEKTRIKA 有权
    用于金属化电介质

    公开(公告)号:EP1232294A2

    公开(公告)日:2002-08-21

    申请号:EP00972586.2

    申请日:2000-09-07

    IPC分类号: C23C18/16

    摘要: The invention relates to a method for metallizing dielectrics during which a photosensitive dielectric is applied to a substrate. The dielectric is then exposed to light though a mask, is seeded with a metal and subjected to a temperature treatment and, afterwards, the dielectric is chemically metallized. Alternatively, the dielectric can be firstly seeded with a metal after being applied to the substrate, and then exposed to light through a mask. Afterwards, excess seeding material is removed and the dielectric is chemically metallized.