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公开(公告)号：EP2021714B1
公开(公告)日：2018-07-11
申请号：EP07724290.7
申请日：2007-05-08
Applicant: I.M.A. Industria Macchine Automatiche S.p.A.
Inventor： CORVER, Josef Antonius Willem Maria
IPC: F26B5/06
CPC classification number: F26B5/06 , Y10T29/49982 , Y10T428/23 , Y10T428/234 , Y10T428/239 , Y10T428/24058 , Y10T428/24149 , Y10T428/24322 , Y10T428/24331 , Y10T428/24744 , Y10T428/24917 , Y10T428/24926 , Y10T428/249921 , Y10T428/3154 , Y10T428/31544 , Y10T428/31678 , Y10T428/31692 , Y10T428/31699
Abstract: A freeze dryer shelf with opposed, parallel first and second plates is disclosed. The plates have at least one flow channel located therebetween for conveying a diathermic fluid between the plates. One of the plates has a surface treated to inhibit the sticking to the shelf of a rubber stopper pressed against that surface during the application of pressure to the stopper to push the stopper into a container.
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公开(公告)号：EP2961861B1
公开(公告)日：2018-07-04
申请号：EP14804026.4
申请日：2014-05-13
Applicant: Samsung Electronics Co., Ltd.
Inventor： KIM, Jin Sub , YOO, Hyong Jun , JUNG, Min Chul , JUNG, Hyun Jun , CHO, Jin Hyun
CPC classification number: C23C28/34 , C23C14/0015 , C23C14/3485 , C23C28/00 , C23C28/322 , C23C30/005 , Y10T428/264 , Y10T428/31522 , Y10T428/31544 , Y10T428/31678 , Y10T428/31681 , Y10T428/31699
Abstract: Disclosed herein is a method of forming a multilayer thin film by depositing target particles, detached from a target by plasma discharge of inert gas, on a metal object using a multilayer thin film deposition apparatus and a multilayer thin film formed by the method. More specifically, a sputtering deposition apparatus is used as the multilayer thin film deposition apparatus. The method includes coating a metal object with a coating layer, depositing at least one hardness-enhancing layer on the coating layer, and depositing a color layer on the at least one hardness-enhancing layer.
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3.发明授权PHOTOCHEMICAL CROSS-LINKABLE POLYMERS, METHODS OF MARKING PHOTOCHEMICAL CROSS-LINKABLE POLYMERS, METHODS OF USING PHOTOCHEMICAL CROSS-LINKABLE POLYMERS, AND METHODS OF MAKING ARTICLES CONTAINING PHOTOCHEMICAL CROSS-LINKABLE POLYMERS 有权光化学交联聚合物，光化学交联聚合物的标记方法，使用光化学交联聚合物的方法以及制备含有光化学交联聚合物的制品的方法
公开(公告)号：EP2563843B1
公开(公告)日：2017-12-06
申请号：EP11777997.5
申请日：2011-04-28
Inventor： LOCKLIN, Jason, J. , DHENDE, Vikram
IPC: C08G73/04 , C08J7/04 , C08J7/18 , C09D179/02 , D06M13/48 , B32B7/10 , B32B27/08 , C08J7/12 , C08G73/02 , D06M15/61 , C08L79/02
CPC classification number: C08G73/0226 , A01N35/04 , B32B5/02 , B32B7/10 , B32B7/12 , B32B27/08 , B32B27/12 , B32B27/281 , B32B2307/538 , B32B2307/7145 , B32B2307/732 , B32B2439/70 , B32B2553/00 , C08G73/0206 , C08J7/123 , C08J2479/08 , C08L79/02 , C09D5/14 , C09D179/02 , D06M13/48 , D06M15/61 , D06N3/12 , D06N2203/06 , Y10T428/249991 , Y10T428/265 , Y10T428/2938 , Y10T428/31504 , Y10T428/31649 , Y10T428/31699 , Y10T428/31935 , Y10T442/2525
Abstract: Polymer compositions, methods of making polymer compositions, structures having the polymer composition covalently bonded to the surface of the structure, methods of attaching the polymer to the surface of the structure, methods of decreasing the amount of microorganisms formed on a structure, and the like, are disclosed.
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4.发明授权
公开(公告)号：EP1998619B1
公开(公告)日：2017-05-10
申请号：EP07751611.0
申请日：2007-02-22
Applicant: Arch Chemicals, Inc.
Inventor： WALDRON, Craig , MARTIN, Robert ,
CPC classification number: C09D5/1625 , A01N43/36 , C09D5/14 , Y10T428/31678 , Y10T428/31699 , Y10T428/31855 , Y10T428/31906 , Y10T428/31935 , Y10T428/31989 , A01N43/40 , A01N59/16 , A01N59/20 , A01N2300/00
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5.发明授权ACRYLIC ELECTROCOAT COMPOSITION AND PROCESS REPLACING PHOSPHATE PRETREATMENT 有权丙烯酸电解质组合物和工艺替代磷酸盐预处理
公开(公告)号：EP2382038B1
公开(公告)日：2017-04-26
申请号：EP09836554.7
申请日：2009-07-09
Applicant: BASF Coatings GmbH
Inventor： CHOUAI, Abdellatif , DECEMBER, Timothy, S. , STANTS, Cynthia, A. , LEAR, Jennifer, M. , SCHILLER, Robert, D. , TAZZIA, Charles, L. , MENOVCIK, Gregory, G.
CPC classification number: C25D13/04 , C09D5/4442 , C25D13/14 , Y10T428/31699
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Patent Agency Ranking6.发明公开
公开(公告)号：EP2961861A4
公开(公告)日：2016-11-30
申请号：EP14804026
申请日：2014-05-13
Applicant: SAMSUNG ELECTRONICS CO LTD
Inventor： KIM JIN SUB , YOO HYONG JUN , JUNG MIN CHUL , JUNG HYUN JUN , CHO JIN HYUN
CPC classification number: C23C28/34 , C23C14/0015 , C23C14/3485 , C23C28/00 , C23C28/322 , C23C30/005 , Y10T428/264 , Y10T428/31522 , Y10T428/31544 , Y10T428/31678 , Y10T428/31681 , Y10T428/31699
Abstract: Disclosed herein is a method of forming a multilayer thin film by depositing target particles, detached from a target by plasma discharge of inert gas, on a metal object using a multilayer thin film deposition apparatus and a multilayer thin film formed by the method. More specifically, a sputtering deposition apparatus is used as the multilayer thin film deposition apparatus. The method includes coating a metal object with a coating layer, depositing at least one hardness-enhancing layer on the coating layer, and depositing a color layer on the at least one hardness-enhancing layer.
Abstract translation: 在是通过使用多层薄膜沉积设备和多层薄膜由本发明公开的方法形成沉积的目标粒子，通过惰性气体的等离子体放电从目标分离，金属物体上形成的多层薄膜的方法。 更具体地，溅射沉积装置被用作多层薄膜沉积设备。 该方法包括：涂覆有涂层的金属物体，在沉积涂层上的至少一个硬度增强层，以及在沉积至少一个硬度增强层上的滤色层。
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7.发明授权METHOD OF FORMING A MICROELECTRONIQUE STRUCTURE HAVING AN ANTI-REFLECTIVE COATING USING VINYL ETHER CROSSLINKERS 有权用于生产微小电子结构，其ANTI REFLEX涂料含有用乙烯基醚交联剂
公开(公告)号：EP1743219B1
公开(公告)日：2015-12-09
申请号：EP05771626.8
申请日：2005-04-15
Applicant: Brewer Science, Inc.
Inventor： GUERRERO, Douglas, J. , COX, Robert, C. , WEIMER, Marc, W.
CPC classification number: G03F7/091 , C07C43/166 , G03F7/039 , G03F7/0392 , G03F7/094 , G03F7/11 , G03F7/168 , G03F7/40 , Y10S438/952 , Y10T428/31667 , Y10T428/31699 , Y10T428/31935
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8.发明授权CORROSION PROTECTIVE METHACRYLATE ADHESIVES FOR GALVANIZED STEEL AND OTHER METALS 有权KORROSIONSSCHUTZMETHACRYLATKLEBSTOFFE消防镀锌钢材和其他金属
公开(公告)号：EP1691936B1
公开(公告)日：2015-09-02
申请号：EP04810931.8
申请日：2004-11-12
Applicant: Henkel IP & Holding GmbH
Inventor： XIA, Bo , MURRAY, James , FROST, Doug , SCHUFT, Charles, F.
IPC: B05D7/14
CPC classification number: C09J4/00 , C08F230/08 , C09D5/08 , Y10T428/12569 , Y10T428/31699 , Y10T428/31935
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9.发明授权RADIATION CURABLE RESIN COMPOSITION, AND FINGERPRINT-RESISTANT RESIN COMPOSITION CONTAINING SAME 有权辐射固化树脂组合物和指纹保险箱树脂组合物中以
公开(公告)号：EP2489699B1
公开(公告)日：2014-07-16
申请号：EP09850419.4
申请日：2009-10-16
Applicant: POSCO , Samhwa Paintsindustries Co. Ltd.
Inventor： KIM, Jin Tae , KWON, Moon Jae , LEE, Jae Ryung , SONG, Han Seob , LEE, Young Woo , BYUN, Chang Se , KIM, Jung Su
IPC: C09D175/16 , C09D4/00 , C08F220/18
CPC classification number: C09D4/00 , C08F220/18 , C09D175/16 , Y10T428/31699 , C08F222/1006 , C08L75/16
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公开(公告)号：EP2347064B1
公开(公告)日：2014-06-04
申请号：EP09748294.7
申请日：2009-10-26
Applicant: Tarkett GDL S.A.
Inventor： SCHAUER, Etienne , PERES, Richard
CPC classification number: E04F15/105 , A47G27/0437 , B32B5/18 , B32B7/06 , B32B7/12 , B32B9/005 , B32B9/045 , B32B15/08 , B32B21/02 , B32B21/08 , B32B25/08 , B32B27/065 , B32B27/08 , B32B27/12 , B32B27/20 , B32B27/22 , B32B27/304 , B32B27/308 , B32B27/36 , B32B2264/104 , B32B2307/7265 , B32B2307/734 , B32B2307/748 , B32B2419/04 , E04F15/02 , E04F15/02133 , E04F15/02138 , E04F15/043 , Y10T428/249921 , Y10T428/249992 , Y10T428/269 , Y10T428/31551 , Y10T428/31649 , Y10T428/31667 , Y10T428/31699 , Y10T428/31833 , Y10T428/31844 , Y10T428/31906 , Y10T428/31928 , Y10T428/31935
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