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公开(公告)号：JP5015735B2
公开(公告)日：2012-08-29
申请号：JP2007301001
申请日：2007-11-20
Applicant: 旭化成イーマテリアルズ株式会社 , 株式会社ピーアイ技術研究所
Abstract: PROBLEM TO BE SOLVED: To provide a photosensitive cover lay film having excellent mechanical properties. SOLUTION: The present invention relates to a resin composition containing a resin (A) and a plasticizer (B), characterized in that, when only the plasticizer (B) is heated, the heat-generation at starting temperture is T1(°C) and, when a composition (composition (a)) which is a mixture of the resin (A) and the plasticizer (B) is heated, the heat generation starting temparature is T2(°C) and a glass transition temperature of the resin composition is T3(°C), no heat generation is observed when the above composition (composition (a)) is heated, or the composition satisfies formula (1): T1+15°C COPYRIGHT: (C)2009,JPO&INPIT
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公开(公告)号：JP4994238B2
公开(公告)日：2012-08-08
申请号：JP2007534374
申请日：2006-09-01
Applicant: 旭化成イーマテリアルズ株式会社 , 株式会社ピーアイ技術研究所
CPC classification number: G03F7/0233 , G03F7/022 , G03F7/40
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43.发明专利Insulated conductor, method for producing the same and coil produced using the insulated conductor 审中-公开绝缘导体，其制造方法和使用绝缘导体生产的线圈
公开(公告)号：JP2012138289A
公开(公告)日：2012-07-19
申请号：JP2010290746
申请日：2010-12-27
Applicant: Mitsubishi Cable Ind Ltd , Pi R & D Co Ltd , 三菱電線工業株式会社 , 株式会社ピーアイ技術研究所
Inventor： KAMIBAYASHI HIROYUKI , NAGATO TOYOKAZU , NAKAJIMA SHINTARO , GOSHIMA TOSHIYUKI
IPC: H01B13/00 , C09D5/25 , C09D5/44 , C09D179/08 , C09D183/10 , C25D13/06 , C25D13/16 , H01B7/00 , H01B7/02 , H01B13/16
Abstract: PROBLEM TO BE SOLVED: To provide an insulated conductor uniform in film thickness, excellent in heat resistance, also having a predetermined adhesion with a thin metallic wire, and further excellent in easiness in peeling electrodeposition coating.SOLUTION: In an insulated conductor, an electrodeposition coating 200 is formed on a surface of a thin metallic wire 100, the electrodeposition coating 200 comprising an insulator containing a block copolymer polyimide which has a siloxane skeleton in a molecular skeleton and has an anionic group in a molecule. The block copolymer polyimide contains 1,000 mg/eq or more and 2,000 mg/eq or less of a carboxy group as an acid value. A molecular weight of each siloxane skeleton in the molecular skeleton of the block copolymer polyimide is 1,000 or more and 1,500 or less.
Abstract translation: 要解决的问题：为了提供均匀的膜厚度的绝缘导体，耐热性优异，也具有与金属细线的预定粘合性，并且进一步优异的电沉积涂层的剥离性更好。 解决方案：在绝缘导体中，电沉积涂层200形成在细金属线100的表面上，电沉积涂层200包括含有嵌段共聚物聚酰亚胺的绝缘体，该嵌段共聚物聚酰亚胺在分子骨架中具有硅氧烷骨架，并具有 阴离子基团。 嵌段共聚物聚酰亚胺含有1000mg / eq以上且2000mg / eq以下的羧基作为酸值。 嵌段共聚物聚酰亚胺的分子骨架中的各硅氧烷骨架的分子量为1000以上且1500以下。 版权所有（C）2012，JPO＆INPIT
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公开(公告)号：JP2012084747A
公开(公告)日：2012-04-26
申请号：JP2010230885
申请日：2010-10-13
Applicant: National Institute Of Advanced Industrial & Technology , Pi R & D Co Ltd , 株式会社ピーアイ技術研究所 , 独立行政法人産業技術総合研究所
Inventor： TAKATO HIDETAKA , SAKATA ISAO , KIKUCHI YASUO , WIN MOSE , GOSHIMA TOSHIYUKI , SATO TAKAHIRO
IPC: H01L31/04
CPC classification number: Y02E10/52 , Y02E10/546
Abstract: PROBLEM TO BE SOLVED: To provide a method for manufacturing a crystal silicon solar cell having a reverse side insulation layer composed of an organic material by using a fabrication process which is suitable for mass production and less likely to have adverse effects.SOLUTION: The crystal silicon solar cell manufacturing method according to the present invention includes a reverse side insulation layer formation step of forming a reverse side insulation layer composed of an organic material on the surface of the reverse side of a crystal silicon substrate by a printing method and a step of forming an electrode on a light-receiving surface side after the reverse side insulation layer is formed. Or the crystal silicon solar cell manufacturing method according to the present invention includes a reverse side insulation layer formation step of forming a reverse side insulation layer composed of an organic material on the surface of the reverse side of a crystal silicon substrate by a printing method, a step of forming an electrode on a light-receiving surface side after the reverse side insulation layer is formed, and a step of forming an electrode on the reverse side, where calcination for forming an electrode on the light-receiving surface side and calcination for forming an electrode on the reverse side are carried out at the same time.
Abstract translation: 解决的问题：提供一种制造具有由有机材料构成的反面绝缘层的晶体硅太阳能电池的方法，该方法通过使用适合批量生产并且不太可能产生不利影响的制造工艺。 解决方案：根据本发明的晶体硅太阳能电池的制造方法包括：反面绝缘层形成步骤，在晶体硅衬底的背面的表面上形成由有机材料构成的反面绝缘层， 在形成反面绝缘层之后，在受光面侧形成电极的印刷方法和工序。 或者根据本发明的晶体硅太阳能电池的制造方法包括反面侧绝缘层形成步骤，通过印刷方法在晶体硅衬底的反面的表面上形成由有机材料构成的反面绝缘层， 在形成反面绝缘层之后在受光面侧形成电极的步骤，以及在反面形成电极的步骤，在受光面侧形成电极的煅烧和煅烧 在反面形成电极同时进行。 版权所有（C）2012，JPO＆INPIT
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公开(公告)号：JP4896533B2
公开(公告)日：2012-03-14
申请号：JP2006016081
申请日：2006-01-25
Applicant: 三菱瓦斯化学株式会社 , 株式会社ピーアイ技術研究所
IPC: B32B15/088 , B32B15/08 , C08G73/10 , C08K5/3415 , C08L79/08 , H05K1/09
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Patent Agency Ranking46.发明专利
公开(公告)号：JP2011256318A
公开(公告)日：2011-12-22
申请号：JP2010133422
申请日：2010-06-10
Applicant: Mitsubishi Cable Ind Ltd , Pi R & D Co Ltd , 三菱電線工業株式会社 , 株式会社ピーアイ技術研究所
Inventor： ZUSHI TOSHIHIRO , NAGATO TOYOKAZU , KAMIBAYASHI HIROYUKI , GOTO TOSHIYUKI , NAKAJIMA SHINTARO , ISHII AKIRA
IPC: C09D179/08 , C09D5/02 , C09D5/44 , C09D183/10
Abstract: PROBLEM TO BE SOLVED: To provide a polyimide electrodeposition coating material having such excellent storage stability as to avoid degeneration even in long-term storage and formable of an electrodeposited film having very high uniformity of film properties at a high electrodeposition rate at the point of use.SOLUTION: The polyimide electrodeposition coating material is a suspension type polyimide electrodeposition coating material in which particles of a block-copolymerized polyimide having a siloxane bond in a molecular skeleton and having an anionic group in a molecule are dispersed, wherein an average particle diameter (D1) of the particles of the block-copolymerized polyimide is 0.05-5 μm and the particles have a particle size distribution in which ≥55% (by the number of pieces) of the particles are included in the range of (D1-0.3×D1) μm to (D1+0.3×D1) μm.
Abstract translation: 解决的问题：提供一种具有优异的储存稳定性的聚酰亚胺电沉积涂料，即使在长期储存时也能避免退化，并且可形成具有非常高的电沉积膜均匀性的电沉积膜， 使用点。 聚酰亚胺电沉积涂料是悬浮型聚酰亚胺电沉积涂料，其分散在分子骨架中具有硅氧烷键并且在分子中具有阴离子基团的嵌段共聚聚酰亚胺的颗粒，其中平均颗粒 嵌段共聚聚酰亚胺颗粒的直径（D1）为0.05-5μm，颗粒的粒径分布为（D1- 0.3×D1）μm〜（D1 + 0.3×D1）μm。 版权所有（C）2012，JPO＆INPIT
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公开(公告)号：JP2010221586A
公开(公告)日：2010-10-07
申请号：JP2009072559
申请日：2009-03-24
Applicant: Asahi Kasei E-Materials Corp , Pi R & D Co Ltd , 旭化成イーマテリアルズ株式会社 , 株式会社ピーアイ技術研究所
Inventor： ASANO GOJI , SASAYAMA MASAAKI
IPC: B32B15/088 , H05K1/03
Abstract: PROBLEM TO BE SOLVED: To provide a metal foil polyimide laminate having high bending resistance and high tear strength under high adhesive force in a thin polyimide film. SOLUTION: The metal foil polyimide laminate comprises a metal foil on at least one surface of a polyimide film, wherein a ten-point average roughness of a metal foil surface adhered to a polyimide film is Rz=0.8 μm or less, thickness of the polyimide film is 13 μm or less and IPC bending resistance of a metal foil polyimide laminate is 1,000,000 cycles or more under bending speed of 60 cycles/min. COPYRIGHT: (C)2011,JPO&INPIT
Abstract translation: 要解决的问题：提供一种在薄聚酰亚胺膜中，在高粘合力下具有高抗弯曲性和高撕裂强度的金属箔聚酰亚胺层压体。 解决方案：金属箔聚酰亚胺层压体包括在聚酰亚胺膜的至少一个表面上的金属箔，其中附着在聚酰亚胺膜上的金属箔表面的十点平均粗糙度为Rz =0.8μm以下，厚度 的聚酰亚胺膜的折射率为13μm以下，并且在60次/分钟的弯曲速度下，金属箔聚酰亚胺层压体的IPC耐弯曲性为1,000,000次以上。 版权所有（C）2011，JPO＆INPIT
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公开(公告)号：JP4547087B2
公开(公告)日：2010-09-22
申请号：JP2000516260
申请日：1998-10-12
Applicant: 株式会社ピーアイ技術研究所
IPC: G03F7/039 , C08G73/10 , C08L79/08 , C09D179/08 , G03F7/004 , G03F7/022 , H01L21/027 , H05K3/28 , H05K3/46
CPC classification number: C08G73/10 , G03F7/0045 , G03F7/039 , Y10S430/106
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公开(公告)号：JPWO2008139990A1
公开(公告)日：2010-08-05
申请号：JP2009514127
申请日：2008-05-07
Applicant: 三菱電線工業株式会社 , 株式会社ピーアイ技術研究所
Inventor： 政徳 藤井 , 政徳 藤井 , 敏博 厨子 , 敏博 厨子 , 宏昌 本城 , 宏昌 本城 , 豊和 長門 , 豊和 長門 , モーソー ウィン , モーソー ウィン , 慎太郎 中島 , 慎太郎 中島 , 敏之 五島 , 敏之 五島 , 陽 石井 , 陽 石井
IPC: C09D179/08 , C08G73/10 , C09D5/44 , C09D183/10
CPC classification number: C09D5/4484 , C09D179/08 , C09D183/10 , C25D13/06
Abstract: 分子骨格中にシロキサン結合を有し、分子中にアニオン性基を有するブロック共重合ポリイミドを樹脂成分として含有する、サスペンジョン型電着塗料組成物。好適には、上記ブロック共重合ポリイミドは、ジアミン成分の一つとして、分子骨格中にシロキサン結合を有するジアミンを含むものである。また、好適には、上記アニオン性基は、カルボン酸基若しくはその塩、及び/又は、スルホン酸基若しくはその塩である。優れた耐熱性を有し、被電着物に対する剥がれや割れが生じにくく、しかも、膜性状の均一性に優れる高絶縁電着膜を効率良く形成できる電着塗料組成物を提供する。
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公开(公告)号：JP2009283932A
公开(公告)日：2009-12-03
申请号：JP2009105276
申请日：2009-04-23
Applicant: Asahi Kasei E-Materials Corp , Pi R & D Co Ltd , 旭化成イーマテリアルズ株式会社 , 株式会社ピーアイ技術研究所
Inventor： SASAKI HIROO , SHIMIZU KENJU , SEO WIN MAW , GOTO TOSHIYUKI
Abstract: PROBLEM TO BE SOLVED: To provide a coverlay excelling in a low-warpage property, a pattern fineness property, flexibility and flame resistance; and a printed wiring board using it. SOLUTION: In this coverlay, a silicon element, a phosphorous element and a sulfur element are present on a surface of thereof, and uniformly distributed in the surface; in an X-ray intensity ratio of the elements on the surface, the ratio of the average intensity of the phosphorous element to the average intensity of the silicon element is ≥0.005; and that to the average intensity of the sulfur element is ≥0.25. The coverlay is obtained from a photosensitive resin composition containing alkali-soluble polyimide having a siloxane skeleton and/or an alkali-soluble polyimide precursor and 1, 2-naphthoquinone diazide sulphonate compound and a phosphate ester compound and/or a phosphazene compound; and the alkali-soluble polyimide has a carboxyl group and/or a hydroxide group. The phosphate ester compound has 1-30C aliphatic organic group. COPYRIGHT: (C)2010,JPO&INPIT
Abstract translation: 要解决的问题：提供优异的低翘曲性，图案细度性，柔韧性和阻燃性的覆盖物; 和使用它的印刷线路板。 解决方案：在该覆盖物中，硅元素，磷元素和硫元素存在于其表面上，并均匀地分布在表面中; 在表面上的元素的X射线强度比中，磷元素的平均强度与硅元素的平均强度之比≥0.005; 硫元素的平均强度≥0.25。 覆盖层由含有硅氧烷骨架的碱溶性聚酰亚胺和/或碱溶性聚酰亚胺前体和1,2-萘醌二叠氮化物化合物和磷酸酯化合物和/或磷腈化合物的感光性树脂组合物得到， 碱溶性聚酰亚胺具有羧基和/或氢氧基。 磷酸酯化合物具有1-30C脂族有机基团。 版权所有（C）2010，JPO＆INPIT
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