摘要:
A multilayered thin film metallurgy for brazing input/output pins to a ceramic substrate is disclosed. A thin adhesion layer (22), which can suitably be a refractory metal such as titanium, vanadium, chromium or tantalum, is first formed on the surface of the substrate (10). A thick stress reducing layer (24) of soft metal such as copper, silver, nickel, aluminum, gold or iron is subsequently formed over the adhesion layer. To prevent the soft metal from reacting with subsequently brazed gold-tin pin eutectic alloy, a reaction barrier layer (28) which can be titanium or zirconium is then deposited over the soft stress reducing metal cushion layer. The process is completed by finally depositing a gold layer (30) over the reaction barrier layer.
摘要:
A layer of zirconium (44) can be used as an adhesion layer between a ceramic or polyimide substrate (40) and subsequently applied metallic layers (46,48,50). Following the zirconium layer, copper can be deposited (46) followed by a reaction barrier layer (48) and a wettable surface layer (50) such as gold. This type of structure can be used for pin brazing, chip joining, and/or wire connections.
摘要:
Sealing and stress relief are provided to a low-fracture strength glass-ceramic substrate. Hermeticity is addressed through the use of capture pads in alignment with vias and through polymeric overlayers with interconnection between the underlying via or pad metallurgy and the device, chip, wire or pin bonded to the surface of the layer. Multilevel structures are taught along with a self-aligned sealing and wiring process.
摘要:
Sealing and stress relief are provided to a low-fracture strength glass-ceramic substrate. Hermeticity is addressed through the use of capture pads in alignment with vias and through polymeric overlayers with interconnection between the underlying via or pad metallurgy and the device, chip, wire or pin bonded to the surface of the layer. Multilevel structures are taught along with a self-aligned sealing and wiring process.
摘要:
A layer of zirconium (44) can be used as an adhesion layer between a ceramic or polyimide substrate (40) and subsequently applied metallic layers (46,48,50). Following the zirconium layer, copper can be deposited (46) followed by a reaction barrier layer (48) and a wettable surface layer (50) such as gold. This type of structure can be used for pin brazing, chip joining, and/or wire connections.
摘要:
A multilayered thin film metallurgy for brazing input/output pins to a ceramic substrate is disclosed. A thin adhesion layer (22), which can suitably be a refractory metal such as titanium, vanadium, chromium or tantalum, is first formed on the surface of the substrate (10). A thick stress reducing layer (24) of soft metal such as copper, silver, nickel, aluminum, gold or iron is subsequently formed over the adhesion layer. To prevent the soft metal from reacting with subsequently brazed gold-tin pin eutectic alloy, a reaction barrier layer (28) which can be titanium or zirconium is then deposited over the soft stress reducing metal cushion layer. The process is completed by finally depositing a gold layer (30) over the reaction barrier layer.