摘要:
The invention relates to the production or treatment of semiconductor or other solid components, especially to a method for directly nano-structuring amorphous carbonlayers. According to the invention, a local, field-induced reaction is activated in the carbon with an electrically conductive or semiconducting probe. Said probe is positioned at a distance from the amorphous carbon layer or is passed over said amorphous carbon layer at a distance. The distance must be such that the electrical conduction mechanism 'field emission' or 'tunnelling' can still occur. An electrical voltage is applied to said probe in relation to the layer at the points where recesses are to be made in the layer or the layer is to be removed. This process alone produces the desired structure without any further technical steps. The inventive method can be used advantageously in the production of electronic components in the sub-νm and nm areas, and is particularly suitable in those fields for producing nano-structured etching masks whose structures have to be transferred onto layers placed beneath them. The method can also be used advantageously for entering information into amorphous carbon layers for information storage.
摘要:
Die Erfindung betrifft ein Verfahren zur zeitlich stabilen Markierung einzelner Atome oder Atomgruppen einer Festkörperoberfläche durch eine veränderte strukturelle oder elektronische Konfiguration sowie die Verwendung dieses Verfahrens zur Informationsspeicherung.
摘要:
The invention relates to the production or treatment of semiconductor or other solid components, especially to a method for directly nano-structuring amorphous carbonlayers. According to the invention, a local, field-induced reaction is activated in the carbon with an electrically conductive or semiconducting probe. Said probe is positioned at a distance from the amorphous carbon layer or is passed over said amorphous carbon layer at a distance. The distance must be such that the electrical conduction mechanism 'field emission' or 'tunnelling' can still occur. An electrical voltage is applied to said probe in relation to the layer at the points where recesses are to be made in the layer or the layer is to be removed. This process alone produces the desired structure without any further technical steps. The inventive method can be used advantageously in the production of electronic components in the sub-νm and nm areas, and is particularly suitable in those fields for producing nano-structured etching masks whose structures have to be transferred onto layers placed beneath them. The method can also be used advantageously for entering information into amorphous carbon layers for information storage.
摘要:
Submicron structures are written on a surface (12) by positioning in nanometer range proximity, preferably within current tunnelling range, of the surface a scanning tip (11) of a material that emits atoms upon application of an applied voltage of low magnitude. While the tip is maintained within said range, it is moved relative to the surface, and a series of short voltage pulses are concurrently applied between the tip and surface. These pulses cause atoms of tip material to directly transfer to the surface and concurrently cause remaining atoms (21) of tip material to migrate to the tip and continuously reform the tip and maintain its sharp configuration, thereby insuring uninterrupted writing ability. Various tip materials exhibiting low field evaporation potentials may be used; however, gold is preferred if deposition is to be under ambient conditions. Heating the tip enhances the ability of the material to emit atoms. The deposited structures (20) may be selectively sensed or erased by application of appropriate voltages.
摘要:
Die Erfindung betrifft ein Verfahren zur zeitlich stabilen Markierung einzelner Atome oder Atomgruppen einer Festkörperoberfläche durch eine veränderte strukturelle oder elektronische Konfiguration sowie die Verwendung dieses Verfahrens zur Informationsspeicherung.
摘要:
By applying a voltage or signal and withdrawing or injecting, an electron or electrons to a layer of material (26, 26'), it is possible to write, erase or read data electrochemically. The layer of material has at least one portion that will reversibly change between charge states in response to the applied voltage or signal and the withdrawal or injection of an electron or electrons. Alternatively, the material of the layer may be such that the portion of the layer of material will dissociate into components in response to the applied voltage or signal and injection or withdrawal of an electron or electrons. The stored data may be read using a scanning tunneling microscope (STM) by applying a voltage or signal (40) thereto and detecting the current (i) through, voltage across or signal reflected from the layer to detect the different charge states or structures of different portions of the layer. The signal or voltage (702) applied can be a DC or AC signal, a signal pulse or transient or various combinations thereof. By using a material with more than two charge states or with multiple locations each with different charge states and by applying a signal with and detecting at a single or multiple frequencies, it is possible to write, erase or read multiple bits of information simultaneously.
摘要:
By applying a voltage or signal and withdrawing or injecting, an electron or electrons to a layer of material (26, 26'), it is possible to write, erase or read data electrochemically. The layer of material has at least one portion that will reversibly change between charge states in response to the applied voltage or signal and the withdrawal or injection of an electron or electrons. Alternatively, the material of the layer may be such that the portion of the layer of material will dissociate into components in response to the applied voltage or signal and injection or withdrawal of an electron or electrons. The stored data may be read using a scanning tunneling microscope (STM) by applying a voltage or signal (40) thereto and detecting the current (i) through, voltage across or signal reflected from the layer to detect the different charge states or structures of different portions of the layer. The signal or voltage (702) applied can be a DC or AC signal, a signal pulse or transient or various combinations thereof. By using a material with more than two charge states or with multiple locations each with different charge states and by applying a signal with and detecting at a single or multiple frequencies, it is possible to write, erase or read multiple bits of information simultaneously.
摘要:
A method of finely machining solid surface and, particularly, a novel method and apparatus for machining the surfaces of solid elements on an atomic scale in order to prepare very fine elements and for recording data at ultra-high density. A probe (1) having a sharp end is disposed being opposed to the surface of a sample (4) that is to be machined, a voltage is applied between the probe and the sample to form an electric field large enough to field-vaporize atoms (5) constituting the sample or to field-vaporize atoms (6) constituting the probe. Atoms constituting the sample are field-vaporized and are split off the sample surface or atoms constituting the probe are field-vaporized and are adhered onto the sample surface, thereby to finely machine the sample surface on an atomic scale. Furthermore, a voltage is applied like pulses at any desired position on the sample surface to generate field-vaporization between the probe and the sample while observing the sample surface on an atomic scale based on a surface observation method using a scanning tunnel microscope, in order to remove atoms one by one from the sample surface by field-vaporization.