Abstract:
Verfahren zum Abtrennen einer Vielzahl von Scheiben von einem Werkstück mittels einer Drahtsäge während eines Abtrennvorgangs, wobei die Drahtsäge ein Drahtgatter aus sich bewegenden Drahtabschnitten eines Sägedrahts und eine Stellvorrichtung umfasst, und das Drahtgatter in einer Ebene zwischen zwei Drahtführungsrollen gespannt ist, wobei jede der zwei Drahtführungsrollen zwischen einem Festlager und einem Loslager gelagert ist, das Verfahren umfasst das Zustellen des Werkstücks mittels der Stellvorrichtung durch das Drahtgatter entlang einer Zustellrichtung senkrecht zu einer Werkstückachse und senkrecht zur Ebene des Drahtgatters; das Zuführen eines Schneidmittels zum Drahtgatter; das Zuführen eines Temperier-Mediums zum Werkstück; das Leiten einer Temperier-Flüssigkeit entsprechend eines Temperaturprofils durch die Festlager und/oder das Verschieben des Werkstücks entlang der Werkstückachse entsprechend eines Verschiebeprofils, wobei das Temperaturprofil und das Verschiebeprofil einer Formabweichung entgegengerichtet sind; gekennzeichnet durch das Ermitteln von Warp-Kurven von mindestens einer Scheibe vom Werkstück-Anfang und von mindestens einer Scheibe vom Werkstück-Ende von mindestens einem vorausgegangenen Abtrennvorgang unter Verwendung der Drahtsäge; das Bilden der Differenz der Warp-Kurven; das Einstellen der Temperatur und/oder der Volumen-Geschwindigkeit des Schneidmittels während des Abtrennvorgangs in Abhängigkeit der Differenz der Warp-Kurven; und das Einstellen der Temperatur und/oder der Volumen-Geschwindigkeit des Temperier-Mediums in Abhängigkeit der Differenz der Warp-Kurven.
Abstract:
The present disclosure provides a wire monitoring system (100) for a wire saw device. The wire monitoring system (100) includes a sensor arrangement (110) configured to be positioned adjacent to a wire (22) of the wire saw device, wherein the sensor arrangement (110) is adapted to detect a bow of the wire (22), and wherein the sensor arrangement (110) includes at least one sensor configured to be moved during operation of the wire saw device.
Abstract:
The present disclosure provides a wire monitoring system (100) for a wire saw device. The wire monitoring system (100) includes a sensor arrangement configured to detect a relative distance (24) between at least two wire portions (22) of a wire of the wire saw device.
Abstract:
A wire bow monitoring system (10) for a semiconductor wire saw device (100) is described. The wire bow monitoring system (10) includes a sensor arrangement (20) configured to be positioned adjacent to a wire (30) of the wire saw device (100), wherein the sensor arrangement (20) is adapted to detect a bow of the wire (30), wherein the sensor arrangement (20) includes at least one of an inductive sensor (22), a capacitive sensor (22) and a contact sensor (22).
Abstract:
A wire saw control system (1) for operating a wire saw (100) is provided. The wire saw is adapted for cutting a wafer (304, 304, 306, 308) by moving the wire (230) relatively to the wafer with a selectable wire speed. The wire saw control system includes a camera (20) for inspecting the wire, and a camera control unit (25) for operating the camera in dependence of the wire speed. Furthermore, a wire saw including the wire saw control system is provided, and a method for inspecting a wire of a wire saw. The method includes moving the wire with a variable wire speed; and inspecting the wire in dependence of the wire speed, thereby obtaining an inspection result.
Abstract:
The invention relates to a device (40) for automatic high-precision cutting of a layer of material joined to a substrate source by means of an embrittled area, said source substrate and layer forming a set which is to be cut and said device comprising cutting means (531, 532) in addition to means (510) for maintaining the position of the set which is to be cut, characterized in that the cutting means comprise a blade which acts upon the set which is to be cut. The invention also relates to a method for using said device.
Abstract:
The invention concerns a method for cutting two material layers (10a, 10b) forming an assembly to be cut (10), which consists in: producing between the two layers a weakened interface (11), defining an interface ring; forming a first region (21) called high-pressure region; forming at least a second region (22a, 22b) called low-pressure region; supplying the high pressure region with a fluid with controlled pressure. The invention is characterized in that the weakened interface can be produced by any type of process known per se and designed therefor, thus not limited to producing a bonding interface; and combined with the high pressure supply the interface ring of the assembly to be cut is etched with at least a blade (30). The invention also concerns a related device.
Abstract:
In a wire saw for slicing a cylindrical workpiece such as a silicon ingot so as to obtain wafers or the like, the feed rate of slurry fed to the workpiece, the viscosity of the slurry, or the feed rate of a wire is varied according to the cutting length in the workpiece or the angle between the wire and the circumference of the workpiece. It becomes possible to obtain wafers or the like, each having a uniform thickness.