公开(公告)号：EP2331733A2

公开(公告)日：2011-06-15

申请号：EP09777348.5

申请日：2009-07-21

申请人： RENA GmbH

发明人： REUSTLE, Peter ,  GUTEKUNST, Mathias

IPC分类号： C25D17/12 ,  C25D17/00 ,  H01L31/18 ,  C25D17/02 ,  H05K3/24

CPC分类号： C25D17/007 ,  C25D5/08 ,  C25D17/001 ,  C25D17/002 ,  C25D17/008 ,  C25D17/02 ,  C25D17/12 ,  C25D21/10

摘要： The invention relates to the electroplating of substrates for use as e.g. wafers, solar cells or hybrids in process chambers or cups having soluble or insoluble anodes and an electrolyte (8), which is conducted through the process chamber in a circuit. The invention also relates to the stripping of contacts that are metallised during the electroplating process. Two electrolytic operating conditions are produced in the process chamber, i.e. electroplating and stripping. The invention optimises these two operating conditions using one modular unit (2), substantially consisting of an anode carrier (3) and at least one liquid-permeable material (5) as the diffuser (5). For the electroplating process, a homogeneous stream of the electrolyte (8) is required in the process chamber in the vicinity of the product (1) to be electroplated. This is achieved by a corresponding adjustment of the static pressure below the diffuser (5) and as a result of the permeability characteristics of the latter with regard to the electrolyte. The volumetric flow of electrolyte (8) is increased during the stripping of the product supports which act as the electrical contact. The flow passes through the clearance zone (4) and then predominantly directly through the diffuser (5) that lies above the clearance zone (4). As a result, different flow speeds are present over the cross-section of the process chamber. This causes turbulence with wave formation on the surface of the electrolyte. Without the presence of a product, the electrolyte washes over the product supports, rapidly stripping the contacts completely with a high flow density.

公开(公告)号：EP2152939A1

公开(公告)日：2010-02-17

申请号：EP09757157.4

申请日：2009-05-08

申请人： RENA GmbH

发明人： GUTEKUNST, Mathias

IPC分类号： C25D5/02 ,  C25D17/00 ,  C25D7/06 ,  C25D21/12

CPC分类号： C25D5/028 ,  C25D5/18 ,  C25D7/0621 ,  C25D17/001 ,  C25D17/005 ,  C25D21/12

摘要： The invention relates to the electrical contact of flat material (1) as sections in straight-through installations for the electrolytic and/or chemical wet treatment of the treatment side (10) of the material using external electric current, with the top, contact side (9) being kept dry and the treatment side (10) penetrating into the treatment liquid (11). The known transporting systems with top and bottom transporting and/or contact means result in treatment liquid (11) being transferred from the bottom means to the top means, in which case the top side of the material is often inadmissbly wetted and the top contacts are galvanized and therefore continuously stripped, which requires relatively high outlay. According to the invention, the level is lowered in the region of top contacts (6). This means that these cannot be wetted, even when there is no material located in the region of the contacts (6). This is achieved by way of downpipes (5) which are assigned to each contact (6). Even in the case of contacts being relieved of any stressing, they do not come into contact with any treatment liquid, as a result of which the top side of the material remains dry and the contacts do not require any stripping.

公开(公告)号：EP2152939B1

公开(公告)日：2012-07-11

申请号：EP09757157.4

申请日：2009-05-08

申请人： RENA GmbH

发明人： GUTEKUNST, Mathias

IPC分类号： C25D5/02 ,  C25D17/00 ,  C25D7/06 ,  C25D21/12

CPC分类号： C25D5/028 ,  C25D5/18 ,  C25D7/0621 ,  C25D17/001 ,  C25D17/005 ,  C25D21/12

摘要： The invention relates to the electrical contact of flat material (1) as sections in straight-through installations for the electrolytic and/or chemical wet treatment of the treatment side (10) of the material using external electric current, with the top, contact side (9) being kept dry and the treatment side (10) penetrating into the treatment liquid (11). The known transporting systems with top and bottom transporting and/or contact means result in treatment liquid (11) being transferred from the bottom means to the top means, in which case the top side of the material is often inadmissbly wetted and the top contacts are galvanized and therefore continuously stripped, which requires relatively high outlay. According to the invention, the level is lowered in the region of top contacts (6). This means that these cannot be wetted, even when there is no material located in the region of the contacts (6). This is achieved by way of downpipes (5) which are assigned to each contact (6). Even in the case of contacts being relieved of any stressing, they do not come into contact with any treatment liquid, as a result of which the top side of the material remains dry and the contacts do not require any stripping.

公开(公告)号：EP2229688B1

公开(公告)日：2011-09-21

申请号：EP09777346.9

申请日：2009-07-21

申请人： RENA GmbH

发明人： REUSTLE, Peter ,  GUTEKUNST, Mathias

IPC分类号： H01L21/00 ,  H01L21/60 ,  C25D7/12 ,  C25D17/02

CPC分类号： C25D5/08 ,  C25D5/006 ,  C25D17/001 ,  C25D17/008 ,  C25D17/06 ,  H01L21/67051 ,  H01L21/6708 ,  H01L21/67115 ,  H01L21/6719 ,  H01L21/76897

摘要： The invention relates to the wet processing and electroplating of one side and/or the edge of a flat product (1) used as a substrate in production systems containing process chambers (4), through which treatment liquid flows (8), wetting the product (1) that is positioned at the upper opening (3) of the process chamber (4). According to prior art, process chambers (4) of this type are suitable for one type of product (1) with particular dimensions. The invention provides the flexibility required in practice with respect to products (1) of different sizes. To achieve this, the process chamber (4) is designed in at least two parts with a lower part (5) and at least two upper parts (6) that can be preferably automatically interchanged. The separation point (7) of both parts is designed in a positive manner and can be automatically detached. Upper parts (6) that are adapted specifically to the product are placed on the fixed lower part (5) in order to produce the product, thus permitting the entire process chamber (4) to be optimised for the production of the designated type of product (1).

公开(公告)号：EP2183772B1

公开(公告)日：2011-02-09

申请号：EP09777553.0

申请日：2009-07-30

申请人： RENA GmbH

发明人： REUSTLE, Peter ,  GUTEKUNST, Mathias ,  LÜTKE NOTARP, Dietmar

IPC分类号： H01L21/68

CPC分类号： H01L21/68707 ,  H01L21/67259 ,  H01L21/681 ,  H01L21/6838

摘要： The invention relates to handling goods (1), particularly transporting wafers or solar cells in lines from one placement station of a wet or dry process to the next by means of a gripper device (3), having at least one gripper (14) located on a handling device. For known vacuum grippers or mechanical carriers, particularly when capturing and placing the goods to be transported, an additional risk of floating away or shifting occurs. According to the invention, said risk is prevented by limiters positioned at the edge (12) of the goods (1) by means of positioning actuators (8) before or after capturing at the pickup position. Exact positioning of the limiters (10) is determined by edge detectors (11) located at the axes (9) of the positioning actuators (8) in combination with the limiters. The limiters (10) are opened only after the goods are placed in the target position. The stroke data of the positioning actuators (8) measured when positioning the limiters (10), that is, the positions of the limiters (10), are evaluated by the control system of the line for correct placement.

公开(公告)号：EP2229688A2

公开(公告)日：2010-09-22

申请号：EP09777346.9

申请日：2009-07-21

申请人： RENA GmbH

发明人： REUSTLE, Peter ,  GUTEKUNST, Mathias

IPC分类号： H01L21/00 ,  H01L21/60 ,  C25D7/12 ,  C25D17/02

CPC分类号： C25D5/08 ,  C25D5/006 ,  C25D17/001 ,  C25D17/008 ,  C25D17/06 ,  H01L21/67051 ,  H01L21/6708 ,  H01L21/67115 ,  H01L21/6719 ,  H01L21/76897

摘要： The invention relates to the wet processing and electroplating of one side and/or the edge of a flat product (1) used as a substrate in production systems containing process chambers (4), through which treatment liquid flows (8), wetting the product (1) that is positioned at the upper opening (3) of the process chamber (4). According to prior art, process chambers (4) of this type are suitable for one type of product (1) with particular dimensions. The invention provides the flexibility required in practice with respect to products (1) of different sizes. To achieve this, the process chamber (4) is designed in at least two parts with a lower part (5) and at least two upper parts (6) that can be preferably automatically interchanged. The separation point (7) of both parts is designed in a positive manner and can be automatically detached. Upper parts (6) that are adapted specifically to the product are placed on the fixed lower part (5) in order to produce the product, thus permitting the entire process chamber (4) to be optimised for the production of the designated type of product (1).

公开(公告)号：EP2321845B1

公开(公告)日：2012-07-04

申请号：EP09777345.1

申请日：2009-07-21

申请人： RENA GmbH

发明人： REUSTLE, Peter ,  GUTEKUNST, Mathias

IPC分类号： H01L21/677 ,  H01L21/687

CPC分类号： H01L21/68707 ,  H01L21/67766

摘要： The invention relates to handling goods (1), particularly transporting fragile substrates as wafers or solar cells in a preferably horizontal or tilted orientation in production lines from one wet or dry process to the next, by means of a gripper device (3) located on a handling device or a robot arm. The invention proposes a gripper device (3) having additional aligning means (8). The goods (1), located at first in an indeterminate orientation, are aligned by closing the aligning means (8) in the direction toward the goods. Stops (18) for the aligning means (8) determine the predetermined alignment of the goods. Said alignment has a fixed spatial relationship to the gripper direction (3), whereby said alignment is also known in the superordinate control system of the line. The alignment can be done prior to picking up the goods from a storage location (2). It can also take place during transport to the target position or after said target position is reached, the coordinates and position thereof in the control system of the production line also being known.

公开(公告)号：EP2321845A1

公开(公告)日：2011-05-18

申请号：EP09777345.1

申请日：2009-07-21

申请人： RENA GmbH

发明人： REUSTLE, Peter ,  GUTEKUNST, Mathias

IPC分类号： H01L21/687

CPC分类号： H01L21/68707 ,  H01L21/67766

摘要： The invention relates to handling goods (1), particularly transporting fragile substrates as wafers or solar cells in a preferably horizontal or tilted orientation in production lines from one wet or dry process to the next, by means of a gripper device (3) located on a handling device or a robot arm. The invention proposes a gripper device (3) having additional aligning means (8). The goods (1), located at first in an indeterminate orientation, are aligned by closing the aligning means (8) in the direction toward the goods. Stops (18) for the aligning means (8) determine the predetermined alignment of the goods. Said alignment has a fixed spatial relationship to the gripper direction (3), whereby said alignment is also known in the superordinate control system of the line. The alignment can be done prior to picking up the goods from a storage location (2). It can also take place during transport to the target position or after said target position is reached, the coordinates and position thereof in the control system of the production line also being known.

公开(公告)号：EP2183772A1

公开(公告)日：2010-05-12

申请号：EP09777553.0

申请日：2009-07-30

申请人： RENA GmbH

发明人： REUSTLE, Peter ,  GUTEKUNST, Mathias ,  LÜTKE NOTARP, Dietmar

IPC分类号： H01L21/68

CPC分类号： H01L21/68707 ,  H01L21/67259 ,  H01L21/681 ,  H01L21/6838

摘要： The invention relates to handling goods (1), particularly transporting wafers or solar cells in lines from one placement station of a wet or dry process to the next by means of a gripper device (3), having at least one gripper (14) located on a handling device. For known vacuum grippers or mechanical carriers, particularly when capturing and placing the goods to be transported, an additional risk of floating away or shifting occurs. According to the invention, said risk is prevented by limiters positioned at the edge (12) of the goods (1) by means of positioning actuators (8) before or after capturing at the pickup position. Exact positioning of the limiters (10) is determined by edge detectors (11) located at the axes (9) of the positioning actuators (8) in combination with the limiters. The limiters (10) are opened only after the goods are placed in the target position. The stroke data of the positioning actuators (8) measured when positioning the limiters (10), that is, the positions of the limiters (10), are evaluated by the control system of the line for correct placement.