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1.发明公开
公开(公告)号：EP4185733A1
公开(公告)日：2023-05-31
申请号：EP21748562.2
申请日：2021-07-20
申请人： Institut Polytechnique de Grenoble , Centre national de la recherche scientifique , Université Grenoble Alpes
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公开(公告)号：EP2671260A2
公开(公告)日：2013-12-11
申请号：EP12706653.8
申请日：2012-01-30
发明人： CHICHIGNOUD, Guy , BLANQUET, Elisabeth , GELARD, Isabelle , JIMENEZ, Carmen , SARIGIANNIDOU, Eirini , ZAIDAT, Kader , WEISS, François , PONS, Michel
IPC分类号： H01L31/0236 , H01L31/0392 , H01L31/18 , C22C38/08 , C23C16/02 , C23C16/24 , H01L31/042
CPC分类号： H01L31/03685 , C23C16/0272 , C23C16/24 , H01L31/0236 , H01L31/03921 , H01L31/068 , H01L31/182 , Y02E10/546 , Y02P70/521
摘要： The invention relates to a structure adapted for the formation of solar cells, comprising the following successive elements, namely: a sheet (1) of textured metal with crystal grains having an average size greater than 50 µm, said sheet being adapted to form a rear face electrode of the cells; a diffusion barrier layer (2) having a thickness of between 0.2 and 2 µm, made from an electrically conductive material with crystal grains having an average size greater than 50 µm; and a doped multicrystalline silicon layer (3) having a thickness of between 30 and 100 µm, with crystal grains having an average size greater than 50 to 100 µm, in which the average diffusion length of the carriers is greater than 50 µm.
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公开(公告)号：EP0883698A1
公开(公告)日：1998-12-16
申请号：EP97907127.0
申请日：1997-02-25
IPC分类号： C23C16
CPC分类号： C23C16/4488 , C23C16/34
摘要： A method for forming a Ti1-xAlxN coating on a part, wherein a chemical vapour deposition chamber is heated to 250-500 °C; the part to be coated is heated to 550-650 °C and placed in said chamber; and a mixture of titanium and aluminium chlorides, NH3 and H2 is injected into the chamber. The molar amount of NH3 is greater than the molar amount of chlorides, and the molar amount of hydrogen is over five times greater than the molar amount of chlorides.
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公开(公告)号：EP0883698B1
公开(公告)日：2000-01-12
申请号：EP97907127.1
申请日：1997-02-25
CPC分类号： C23C16/4488 , C23C16/34
摘要： A method for forming a Ti1-xAlxN coating on a part, wherein a chemical vapour deposition chamber is heated to 250-500 DEG C; the part to be coated is heated to 550-650 DEG C and placed in said chamber; and a mixture of titanium and aluminium chlorides, NH3 and H2 is injected into the chamber. The molar amount of NH3 is greater than the molar amount of chlorides, and the molar amount of hydrogen is over five times greater than the molar amount of chlorides.
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