摘要:
In a plasma processing system, microwaves generated by a microwave generator (86) are guided to a plane antenna (62) to introduce the microwaves, which are attenuated exponentially, into a processing vessel (22) in which an object to be processed (W) is subjected to a plasma process. A microwave absorbing means (96) is disposed in a peripheral portion of the plane antenna (62) to absorb the microwaves propagating from a central portion of the plane antenna and to control the amount of reflected microwave. Thus the amount of the microwaves reflected toward the central portion of the plane antenna (62) by a peripheral portion of the plane antenna (62) is reduced to some extent so that electromagnetic field intensity is distributed uniformly.
摘要:
A microwave plasma processing apparatus includes a processing vessel, a microwave generator, a waveguide guiding a microwave formed by the microwave generator, and a microwave emitting member emitting the microwave with wavelength compression by a retardation plate, wherein the waveguide has a single microwave output opening in a location corresponding to a central par of the microwave emitting member.
摘要:
An antenna having a waveguide structure and comprising a base of a thin flat metal; a radiation plate of a thin flat metal arranged in parallel with the base at a distance from the base; and a plurality of thin flat metal side walls secured to the base and radiation plate, and arranged in the space between the base and the radiation plate so as to form a plurality of waveguides connected to each other. The radiation plate and the side walls are joined by spot-welding at given intervals. The base and the side walls are preferably in the form of a single block made of a metallic material.