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23 条记录 (耗时 0.009 秒)

    ENHANCED ETCHING/SMOOTHING OF DIELECTRIC SURFACES
    2.
    发明公开
    ENHANCED ETCHING/SMOOTHING OF DIELECTRIC SURFACES 有权
    法蚀刻/光滑表面介电

    公开(公告)号：EP1247433A4

    公开(公告)日：2007-02-28

    申请号：EP00993156

    申请日：2000-12-05

    申请人： EPION CORP

    发明人： DYKSTRA JERALD P ,  MOUNT DAVID J SR ,  SKINNER WESLEY J ,  KIRKPATRICK ALLEN R

    IPC分类号： G21K1/087 ,  H01J37/305 ,  G21K5/04 ,  H01J37/147 ,  H01L21/302 ,  H01L21/311

    CPC分类号： H01J37/147 ,  H01J2237/0044 ,  H01J2237/0203 ,  H01J2237/0812 ,  H01J2237/3151 ,  H01L21/31138

    摘要： A gas cluster ion beam (GCIB) etching apparatus having a system for producing a gas cluster ion beam utilized to controllably etch a substrate. The gas cluster ion beam is initially directed along a preselected longitudinal axis. A portion of the GCIB etching apparatus is operably connected to the beam producing system and contains the substrate to be etched when impacted by said gas cluster ion beam. The portion of the GCIB etching apparatus includes a system for directing the gas cluster ion beam in a direction offset from the preselected longitudinal axis while permitting unwanted ionizing radiation to remain directed along the longitudinal axis. A substrate holder is located within a portion of the GCIB etching apparatus for positioning the substrate in line with the offset gas cluster ion beam during the etching process, and the unwanted ionizing radiation being substantially prevented from impinging upon the substrate during the etching process.

    WIDE PARAMETER RANGE ION BEAM SCANNERS
    3.
    发明公开
    WIDE PARAMETER RANGE ION BEAM SCANNERS 审中-公开
    大面积参数ION RAY网格单位

    公开(公告)号：EP1224682A1

    公开(公告)日：2002-07-24

    申请号：EP00968408.5

    申请日：2000-09-26

    申请人： Varian Semiconductor Equipment Associates Inc.

    发明人： WALTHER, Steven, R. ,  WHITE, Nicholas, R.

    IPC分类号： H01J37/317 ,  H01J37/15 ,  H01J37/147 ,  G21K1/087

    CPC分类号： H01J37/1474 ,  G21K1/087 ,  H01J37/15 ,  H01J37/3171 ,  H01J2237/30483

    摘要： Methods and apparatus are provided for scanning a charged particle beam. The apparatus includes scan elements and a scan signal generator for generating scan signals for scanning the charged particle beam in a scan pattern having a scan origin. In one embodiment, the apparatus includes a position controller for positioning the scan elements based on a parameter of the charged particle beam, such as energy. The scan elements may be positioned to achieve a fixed position of the scan origin for different beam energies. In another embodiment, the apparatus includes first and second sets of scan elements and a scan signal controller for controlling the scan signals supplied to the sets of scan elements based on a parameter of the charged particle beam, such as energy. The scan signal controller may control the ratio of the scan signals applied to the sets of scan elements, or may deenergize a set of scan elements, to minimize space charge forces on the charged particle beam that may reduce beam transmission through the apparatus.

    METHOD FOR CHANGING THE DIRECTION OF A CHARGED PARTICLE BEAM
    4.
    发明公开
    METHOD FOR CHANGING THE DIRECTION OF A CHARGED PARTICLE BEAM 审中-公开
    方法用于改变带电粒子束的方向

    公开(公告)号：EP2620951A4

    公开(公告)日：2015-04-01

    申请号：EP12797097

    申请日：2012-05-25

    申请人： KUMAKHOV MURADIN ABUBEKIROVICH

    发明人： KUMAKHOV MURADIN ABUBEKIROVICH

    IPC分类号： G21K1/087 ,  H05H7/04

    CPC分类号： H01J3/26 ,  G21K1/02 ,  G21K1/087 ,  H01J3/34 ,  H05H7/04 ,  H05H7/06 ,  H05H2007/046

    摘要： The inventions relate to a group that includes means for directing charged particles, enabling the acceleration and interaction thereof, and producing radiation caused by their movement, namely a method for changing the direction of an accelerated charged particle beam, a device for implementing said method, a source of undulator electromagnetic radiation, a linear and a circular charged particle accelerator, and a collider and means for producing a magnetic field created by a stream of accelerated charged particles. The method and the device for implementing same are based on the use of a curved channel (1) for transporting particles, which is made from a material that is able to be electrically charged, and the formation of the same kind of charge on the inside surface of the channel wall as that of the particles. The characterizing feature of these inventions is that they require the maintenance of a condition that relates the energy and the charge of the particles to the geometrical parameters of the channel, in particular the radius R of curvature of the longitudinal axis (14) thereof, and to the electrical strength of the wall material. The other devices in this group include a device for changing the direction of a beam, which defines the trajectory of the particles inside these devices to produce the required shape according to the function of the corresponding device and focuses the beam. The technical result is the possibility of rotating the beam through large angles without loss of intensity, significantly simplifying the design, and also reducing the mass and dimensions of all the devices, particularly by obviating the need for magnets and supply voltage and control voltage sources for such devices.

    Elektrostatisches Ablenksystem für Korpuskularstrahlung
    6.
    发明公开
    Elektrostatisches Ablenksystem für Korpuskularstrahlung 审中-公开
    Elektrostatisches AblenksystemfürKorpuskularstrahlung

    公开(公告)号：EP1688964A2

    公开(公告)日：2006-08-09

    申请号：EP06002118.5

    申请日：2006-02-02

    申请人： Leica Microsystems Lithography GmbH

    发明人： Risse, Stefan, Dr. ,  Peschel, Thomas, Dr. ,  Damm, Christoph ,  Gebhardt, Andreas ,  Rohde, Mathias ,  Schenk, Christoph ,  Elster, Thomas, Dr. ,  Döring, Hans-Joachim ,  Schubert, Gerhard

    IPC分类号： G21K1/087

    CPC分类号： G21K1/087

    摘要： Die Erfindung betrifft elektrostatische Ablenksysteme für Korpuskularstrahlen, die insbesondere für mikro- und nanostrukturierte Anwendungen in Lithographieanlagen oder Messgeräten einsetzbar sind. Gemäß der gestellten Aufgabe sollen die einzelnen Elektroden eines solchen Ablenksystems dauerhaft eine sehr genaue axialsymmetrische Anordnung zueinander aufweisen und beibehalten. Bei dem erfindungsgemäßen elektrostatischen Ablenksystem sind stabförmige Elektroden in axialsymmetrischer Anordnung in einem innen hohlen Träger gehalten, durch den ein Korpuskularstrahl gerichtet werden kann. Der Träger ist dabei aus mindestens zwei und maximal vier miteinander verbindbaren Trägerelementen gebildet.

    摘要翻译： 用于微结构和纳米结构光刻或测量的用于微粒辐射的静电衍射系统包括在内部中空载体（1）中轴向和对称地保持电极束的杆电极。 载体包括两个和四个相互连接的载体元件（1.1,1.2）。

    Dispositif de focalisation d'un faisceau de particules chargées
    9.
    发明公开
    Dispositif de focalisation d'un faisceau de particules chargées 失效
    Vorrichtung zur Fokussierung eines geladenen Teilchenstrahls。

    公开(公告)号：EP0449740A1

    公开(公告)日：1991-10-02

    申请号：EP91400869.3

    申请日：1991-03-29

    申请人： ORSAY PHYSICS

    发明人： Sudraud, Pierre

    IPC分类号： H01J37/12 ,  G21K1/087 ,  H01J27/26

    CPC分类号： H01J27/022 ,  G21K1/087 ,  H01J37/12

    摘要： La présente invention concerne un dispositif de focalisation pour faisceau de particules chargées électriquement, comportant une pluralité d'électrodes en couronnes annulaires associées pour former des lentilles électrostatiques ayant un effet résultant convergent sur ledit faisceau à l'issue d'une tête de focalisation. Il comporte au moins une première et une seconde électrodes annulaires (11, 12), situées dans un corps (9) du dispositif, et au moins une troisième et une quatrième électrodes annulaires (13, 14) situées à distance dudit corps (9) dans ladite tête (8), en ce que ladite seconde électrode et ladite troisième électrodes sont électriquement reliées entre elles par un tube conducteur d'alimentation sous haute tension (32), ledit tube (32) étant disposé longitudinalement à l'intérieur d'une électrode tubulaire extérieure (34) formant enveloppe de résistance mécanique pour ladite tête (8) et terminée par ladite quatrième électrode annulaire (14), et en ce que ladite troisième électrode (13) est formée par une pièce conductrice intérieure (33) qui est en liaison rigide isolante avec ladite électrode tubulaire extérieure dans ladite tête.

    摘要翻译： 本发明涉及一种用于带电粒子束的聚焦装置，其包括多个相关联的环形环形电极，该多个相关环形环形电极在从聚焦头出射时形成具有会聚效应的静电透镜。 它包括位于装置的主体（9）中的至少一个第一和第二环形电极（11,12），以及至少一个位于与主体一定距离的第三和第四环形电极（13,14） 在所述头部（8）中，所述第二电极和所述第三电极通过高压供应导体管（32）电互连，所述管（32）纵向设置在外管状电极 （34）形成用于所述头部（8）并由第四环形电极（14）端接的机械强度的外壳，并且所述第三电极（13）由刚性连接的内部导电件（33）形成 并且与所述头部中的所述外管状电极绝缘。