摘要:
The invention relates to a semiconductor optical pumping device for radiation emission comprising a semiconductor body which is provided with at least one pumping radiation source (20) and a quantum pit surface emitting structure (11). Said pumping radiation source (20) and quantum pit structure (11) are monolithically integrated. The pumping radiation source (20) produces pumping radiation (2) which is used for the optical pumping of the quantum pit structure (11). A cavity for injecting the pumping radiation (2) into a quantum pit structure (9) is formed in the semiconductor body between the pumping radiation source (20) and the quantum pit structure (11). The method for producing the inventive device is also disclosed.
摘要:
A surface emitting semiconductor laser of a ring cavity type with a small cavity loss includes a ring cavity or resonator which is constructed wituout using at least one of a pair of special high-reflection multi-layer mirrors and formed in a plane approximately perpendicular to its substrate. The ring cavity is built by a parallel face parallel to the substrate and at least one total reflection face formed opposed to the parallel face. The total reflection face may be a mesa-shaped semiconductor face, a polygonal cone-shaped semiconductor face, a quadrangular cone-shaped semiconductor, a circular cone-shaped semiconductor face or the like.
摘要:
Vertical-cavity surface-emitting lasers (VCSELs) are disclosed having various intra-cavity structures to achieve low series resistance, high power efficiencies, and TEM oo mode radiation. In one embodiment of the invention, a VCSEL comprises a laser cavity disposed between an upper and a lower mirror. The laser cavity comprises upper and lower spacer layers sandwiching an active region. A stratified electrode for conducting electrical current to the active region is disposed between the upper mirror and the upper spacer. The stratified electrode comprises a plurality of alternating high and low doped layers for achieving low series resistance without increasing the optical absorption. The VCSEL further comprises a current aperture as a disk shaped region formed in the stratified electrode for suppressing higher mode radiation. The current aperture is formed by reducing or eliminating the conductivity of the annular surrounding regions. In another embodiment, a metal contact layer having an optical aperture is formed within the upper mirror of the VCSEL. The optical aperture blocks the optical field in such a manner that it eliminates higher transverse mode lasing.
摘要:
Vertical-cavity surface-emitting lasers (VCSELs) are disclosed having various intra-cavity structures to achieve low series resistance, high power efficiencies, and TEM mode radiation. In one embodiment of the invention, a VCSEL comprises a laser cavity disposed between an upper mirror (70) and a lower mirror (20). The laser cavity comprises upper spacer (50) and lower spacer (30) layers sandwiching an active region (40). A stratified electrode (60) for conducting electrical current to the active region (40) is disposed between the upper mirror (70) and the upper spacer (50). The stratified electrode (60) comprises a plurality of alternating high and low doped layers (62, 63, 64) for achieving low series resistance without increasing the optical absorption. The VCSEL further comprises a current aperture as a disk shaped region formed in the stratified electrode for suppressing higher mode radiation. The current aperture is formed by reducing or eliminating the conductivity of the annular surrounding region. In another embodiment, a metal contact layer having an optical aperture is formed within the upper mirror of the VCSEL. The optical aperture blocks the optical field in such a manner that it eliminates higher transverse mode lasing.
摘要:
The present invention provides a thermal emission source capable of switching the intensity of light at a high response speed similarly to a photoelectric conversion element. A thermal emission source 10 includes: a two-dimensional photonic crystal 12 including a slab 11 in which an n-layer 112 made of an n-type semiconductor, a quantum well structure layer 114 having a quantum well structure, and a p-layer 111 made of a p-type semiconductor are stacked in the mentioned order in the thickness direction, wherein modified refractive index areas (air holes 121) whose refractive index differs from the refractive indices of the n-layer 112, the p-layer 111 and the quantum well structure layer 114 are cyclically arranged in the slab 11 so as to resonate with a specific wavelength of light corresponding to a transition energy between the subbands in a quantum well in the quantum well structure layer 114; and a p-type electrode 131 and an n-type electrode 132 for applying, to the slab 11, a voltage which is negative on the side of the p-layer 111 and positive on the side of the n-layer 112.
摘要:
The present invention relates to a surface-emitting semiconductor laser having a vertical resonator, comprising a substrate base section (1) and a mesa (M) arranged on and/or at the substrate base section, the mesa substantially comprising, viewed perpendicular to the substrate base section: at least one part of a first doting region (2) facing the substrate base section, at least one part of a second doping region (4) facing away from the substrate base section, and an active region (3) arranged between the first and the second doping regions, said active region having at least one active layer (A) with a laser-emitting zone, emitting substantially perpendicular to the active layer, characterized in that the mesa (M) comprises in at least one partial section of the side flank thereof at least one constriction (E).
摘要:
A method for locally controlling an electrical potential of a semiconductor structure or device, and hence locally controlling lateral and/or vertical photoelectrochemical (PEC) etch rates, by appropriate placement of electrically resistive layers or layers that impede electron flow within the semiconductor structure, and/or by positioning a cathode in contact with specific layers of the semiconductor structure during PEC etching.