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16 条记录 (耗时 0.013 秒)

    A method and apparatus for providing a uniform illumination of an area
    2.
    发明公开
    A method and apparatus for providing a uniform illumination of an area 失效
    一种提供均匀照明的方法和装置

    公开(公告)号：EP0083394A3

    公开(公告)日：1983-08-10

    申请号：EP82109182

    申请日：1982-10-05

    申请人： International Business Machines Corporation

    发明人： Grobman, Warren David

    IPC分类号： G03B41/00 ,  G02B27/17 ,  G03F07/20

    CPC分类号： G03F7/70075 ,  G02B26/10

    摘要： Uniform illumination of a two dimensional area, such as a lithographic mask, is provided. The fan-like input beam : (50) is sent to a mirror (52), which it strikes at a grazing angle and is then reflected to the area to be illuminated. Collimation occurs to reduce the divergence of the beam in order to increase its intensity. By changing the grazing angle between the reflected beam (50) and the mirror (52) by a small amount, the reflected beam (54) will be swept across the two dimensional area. The angle is changed at a non-uniform rate which is a function of time, and is chosen so that substantially uniform illumination occurs at all points in the area to be illuminated. A particular embodiment uses a divergent x-ray beam from a synchrotron source. The divergent beam strikes a cylindrical mirror, which collimates it and directs the reflected beam to an x-ray mask plane. The mirror is moved with a nonlinear velocity in order to provide substantially uniform illumination of the mask area, and substantially uniform heating across the mask plane.

    Apparatus for exposing a microcircuit wafer to electromagnetic radiation
    3.
    发明公开
    Apparatus for exposing a microcircuit wafer to electromagnetic radiation 失效
    将微波辐射暴露于电磁辐射的装置

    公开(公告)号：EP0083399A3

    公开(公告)日：1985-01-09

    申请号：EP82109880

    申请日：1982-10-26

    申请人： International Business Machines Corporation

    发明人： Grobman, Warren David

    IPC分类号： G21K01/04

    CPC分类号： G03F7/70916 ,  G21K1/04 ,  G21K1/043

    摘要： A shutter (26) is positioned in the path of radiation from a pulsed electromagnetic radiation source (10) at a distance sufficiently far from the source such that an emitted pulse of electromagnetic radiation and the debris simultaneously discharged with the pulse become spatially separated from each other and arrive at the shutter (26) at different times due to the inherent difference in propagation speed of the debris and pulse. Movement of the shutter is synchronized with generation of an electromagnetic pulse such that the pulse encounters an open shutter and passes on through a window (16) to expose a microcircuit wafer while the slower travelling debris simultaneously launched with the pulse encounters a closed shutter.

    Methods and apparatus for testing lithographic masks using electron beam scanning
    4.
    发明公开
    Methods and apparatus for testing lithographic masks using electron beam scanning 失效
    通过扫描电子束测试光刻掩模的方法和装置。

    公开(公告)号：EP0083408A2

    公开(公告)日：1983-07-13

    申请号：EP82110210.0

    申请日：1982-11-05

    申请人： International Business Machines Corporation

    发明人： Grobman, Warren David

    IPC分类号： G03F1/00 ,  G01N21/88 ,  G01N23/227

    CPC分类号： G03F1/86 ,  G01N23/18 ,  G01N23/203 ,  G03F1/40

    摘要： In electron beam testing systems wherein high energy, 'high resolution electron beams 14 are used to test litho- tgraphic masks 16, a technique and apparatus is described for discharging electrons which are left on the surface of the mask. The materials used in these masks e.g. for substrate are such that induced photoconductivity and photoemissivity are extremely low and are incapable of providing sufficient eletron discharge. The electrons are discharged by using a thin, low work function (e.g. between 1 and 3eV) coating 20 which is applied over the entire mask surface, the coating 20 being transparent to the radiation which will later be incident upon the mask when it is used in a fabrication process. Due to induced photoemission in the thin coating layer, enough photoemitted electrons will be produced to balance the buildup of electrons from the electron beam, thereby discharging the surface of the mask. The electron beam is a high energy beam, having energies greater than about 5000 eV, and a resolution less than about 1 micrometer. Cesium telluride (CsTe) is a suitable coating material.

    A method and apparatus for providing a uniform illumination of an area
    5.
    发明公开
    A method and apparatus for providing a uniform illumination of an area 失效
    Verfahren und VorrichtungfürdiegleichmässigeBeleuchtung einerFläche。

    公开(公告)号：EP0083394A2

    公开(公告)日：1983-07-13

    申请号：EP82109182.4

    申请日：1982-10-05

    申请人： International Business Machines Corporation

    发明人： Grobman, Warren David

    IPC分类号： G03B41/00 ,  G02B26/10 ,  G03F7/20

    CPC分类号： G03F7/70075 ,  G02B26/10

    摘要： Uniform illumination of a two dimensional area, such as a lithographic mask, is provided. The fan-like input beam : (50) is sent to a mirror (52), which it strikes at a grazing angle and is then reflected to the area to be illuminated. Collimation occurs to reduce the divergence of the beam in order to increase its intensity. By changing the grazing angle between the reflected beam (50) and the mirror (52) by a small amount, the reflected beam (54) will be swept across the two dimensional area. The angle is changed at a non-uniform rate which is a function of time, and is chosen so that substantially uniform illumination occurs at all points in the area to be illuminated. A particular embodiment uses a divergent x-ray beam from a synchrotron source. The divergent beam strikes a cylindrical mirror, which collimates it and directs the reflected beam to an x-ray mask plane. The mirror is moved with a nonlinear velocity in order to provide substantially uniform illumination of the mask area, and substantially uniform heating across the mask plane.

    摘要翻译： 提供二维区域的均匀照明，例如光刻掩模。 风扇状输入光束（50）被发送到反射镜（52），反射镜以掠射角度射出，然后被反射到要照明的区域。 发生准直以减小光束的发散度以增加其强度。 通过将反射光束（50）和反射镜（52）之间的掠射角度改变少量，反射光束（54）将被扫过二维区域。 角度以不均匀速率改变，这是时间的函数，并且被选择为使得在待照射区域中的所有点处发生基本均匀的照明。 特定实施例使用来自同步加速器源的发散X射线束。 发散光束撞击一个圆柱形反射镜，其将其准直并将反射光束引导到X射线掩模平面。 以非线性速度移动镜子，以便提供掩模面积的基本上均匀的照明，以及跨越掩模平面的基本均匀的加热。

    Laser induced halogen gas etching of metal substrates
    8.
    发明公开
    Laser induced halogen gas etching of metal substrates 失效
    Ätzenvon Metallsubstraten mit Halogengas，induziert durch einen Laser。

    公开(公告)号：EP0219697A2

    公开(公告)日：1987-04-29

    申请号：EP86112935.1

    申请日：1986-09-19

    申请人： International Business Machines Corporation

    发明人： Grobman, Warren David ,  Ho, Fahfu ,  Hurst, Jerry Elden, Jr. ,  Tomkiewicz, Yaffa

    IPC分类号： C23F4/02 ,  B23K26/18 ,  H01L21/31

    CPC分类号： C23F4/02

    摘要： A process for radiation induced dry etching a metallised (e.g. copper) substrate is disclosed wherein the substrate is exposed to a patterned beam of laser radiation in a halogen gas atmosphere which is reactive with the substrate to form a metal halide salt reaction product to accelerate the formation of the metal halide salt without its substantial removal from the substrate. The metal halide salt is removed from the substrate by contact of the substrate with a solvent for the metal halide salt.

    摘要翻译： 公开了一种用于金属化（例如铜）衬底的辐射诱导干蚀刻的方法，其中将衬底暴露于卤素气体气氛中的图案化的激光辐射束，其与衬底反应以形成金属卤化物盐反应产物，以加速 形成金属卤化物盐，而不会从基材中大量除去。 金属卤化物盐通过与底物与金属卤化物盐的溶剂接触而从基材上除去。