公开(公告)号：EP2756880A1

公开(公告)日：2014-07-23

申请号：EP12831873.0

申请日：2012-09-11

申请人： Toyo Tanso Co., Ltd.

发明人： TANAKA, Noriyuki ,  HIRAIWA, Jiro ,  MUKAI, Takahiro

IPC分类号： B01J8/24

CPC分类号： B01F3/068 ,  B01F2003/063 ,  B01J8/1818 ,  B01J8/1827 ,  B01J8/40 ,  B82Y30/00 ,  B82Y40/00 ,  C01B32/15 ,  Y10T137/87652

摘要： A processing space is provided in a reaction container. One gas inlet port is provided at the lower end of the reaction container. A distribution plate is attached to the one gas inlet port. Another gas inlet port is provided at a lower side surface of the reaction container. Powder that is an object to be processed is stored on the distribution plate in the reaction container. The distribution plate is configured to let a gas pass and not let the powder pass. A nitrogen gas is introduced into the processing space through the distribution plate from the one gas inlet port, and a processing gas is introduced into the processing space from the other gas inlet port without passing through the distribution plate.

摘要翻译： 处理空间设置在反应容器中。 一个气体入口设置在反应容器的下端。 分配板附接到一个气体入口。 在反应容器的下侧表面设有另一气体入口。 作为被处理物的粉末被储存在反应容器的分配板上。 分配板被配置为使气体通过并且不让粉末通过。 通过分配板从一个气体入口将氮气引入加工空间，并且处理气体从另一个气体入口导入处理空间，而不通过分配板。

公开(公告)号：EP2263792A1

公开(公告)日：2010-12-22

申请号：EP09718093.9

申请日：2009-03-06

申请人： Toyo Tanso Co., Ltd.

发明人： HIRAIWA, Jiro ,  TAKEBAYASHI, Hitoshi ,  YOSHIMOTO, Osamu ,  TANAKA, Noriyuki ,  FUJITA, Ichiro ,  SASAKI, Hiroyoshi ,  MORI, Kazutaka

IPC分类号： B01J19/00 ,  B01D53/68 ,  C08J7/12 ,  C23C8/08 ,  H01L21/3065

CPC分类号： H01L21/6719 ,  B01J4/008 ,  H01L21/67017 ,  H01L21/67109

摘要： A surface treatment apparatus 100 includes a diluent gas supplier 1, a fluorine gas supplier 2, a mixer 5 which mixes a diluent gas with a fluorine gas, and a reactor 6 which treats a treatment target by using a mixed gas generated by the mixer 5. A diluent gas supplied from a diluent gas supplier is heated by a heater 8, and the heated diluent gas is mixed with a fluorine gas supplied from a fluorine gas supplier, in the mixer 5. The mixed gas is supplied to the reactor 6. The gas in the reactor 6 is supplied from the reactor 6 to flow paths 219, 220, 221, and 222 by an exhauster 207. The valves 223, 224, 225, and 226 are serially opened, so that the gas in the reactor 6 is supplied to a harm removal apparatus 208 while the gas flow rate is being adjusted by the flow paths 219, 220, 221, and 222.

摘要翻译： 表面处理装置100包括稀释气体供给体1，氟气供给体2，混合稀释气体与氟气的混合器5以及通过使用由混合器5产生的混合气体来处理处理对象物的反应器6 从稀释气体供给装置供给的稀释气体由加热器8加热，在混合器5中将加热后的稀释气体与氟气供给体供给的氟气混合。混合气体供给反应器6。 反应器6中的气体通过排气器207从反应器6供应到流动路径219,220,221和222.阀223,224,225和226串联打开，使得反应器6中的气体 在通过流路219,220,221和222调节气体流量的同时被供给到危害消除装置208。

公开(公告)号：EP1932949A1

公开(公告)日：2008-06-18

申请号：EP06767483.8

申请日：2006-06-28

申请人： TOYO TANSO CO., LTD.

发明人： TANAKA, Noriyuki ,  YOSHIMOTO, Osamu ,  HIRAIWA, Jiro ,  HAYAKAWA, Hiroshi ,  TOJO, Tetsuro

IPC分类号： C25B9/00 ,  C25B1/24 ,  C25B15/08

CPC分类号： C25B1/245 ,  C25B15/02 ,  C25B15/08

摘要： A fluorine/fluoride gas generator which has an electrolyte made of mixed molten salt containing hydrogen fluoride in an electrolytic cell including an anode chamber and a cathode chamber, and generates a gas containing fluorine by electrolyzing the electrolyte, includes a raw material supply pipe for supplying an electrolysis raw material, reaching the inside of the electrolyte in the electrolytic cell, a normally-closed valve provided in the middle of the raw material supply pipe, and a bypass pipe provided with a normally-open valve, joining the raw material supply pipe on the downstream side from the normally-closed valve to a gas phase area of the electrolytic cell. Accordingly, the electrolyte is prevented from being suctioned into the raw material supply pipe in the fluorine/fluoride gas generator, and solidification of the electrolyte inside the rawmaterial supply pipe can be prevented.

摘要翻译： 一种氟/氟化物气体发生器，其具有由包含阳极室和阴极室的电解池中含有氟化氢的混合熔融盐形成的电解质，并且通过电解电解产生含氟气体的氟/氟化物气体发生器包括：供给原料供给管 电解原料，到达电解池中的电解质的内部，设置在原料供给管的中间的常闭阀，以及设有常开阀的旁通管，将原料供给管 在常闭阀的下游侧到电解池的气相区域。 因此，防止电解液被吸入到氟/氟化物气体发生器中的原料供给管中，并且可以防止原料供给管内的电解质的凝固。

公开(公告)号：EP1847634A1

公开(公告)日：2007-10-24

申请号：EP07707072.0

申请日：2007-01-19

申请人： TOYO TANSO CO., LTD.

发明人： TOJO, Tetsuro ,  HIRAIWA, Jiro ,  TAKEBAYASHI, Hitoshi ,  KODAMA, Masashi

IPC分类号： C25B9/00 ,  C25B11/12

CPC分类号： C25B1/245 ,  C25B11/0478 ,  C25B11/12

摘要： It is a task of the present invention to provide an electrolytic apparatus for producing fluorine or nitrogen trifluoride by electrolyzing a hydrogen fluoride-containing molten salt, the electrolytic apparatus being advantageous in that the electrolysis can be performed without the occurrence of the anode effect even at a high current density and without the occurrence of an anodic dissolution. In the present invention, this task has been accomplished by an electrolytic apparatus for producing fluorine or nitrogen trifluoride by electrolyzing a hydrogen fluoride-containing molten salt at an applied current density of from 1 to 1,000 A/dm 2 , the electrolytic apparatus using a conductive diamond-coated electrode as an anode.

摘要翻译： 本发明的任务是提供一种通过电解含氟化氢的熔融盐来生产氟或三氟化氮的电解设备，该电解设备的优点在于，即使在不产生阳极效应的情况下即使在 高电流密度且不发生阳极溶解。 在本发明中，这个任务是通过用施加电流密度为1〜1000A / dm 2的电解含氟化氢的熔融盐来制造氟或三氟化氮的电解装置，使用导电 金刚石涂层电极作为阳极。

公开(公告)号：EP1847634B1

公开(公告)日：2011-03-16

申请号：EP07707072.0

申请日：2007-01-19

申请人： TOYO TANSO CO., LTD.

发明人： TOJO, Tetsuro ,  HIRAIWA, Jiro ,  TAKEBAYASHI, Hitoshi ,  KODAMA, Masashi

IPC分类号： C25B9/00 ,  C25B11/12

CPC分类号： C25B1/245 ,  C25B11/0478 ,  C25B11/12

摘要： This invention provides an electrolytic apparatus for producing fluorine or nitrogen trifluoride by electrolyzing a molten salt containing hydrogen fluoride, which electrolytic apparatus does not cause any anode effect even at high current density and can be operated without anodic dissolution. The electrolytic apparatus is an apparatus for producing fluorine or nitrogen trifluoride by electrolyzing a hydrogen fluoride-containing molten salt at an applied current density of 1 to 1,000 A/dm2 and is characterized in that an electrode covered with an electroconductive diamond is used as an anode.

公开(公告)号：EP2012345A1

公开(公告)日：2009-01-07

申请号：EP07708131.3

申请日：2007-02-07

申请人： Toyo Tanso Co., Ltd.

发明人： HIRAIWA, Jiro ,  YOSHIMOTO, Osamu ,  HAYAKAWA, Hiroshi ,  TOJO, Tetsuro ,  OKABE, Tsuneyuki ,  ASANO, Takanobu ,  WADA, Shinichi ,  NAKAO, Ken ,  KATO, Hitoshi

IPC分类号： H01L21/02 ,  B01J4/00 ,  C25B1/24 ,  C25B15/00 ,  F17D1/02

CPC分类号： F17D1/04 ,  C01B7/19 ,  F17C2250/032 ,  F17C2270/0518 ,  H01L21/67017 ,  H01L21/67276

摘要： Fluorine gas generators are connected with semiconductor manufacturing apparatuses 3a to 3e through a gas supplying system 2 including a storage tank 12 that can store a predetermined quantity of fluorine gas generated in the on-site fluorine gas generators 1a to 1e. When one or more of the on-site fluorine gas generators 1a to 1e are stopped, fluorine gas is supplied to the semiconductor manufacturing apparatuses 3a to 3e from the storage tank 12 storing a predetermined quantity of fluorine gas, so as to keep the operations of the semiconductor manufacturing apparatuses 3a to 3e. Thereby obtained is a semiconductor manufacturing plant in which fluorine gas generated in the fluorine gas generators can be safely and stably supplied to the semiconductor manufacturing apparatuses, and the cost performance is superior.

摘要翻译： 氟气发生器通过包括存储在现场氟气发生器1a至1e中产生的预定量的氟气的储罐12的气体供应系统2与半导体制造装置3a至3e连接。 当一个或多个现场氟气发生器1a至1e停止时，从存储预定量氟气的储罐12向半导体制造装置3a至3e供应氟气，以保持操作 半导体制造装置3a〜3e。 由此，能够将在氟气发生器中产生的氟气安全稳定地供给到半导体制造装置的半导体制造厂，成本表现优异。