摘要:
A cleaning composition is provided including an alkalinity source, builder, surfactant, water, a reducing agent and amylase in the ratio of from about 1:1 to about 1:3 wherein the total amount of amylase in the composition is equal to or less than about 1.0 weight percent; and wherein the composition is substantially free of polyols, alkanolamine, phosphates, and boric acid. A method of presoaking soiled substrates is further provided. The method including the steps of providing presoak solution to a soiled substrate at a temperature of between about 65.5° C. up to about 80° C., the presoak solution including the provided composition; draining the presoak solution from the substrate; providing a detergent to a soiled substrate including the composition of the present invention; and removing or draining the detergent; and rinsing the substrate with water.
摘要:
A cleaning composition and process for cleaning post-chemical mechanical polishing (CMP) residue and contaminants from a microelectronic device having said residue and contaminants thereon. The cleaning compositions include at least one quaternary base, at least one amine, at least one azole corrosion inhibitor, at least one reducing agent, and at least one solvent. The composition achieves highly efficacious cleaning of the post-CMP residue and contaminant material from the surface of the microelectronic device while being compatible with barrier layers, wherein the barrier layers are substantially devoid of tantalum or titanium.
摘要:
An object of the present invention is to provide a nucleated tablet for contact lens (CL) cleaning that makes it possible to disinfect a CL simply and easily in the presence of a foaming component; a CL cleaning preparation that contains the nucleated tablet; and a method for cleaning a CL. The nucleated tablet for CL cleaning of the invention is a nucleated tablet including an outer shell that contains iodine-based bactericide, a carbonate, an organic acid, and a surfactant having, per partial weight of 2000 out of the molecular weight thereof, less than one hydroxyl group, and an inner nucleus that contains a neutralizing agent, a carbonate, an organic acid, and a surfactant, wherein the inner nucleus is coated for extended release.
摘要:
The present invention relates to a method for the purification of substrates, characterized in that the purification is carried out by at least one oxidation agent, selected from the group consisting of permanganate and ferrate (VI), and subsequently by a reduction agent. Organic residue, such as legionella or extracellular polymer substances (EPS) can be removed from surfaces of filtration or classification devices and from transport and storage devices utilizing said method. The use of oxidation agents further relates to the oxidation of extracellular polymer substances (EPS).
摘要:
The present application relates to a process of colour neutralizing treatment liquids, wherein the treatment liquid comprises a chromophore selected from the group consisting of monoazo, triarylmethane, xanthene, anthraquinone, hydrophobic dyes, and mixtures thereof, wherein the hydrophobic dyes are selected from the group consisting of benzodifuranes; methine; triphenylmethanes; naphthalimides; pyrazole; naphthoquinone; mono-azo, di-azo dyes and mixtures thereof, said process comprising the steps of : i. providing a mixing vessel with the treatment composition comprising the chromophore; ii. providing to the mixing vessel more than 0.045% of a reducing agent selected from the group consisting of sulfite, thiodiurea, formaldehyde bisulfite formaldehyde sulfoxilate and mixtures thereof; and iii. mixing until discolouration by color neutralization of the chromophore is achieved.
摘要:
A product comprises separate first and second compartments. The first compartment contains a first component of a composition in a stable environment. The second compartment contains a second component of the composition in a stable environment. In use, the said two components are combined together to form a composition. The temperature of the composition is elevated when compared to the temperature of the components prior to said combination. The product comprises a low molecular weight polymer.
摘要:
A detergent composition which is less apt to corrode wiring materials and is highly effective in cleansing a semiconductor substrate or semiconductor element having fine particles or impurity metal particles adherent thereto. The detergent composition contains a reducing agent and has an oxidation-reduction potential (25 DEG C) of +0.2 V or lower and a pH (25 DEG C) of 3 to 12. Also provided is a method of cleansing a semiconductor substrate or semiconductor element with the detergent composition.