摘要:
A pixel structure is disposed on a substrate and includes a bump, a first insulating layer, a semiconductive layer, a second insulating layer, a metal layer, and a pixel electrode. The bump is disposed on the substrate. The first insulating layer is disposed on the substrate and covers the bump. The first insulating layer has a protruding portion at the position at which the first insulating layer covers the bump. The semiconductive layer is disposed on the first insulating layer, and at least a portion of the semiconductive layer is disposed above the protruding portion. The second insulating layer is disposed on the first insulating layer and covers the semiconductive layer. The second insulating layer has a via, so as to make a portion of the semiconductive layer be not covered by the second insulating layer. The via corresponds to the protruding portion in a direction perpendicular to the substrate. The metal layer is electrically connected to the semiconductive layer through the via.
摘要:
Disclosed is a light emitting diode display device in which a time taken in a process of connecting a light emitting device to a pixel circuit is shortened. The light emitting diode display device includes a thin film transistor (TFT) array substrate including a concave portion and a light emitting device disposed in the concave portion. The light emitting device includes a first electrode and a second electrode. The light emitting device further includes a first portion, including the first and second electrodes, and a second portion opposite to the first portion, and a distance between the first portion to a floor surface of the concave portion is greater than a distance between the second portion to the floor surface of the concave portion.
摘要:
A display device is provided. The display device includes a supporting film and a flexible substrate disposed on the supporting film. The display device also includes a driving layer disposed on the flexible substrate, and a conductive pad disposed on the driving layer. The display device further includes a light-emitting diode disposed on the conductive pad and electrically connected to the conductive pad, wherein the supporting film has a first hardness, the flexible substrate has a second hardness, and the first hardness is greater than or equal to the second hardness.
摘要:
The present invention relates to the field of display technology, particularly to an array substrate and a display device, for solving the problem that the capacitance values of C gc and/or C dc are relatively large in the prior art. One embodiment of the present invention provides an array substrate, comprising: a gate line, a data line, and a common electrode layer electrically insulated from the gate line and the data line, wherein there is at least one overlapping area between the common electrode layer and the gate line, and/or, there is at least one overlapping area between the common electrode layer and the data line; moreover, the common electrode layer comprises a hollow structure part located in the at least one overlapping area, and the hollow structure part located in the overlapping area comprises at least one hollow area. The embodiment of the present invention can reduce the capacitance values of C gc and/or C dc .
摘要:
A thin film transistor and its manufacturing method, an array substrate and its manufacturing method, and a display device are provided. The thin film transistor includes a gate electrode (7), a source electrode (9), a drain electrode (10), an active layer (4) and a gate insulation layer (6). The gate insulation layer (6) is provided above the active layer (4), the gate (7), the source electrode (9) and the drain electrode (10) are provided on a same layer above the gate insulation layer (6), the active layer (4) and the source electrode (9) are connected through a first connection electrode (12b), and the active layer and the drain electrode are connected through a second connection electrode (12c). The thin film transistor can be formed by three times of patterning processes, by which the process time period is shortened, the process yield is improved, and the process cost is reduced, and so on.
摘要:
The technical disclosure relates to a thin film transistor and a manufacturing method thereof, an array substrate and a display device. The thin film transistor comprises a base substrate, a gate electrode, an active layer, source/drain electrodes, a pixel electrode and one or more insulating layers, wherein at least one of the insulating layers comprises a bottom insulating sub-layer and a top insulating sub-layer, the top insulating sub-layer having a hydrogen content higher than that of the bottom insulating sub-layer.
摘要:
Embodiments of the present invention disclose a thin film transistor and an array substrate, manufacturing methods thereof, and a display device, which relate to the field of display technology, and can improve drifting of a threshold voltage of a thin film transistor and enhance the stability and reliability of an array substrate. The thin film transistor comprises an active layer and a gate insulating layer, wherein the material of the active layer is a metal oxide semiconductor, and during forming the thin film transistor, the gate insulating layer conveys oxygen to the active layer so as to reduce an interface state density and a movable impurity concentration of a contact interface between the active layer and the gate insulating layer.
摘要:
A photoalignment agent, including at least one of a polyimide and a polyamic acid and a capping terminal connected to a main chain end terminal of at least one of the polyimide and the polyamic acid. The capping terminal includes an alkylene group (-C m H 2m -, m is a natural number) and a core stereo unit in a dendrimer form.