公开(公告)号：EP0708490A1

公开(公告)日：1996-04-24

申请号：EP94912057.0

申请日：1994-04-06

申请人： Nippon Steel Corporation ,  Goto, Naohisa

发明人： GOTO, Naohisa ,  MORIYA, Masaharu Nippon Steel Corporation ,  MATSUNO, Keishi Nippon Steel Corporation

IPC分类号： H01P11/00 ,  H01Q13/10 ,  H01Q13/20

CPC分类号： H01Q21/005 ,  H01Q21/0087 ,  H01Q21/062

摘要： An antenna having a waveguide structure and comprising a base of a thin flat metal; a radiation plate of a thin flat metal arranged in parallel with the base at a distance from the base; and a plurality of thin flat metal side walls secured to the base and radiation plate, and arranged in the space between the base and the radiation plate so as to form a plurality of waveguides connected to each other. The radiation plate and the side walls are joined by spot-welding at given intervals. The base and the side walls are preferably in the form of a single block made of a metallic material.

摘要翻译： 一种具有波导结构并且包括薄平金属基底的天线; 与所述底座平行地距离所述基座一定距离的薄扁平金属片的辐射板; 以及固定到基座和辐射板的多个薄平的金属侧壁，并且布置在基座和辐射板之间的空间中，以形成彼此连接的多个波导。 辐射板和侧壁通过点焊以给定的间隔连接。 基部和侧壁优选为由金属材料制成的单个块的形式。

公开(公告)号：EP1096554A1

公开(公告)日：2001-05-02

申请号：EP99923919.7

申请日：1999-06-04

申请人： TOKYO ELECTRON LIMITED ,  Goto, Naohisa ,  Ando, Makoto

发明人： GOTO, Naohisa ,  ANDO, Makoto ,  ISHII, Nobuo

IPC分类号： H01L21/3065

CPC分类号： H01J37/3222 ,  H01J37/32192

摘要： In a plasma processing system, microwaves generated by a microwave generator (86) are guided to a plane antenna (62) to introduce the microwaves, which are attenuated exponentially, into a processing vessel (22) in which an object to be processed (W) is subjected to a plasma process. A microwave absorbing means (96) is disposed in a peripheral portion of the plane antenna (62) to absorb the microwaves propagating from a central portion of the plane antenna and to control the amount of reflected microwave. Thus the amount of the microwaves reflected toward the central portion of the plane antenna (62) by a peripheral portion of the plane antenna (62) is reduced to some extent so that electromagnetic field intensity is distributed uniformly.

摘要翻译： 在等离子体处理系统中，由微波发生器（86）产生的微波被引导到平面天线（62），以将被指数地衰减的微波引入处理容器（22）中，在该处理容器（22）中，待加工物体（W ）进行等离子体处理。 微波吸收装置（96）设置在平面天线（62）的周边部分中，以吸收从平面天线的中心部分传播的微波并控制反射微波的量。 因此，通过平面天线（62）的周边部分朝向平面天线（62）的中心部分反射的微波的量减少到一定程度，使得电磁场强度均匀分布。

公开(公告)号：EP1439571A1

公开(公告)日：2004-07-21

申请号：EP02775374.8

申请日：2002-10-18

申请人： Goto, Naohisa ,  Ohmi, Tadahiro ,  TOKYO ELECTRON LIMITED

发明人： GOTO, Naohisa ,  OHMI, Tadahiro ,  HIRAYAMA, M., Tohoku University ,  GOTO, Tetsuya, Tohoku University

IPC分类号： H01L21/205 ,  C23C16/511 ,  H01L21/3065 ,  H01L21/31 ,  H05H1/46

CPC分类号： H01J37/32229 ,  H01J37/32192

摘要： A microwave plasma processing apparatus includes a processing vessel, a microwave generator, a waveguide guiding a microwave formed by the microwave generator, and a microwave emitting member emitting the microwave with wavelength compression by a retardation plate, wherein the waveguide has a single microwave output opening in a location corresponding to a central par of the microwave emitting member.

摘要翻译： 的微波等离子体处理装置包括处理容器，微波发生器，波导引导由微波发生器形成的微波，以及微波发射部件由一个相位差板发射具有波长压缩的微波，worin波导具有单个微波输出开口 在一个位置对应于所述微波发射部件的中央公园。

公开(公告)号：EP1439571B1

公开(公告)日：2016-09-14

申请号：EP02775374.8

申请日：2002-10-18

申请人： Goto, Naohisa ,  Ohmi, Tadahiro ,  TOKYO ELECTRON LIMITED

发明人： GOTO, Naohisa ,  OHMI, Tadahiro ,  HIRAYAMA, Masaki ,  GOTO, Tetsuya

IPC分类号： H01J37/32

CPC分类号： H01J37/32229 ,  H01J37/32192