公开(公告)号：EP1852438A4

公开(公告)日：2008-02-06

申请号：EP06712311

申请日：2006-01-25

申请人： TOSOH CORP ,  SAGAMI CHEM RES

发明人： SEKIMOTO KENICHI ,  TADA KEN-ICHI ,  TAKAMORI MAYUMI ,  YAMAKAWA TETSU ,  FURUKAWA TAISHI ,  OSHIMA NORIAKI

IPC分类号： C07F17/00 ,  C23C16/30

CPC分类号： C23C16/18 ,  C07F17/00

摘要： Disclosed is a novel tantalum compound which enables to selectively form a tantalum-containing film which does not include a halogen or the like, or a tantalum-containing film which includes a desired element. Also disclosed are a method for producing such a tantalum compound, and a method for forming a tantalum-containing film which includes a desired element. Specifically disclosed is a tantalum compound represented by the general formula (1) or (2) below. [Chemical formula 1] (1) (In the formula (1), R 1 represents a straight-chain alkyl group having 2-6 carbon atoms.) [Chemical formula 2] (2) (In the formula (2), R 2 represents a straight-chain alkyl group having 2-6 carbon atoms.) Also specifically disclosed is a method for forming a tantalum-containing film by using a tantalum compound represented by the general formula (6) below as a raw material. [Chemical formula 3] (6) (In the formula (6), j, k, m and n respectively represent an integer of 1-4 satisfying j + k = 5 and m + n = 5; and R 3 -R 6 respectively represent a hydrogen atom, an alkyl group having 1-6 carbon atoms or the like.)

公开(公告)号：EP1947081A4

公开(公告)日：2008-10-22

申请号：EP06822809

申请日：2006-11-01

申请人： TOSOH CORP ,  SAGAMI CHEM RES

发明人： TADA KEN-ICHI ,  INABA KOICHIRO ,  FURUKAWA TAISHI ,  CHIBA HIROKAZU ,  YAMAKAWA TETSU ,  OSHIMA NORIAKI

IPC分类号： C07C211/65 ,  C07F7/28 ,  C23C16/34

CPC分类号： C23C16/18 ,  C07C211/65 ,  C07C251/08 ,  C07F7/006 ,  C23C16/34 ,  C23C16/405

摘要： The invention relates to novel titanium complexes which have excellent vaporization characteristics and thermal stability and are useful as raw material in forming titanium-containing thin films by CVD, ALD, or the like; a process for the production of the complexes; titanium-containing thin films formed by using the complexes; and a method for formation of the films. According to the invention, a titanium complex represented by the general formula (1) is produced by reacting a diimine represented by the general formula (2) with metallic lithium and then with a tetrakisamido complex represented by the general formula (3) and a titanium-containing thin film is formed by using the titanium complex as the raw material: [Chemical formula 1] (2) [Chemical formula 2] Ti(NR 5 R 6 ) 4 (3) [Chemical formula 3] (1) wherein R 1 and R 4 are each alkyl of 1 to 6 carbon atoms, or the like; R 2 and R 3 are each independently hydrogen, alkyl of 1 to 3 carbon atoms, or the like; and R 5 and R 6 are each independently alkyl of 1 to 4 carbon atoms, or the like.

公开(公告)号：EP2058295A4

公开(公告)日：2011-03-30

申请号：EP07792748

申请日：2007-08-20

申请人： TOSOH CORP ,  SAGAMI CHEM RES

发明人： TADA KEN-ICHI ,  FURUKAWA TAISHI ,  INABA KOICHIRO ,  YOTSUYA TADAHIRO ,  CHIBA HIROKAZU ,  YAMAMOTO TOSHIKI ,  YAMAKAWA TETSU ,  OSHIMA NORIAKI

IPC分类号： C07C211/65 ,  C01G33/00 ,  C01G35/00 ,  C07C209/00 ,  C07F9/00 ,  C23C16/18

CPC分类号： C23C16/18 ,  C01G33/00 ,  C01G35/00 ,  C01P2002/88 ,  C07C211/65 ,  C07C251/08 ,  C07F9/005 ,  C23C16/405

公开(公告)号：EP1921061A4

公开(公告)日：2011-03-16

申请号：EP06781947

申请日：2006-07-28

申请人： TOSOH CORP ,  SAGAMI CHEM RES

发明人： TADA KEN-ICHI ,  INABA KOICHIRO ,  FURUKAWA TAISHI ,  YAMAKAWA TETSU ,  OSHIMA NORIAKI

IPC分类号： C07C257/12 ,  C07C257/14 ,  C07F5/00 ,  C07F5/06 ,  C07F7/00 ,  C07F7/28 ,  C23C16/40 ,  H01L21/312

CPC分类号： H01L21/3141 ,  C07C257/14 ,  C07F5/003 ,  C07F5/069 ,  C07F7/006 ,  C23C16/18 ,  C23C16/40

公开(公告)号：EP2939996A4

公开(公告)日：2016-08-10

申请号：EP13867230

申请日：2013-12-27

申请人： TOSOH CORP ,  SAGAMI CHEMICAL RES INST

发明人： ASANO SACHIO ,  KINOSHITA TOMOYUKI ,  HARA YASUSHI ,  HARA DAIJI ,  TANAKA RYOJI ,  TADA KEN-ICHI

IPC分类号： C07C31/28 ,  C07C29/68 ,  C07C33/26 ,  C07F9/00 ,  H01L21/28 ,  H01L21/288 ,  H01L21/316

CPC分类号： C07F9/005 ,  C07C29/68 ,  C07C31/28 ,  C07C33/26 ,  C07F9/00 ,  H01L21/02118 ,  H01L21/02175 ,  H01L21/02183 ,  H01L21/02194 ,  H01L21/02282 ,  H01L21/02318

摘要： Provided is a compound useful for the manufacture of a Group 5 metal oxide film. The compound is a Group 5 metal oxo-alkoxo complex represented by general formula (A). A material solution for film formation purposes, which comprises the compound and an organic solvent, is prepared. A Group 5 metal oxide film can be manufactured using the material solution for film formation purposes. M±(µ4-O)²(µ3-O)³(µ-O)´(µ-ORA)µ(ORA)¶(RAOH)·X¸Y (A) (wherein M represents a niobium atom or the like; RA represents an alkyl group; X represents an alkylenedioxy group; Y represents a carboxy group or the like; ± represents an integer of 3 to 10; ² represents an integer of 0 to 1; ³ represents an integer of 0 to 8; ´ represents an integer of 2 to 9; µ represents an integer of 0 to 6; ¶ represents an integer of 6 to 16; · represents an integer of 0 to 4; ¸ represents an integer of 0 to 2; and represents an integer of 0 to 6).

公开(公告)号：EP2754638A4

公开(公告)日：2015-08-05

申请号：EP12830501

申请日：2012-09-03

申请人： TOSOH CORP ,  SAGAMI CHEMICAL RES INST

发明人： KINOSHITA TOMOYUKI ,  IWANAGA KOHEI ,  ASANO SACHIO ,  KAWABATA TAKAHIRO ,  OSHIMA NORIAKI ,  HIRAI SATORI ,  HARADA YOSHINORI ,  ARAI KAZUYOSHI ,  TADA KEN-ICHI

IPC分类号： C01B13/32 ,  C01B33/113 ,  C01G23/04 ,  C07F7/00 ,  C07F7/02 ,  C07F7/10 ,  C07F7/18 ,  C07F7/28 ,  C09D1/00 ,  H01L21/02 ,  H01L21/316

CPC分类号： C09D1/00 ,  C01B33/113 ,  C07F7/006 ,  C07F7/025 ,  H01L21/02164 ,  H01L21/02181 ,  H01L21/02186 ,  H01L21/02189 ,  H01L21/02216 ,  H01L21/02282

摘要： An object of the present invention is to provide a method for producing a Group IV metal oxide film useful as a semiconductor element or an optical element at a low temperature. The present invention relates to a method for producing a Group IV metal oxide film, comprising coating a surface of a substrate with a film-forming material dissolved in an organic solvent, and subjecting the substrate to a heat treatment, an ultraviolet irradiation treatment, or both of these treatments, wherein a film-forming material obtained by reacting a vinylenediamide complex having a specific structure with an oxidizing agent such as oxygen gas, air, ozone, water and hydrogen peroxide is used as the film-forming material.

公开(公告)号：EP2581377A4

公开(公告)日：2014-03-05

申请号：EP11792310

申请日：2011-05-30

申请人： TOSOH CORP ,  SAGAMI CHEMICAL RES INST

发明人： TADA KEN-ICHI ,  IWANAGA KOHEI ,  YAMAMOTO TOSHIKI ,  MANIWA ATSUSHI

IPC分类号： C07F7/02 ,  C07F7/10 ,  C23C16/34 ,  C23C16/40 ,  C23C16/42 ,  H01L21/02 ,  H01L21/316 ,  H01L21/318

CPC分类号： C07F7/025 ,  C23C16/345 ,  C23C16/401 ,  H01L21/02164 ,  H01L21/0217 ,  H01L21/02271